Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Aberration polynomial fitting and MTF based optimization for general optical systems

Not Accessible

Your library or personal account may give you access

Abstract

Although there are different ways to implement MTF optimization1,2 in an optical design program, a common requirement of them is to express the wave-aberration as a polynomial in the exit pupil coordinates. While in-depth studies have been carried out for polynomial fitting for rotationally symmetric optical systems3,4, few publications can be found on the subject for general systems without symmetry. A simple scheme is developed for the efficient and accurate determination of the coefficients of a Zernike wave-aberration polynomial for a given object point and a general optical system. It enables rapid evaluations of MTF related image criteria such as the variance of the wave-aberration difference function, which is used as the merit function in damped-least-squares MTF optimization for nonsymmetric systems.

© 1998 Optical Society of America

PDF Article
More Like This
Bi-Zernike polynomials for wavefront aberration function in rotationally symmetric optical systems

Jingfei Ye, Zhishan Gao, Shuai Wang, Xiaoli Liu, Zhongming Yang, and Congyang Zhang
JM3A.6 Freeform Optics (Freeform) 2013

MTF optimization by automatic adjustment of aberration merit function

Akira Yabe
ITuA4 International Optical Design Conference (IODC) 2002

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.