Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > MSBIP > 1991 > TuB > TuB2

Adsorption and Desorption Kinetics for Si (C2H5)2H2 on Si(111) 7x7

P.A. Coon, M.L. Wise, and S.M. George

Not Accessible

Your library or personal account may give you access

Abstract

Diethylsilane (DES), Si (C2H5)2H2, is a promising candidate for the atomic layer epitaxy of silicon. Alkylsilanes are advantageous because they are less toxic and flammable than silanes. The reactions of organosilanes with silicon surfaces are also important both fundamentally and technologically. This study explored the adsorption and desorption kinetics for Si (C2H5)2H2 on Si (111) 7x7 using laser induced thermal desorption (LITD) and temperature programmed desorption (TPD) techniques.

© 1991 Optical Society of America

PDF Article
More Like This
Oxidation Kinetics of Silicon Surfaces Studied Using Laser Induced Thermal Desorption

P. Gupta, P.A. Coon, C.H. Mak, and S.M. George
MC1 Microphysics of Surfaces, Beams, and Adsorbates (MSBA) 1989

Laser-induced thermal desorption studies of surface kinetics

STEVEN M. GEORGE
QTHG1 International Quantum Electronics Conference (IQEC) 1990

The Decomposition of NH3 on Si (111) 7x7 Studied Using Laser-Induced Thermal Desorption

B.G. Koehler, P.A. Coon, and S.M. George
WD2 Microphysics of Surfaces, Beams, and Adsorbates (MSBA) 1989

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use