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High resolution spectroscopy and soft x-ray lithography using high-repetition-rate laser-produced plasma light sources

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Abstract

Laser-produced plasmas are convenient laboratory light sources for many experiments in the ~1-200-nm region. We describe the properties of such a source when driven by either of two high repetition rate laser systems: a Nd:YAG laser (1064 nm) with ~600 mJ, 25-ns pulses, and a 10-Hz repetition rate and a krypton fluoride laser (249 nm) with ~300 mJ, 20-ns pulses, and a 150-Hz repetition rate. Power densities in the incident pulses at the focal spot on the plasma source targets generally were around 1011 W cm-2. The source’s cyclindrical metal targets can be rotated to provide fresh material for every shot1 and the plasma is viewed at right angles to the incident laser beam with the normal to the surface at the focal spot being ~45° to both the laser beam and the viewing direction. The source provides a simple, inexpensive laboratory competitor to synchrotron radiation for both spectroscopy and lithography, as demonstrated by the examples presented.

© 1986 Optical Society of America

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