Abstract
Benefiting from the new 193nm lithography, a narrow tip with width of 100 nm can be fabricated on IME’s MPW platform. Based on the new capability, we optimized the suspended coupler and realized the state-of-the-art coupling loss less than -1.3 dB/facet with cleaved single mode fiber. A uniformity of 0.4 dB across wafers has also been confirmed, the best performance to our knowledge realized in public-available silicon photonics platform.
© 2017 Optical Society of America
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