Abstract

Chemical vapor deposition (CVD) is an important industrial process used to deposit solid films for protective coatings and microelectronic applications. The CVD processes used in the fabrication of microelectronic devices are becoming more complex, and higher demands are being made on the resulting films. A fundamental understanding of the chemistry and physics of CVD may help meet future process control requirements, and could lead to novel deposition methods.

© 1987 Optical Society of America