Abstract
Dammann gratings are binary phase gratings which can be used for producing an array of spots of equal intensity.1 These gratings are of interest, e.g., for providing power supply beams for a 2-D array of logic devices in an optical digital computer. Dammann gratings are computer generated using nonlinear optimization techniques. For producing a 1-D array of N spots, N transitions between +1 and − 1 in the grating have to be computed. The computed data are used to write a binary amplitude mask with an electron-beam machine. Finally, a phase grating is fabricated using reactive ion etching in quartz glass. We present efficient ways to compute Dammann gratings and investigate their performance depending on resolution and other fabrication parameters.
© 1987 Optical Society of America
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