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Conferences > HILAS > 2024 > JW4A > JW4A.15

Fabrication of EUV Gratings via Ion Irradiation

Johannes Kaufmann, Thomas Siefke, Carsten Ronning, and Uwe Zeitner

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Abstract

We fabricated shallow silicon gratings for EUV applications utilizing swelling upon irradiation with helium ions through polymer masks. Understanding the effects of fluence, flux and ion energy enables height control between 1 to 20 nm.

© 2024 The Author(s)

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