Versatile 780-nm Pump Source for High-repetition Rate Entanglement Generation

Jemellie Galang; Joshua C. Bienfang; Charles W. Clark

doi:10.1364/FIO.2010.JWA55

Frontiers in Optics 2010/Laser Science XXVI
OSA Technical Digest (CD) (Optica Publishing Group, 2010),
paper JWA55
•https://doi.org/10.1364/FIO.2010.JWA55

Versatile 780-nm Pump Source for High-repetition Rate Entanglement Generation

Jemellie Galang, Joshua C. Bienfang, and Charles W. Clark

Frontiers in Optics 2010

Rochester, New York United States
24–28 October 2010
ISBN:

From the session
Joint FiO/LS Poster Session II (JWA)

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
J. Galang, J. C. Bienfang, and C. W. Clark, "Versatile 780-nm Pump Source for High-repetition Rate Entanglement Generation," in Frontiers in Optics 2010/Laser Science XXVI, OSA Technical Digest (CD) (Optica Publishing Group, 2010), paper JWA55.

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Citation alert
Save article

Abstract

We demonstrate a tunable pump source based on frequency-doubled EDFA-amplified pulses carved from a narrow-line CW laser at rates up to 1.25 GHz. We find self-phase modulation in the EDFA limits the peak output-pulse power.

PDF Article

Previous Article Next Article