Abstract

Laser direct writing techniques, employing rapidly scanned microchemical deposition and etching reactions, are of importance for advanced nonlithographic fabrication of microelectronics. One class of applications employs these techniques for fine-line in situ alteration of conducting films as a last step in fabrication. Of particular importance for these applications is laser-induced patterning of Mo and W, which are becoming widely used materials for metallization of both Si and GaAs microelectronic devices.

© 1987 Optical Society of America