Abstract
Achieving diffraction-limited performance from extreme ultraviolet (EUV) optical systems requires the development of interferometry with sub-angstrom accuracy. At-wave- length EUV testing with a phase-shifting point diffraction interferometer is being developed for the measurement of lithographic quality, multiple-element, aspherical optical systems. Recent demonstrations of high-accuracy EUV interferometry, and progress in this field, have required detailed analysis and in situ calibration of systematic errors generated by the measurement geometry. The framework of this detailed analysis is presented along with recent measurements and a discussion of concomitant metrologies made available by the interferometer.
© 1999 Optical Society of America
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