Abstract
In recent years, vacuum ultraviolet (VUV) laser source realized by nonlinear frequency conversion is increasingly demanded in various applications in science, medicine, and industry. As we expected the short-wavelength VUV sources below 190 nm could be applied for mask inspection in future semiconductor manufacture, in this research, we attempt to generate VUV light with commercial borate crystals LiB3O5 (LBO) and CsLiB6O10 (CLBO).
© 2013 Japan Society of Applied Physics, Optical Society of America
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