Resolved-Sideband Cooling of a Silica Optomechanical Microresonator in a Cryogenic Environment

Hailin Wang; Young-Shin Park

doi:10.1364/NLO.2009.NTuC4

Advances in Optical Sciences Congress
OSA Technical Digest (CD) (Optica Publishing Group, 2009),
paper NTuC4
•https://doi.org/10.1364/NLO.2009.NTuC4

Resolved-Sideband Cooling of a Silica Optomechanical Microresonator in a Cryogenic Environment

Hailin Wang and Young-Shin Park

Nonlinear Optics: Materials, Fundamentals and Applications 2009

Honolulu, Hawaii United States
12–17 July 2009
ISBN: 978-1-55752-873-5

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Nonlinear Optics in Microresonators (NTuC)

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H. Wang and Y. Park, "Resolved-Sideband Cooling of a Silica Optomechanical Microresonator in a Cryogenic Environment," in Advances in Optical Sciences Congress, OSA Technical Digest (CD) (Optica Publishing Group, 2009), paper NTuC4.

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Abstract

Resolved-sideband cooling of a silica optomechanical microresonator is demonstrated in a cryogenic environment. Final phonon occupation as low as 37 is achieved when the resonator is precooled to 1.4 K.

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