Generation and Application of Tunable VUV Radiation at 50 to 200 nm

G. Hilber; A. Lago; R. Wallenstein

International Conference on Quantum Electronics
OSA Technical Digest (Optica Publishing Group, 1988),
paper MA1

Generation and Application of Tunable VUV Radiation at 50 to 200 nm

G. Hilber, A. Lago, and R. Wallenstein

International Quantum Electronics Conference 1988

Tokyo Japan
18–21 July 1988
ISBN:

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Symposium on Frequency Up-Conversion (MA)

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G. Hilber, A. Lago, and R. Wallenstein, "Generation and Application of Tunable VUV Radiation at 50 to 200 nm," in International Conference on Quantum Electronics, H. Inaba, T. Yajima, and T. Ikegami, eds., OSA Technical Digest (Optica Publishing Group, 1988), paper MA1.

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Abstract

Nonlinear frequency mixing in gases is a well established method for the generation of optical radiation in the spectral region of the vacuum ultraviolet (VUV) at wavelengths λ_VUV = 100 – 200 nm and in the extreme ultraviolet (XUV) at λ_XUV < 100 – 200 nm^1,2,3.

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