Broadband Polarization Beam Splitters Based on MMI Couplers with Internal Photonic Crystals Fabricated Using 193 nm Photolithography

Luhua Xu; Luhua Xu; Deng Mao; Jinsong Zhang; Yun Wang; Zhenping Xing; Md Samiul Alam; Maxime Jacques; Yannick D’Mello; Santiago Bernal; David V. Plant

doi:10.1364/OFC.2021.W6A.46

Optical Fiber Communication Conference (OFC) 2021
OSA Technical Digest (Optica Publishing Group, 2021),
paper W6A.46
•https://doi.org/10.1364/OFC.2021.W6A.46

Broadband Polarization Beam Splitters Based on MMI Couplers with Internal Photonic Crystals Fabricated Using 193 nm Photolithography

Luhua Xu, Deng Mao, Jinsong Zhang, Yun Wang, Zhenping Xing, Md Samiul Alam, Maxime Jacques, Yannick D’Mello, Santiago Bernal, and David V. Plant

Optical Fiber Communication Conference 2021

Washington, DC United States
6–11 June 2021
ISBN: 978-1-943580-86-6

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Joint Poster Session 1 (W6A)

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L. Xu, D. Mao, J. Zhang, Y. Wang, Z. Xing, M. S. Alam, M. Jacques, Y. D’Mello, S. Bernal, and D. V. Plant, "Broadband Polarization Beam Splitters Based on MMI Couplers with Internal Photonic Crystals Fabricated Using 193 nm Photolithography," in Optical Fiber Communication Conference (OFC) 2021, P. Dong, J. Kani, C. Xie, R. Casellas, C. Cole, and M. Li, eds., OSA Technical Digest (Optica Publishing Group, 2021), paper W6A.46.

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Abstract

We demonstrate a silicon photonic MMI-coupler-based polarization beam splitter, fabricated using 193 nm photolithography. Measured extinction ratios beyond 30 dB and insertion losses below 3 dB are achieved over a record bandwidth of 111 nm.

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