Abstract
The intensity dependence of wavefront reflectivity in four-wave mixing in photorefractive materials is highly nonlinear. Use of this nonlinearity can produce interesting image modifications such as image intensity inversion. Intensity inversion, i.e., lout ∝ 1/lin, is obtained when the intensity of the signal beam, lin, is very much greater than the total intensity of the reference and readout (pump) beams.1,2 We have observed inversion for a dynamic range of the signal beams between 10:1 and 100:1 using bismuth silicon oxide as the nonlinear medium. Experimental results showing the extent of inversion as a function of the beam intensities, interaction angle, and applied voltages are presented.
© 1986 Optical Society of America
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