Abstract

A large number of interactive chemical and mechanical factors significantly influence optical polishing processes. Motivated by Tesar's qualitative observations on the importance of friction in pitch polishing of fused silica [1], we have studied the influence of process chemistry on frictional forces in a more quantitative way, independent of any confounding effects introduced by a given polishing tool. The goal was to develop a microscopic laboratory technique for rapid screening of many different combinations of polishing process factors, thereby minimizing the number of experiments necessary to optimize glass removal rates on large-scale planar polishing equipment.

© 1992 Optical Society of America