Abstract
In the flame hydrolysis deposition technique, halides of Si, Ge, P, and B are introduced into an oxyhydrogen flame and hydolyzed to form oxide particles that are subsequently deposited on a silicon substrate. After deposition, the low density film produced is sintered to form a clear glass. Buffer, core, and cladding regions can all be produced by this process with suitable choice of dopant and doping level for each region. The paper discusses the behavior of the two dopants P205 and B203 used in the deposition process with particular emphasis on optical and thermal properties of the cladding material produced. The unexpected distribution of phosphorous, giving localized regions of relatively high concentration can lead to undesirable secondary guidance and hence adversely effect the performance of the waveguides. Suitable codoping with boron has provided a solution to the problem and is discussed.
© 1991 Optical Society of America
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