Single-shot, self-calibrated, real-time wavefront sensing in the EUV and Hard X-ray range for source metrology and beamline optimization

O. de la Rochefoucauld; M. Piponnier; F. Harms; G. Dovillaire; X. Levecq; M. Idir; L. Raimondi; P. Zeitoun

doi:10.1364/EUVXRAY.2020.ETh1A.2

OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS)
OSA Technical Digest (Optica Publishing Group, 2020),
paper ETh1A.2
•https://doi.org/10.1364/EUVXRAY.2020.ETh1A.2

Single-shot, self-calibrated, real-time wavefront sensing in the EUV and Hard X-ray range for source metrology and beamline optimization

O. de la Rochefoucauld, M. Piponnier, F. Harms, G. Dovillaire, X. Levecq, M. Idir, L. Raimondi, and P. Zeitoun

Compact EUV & X-ray Light Sources 2020

Washington, DC United States
16–20 November 2020
ISBN: 978-1-943580-73-6

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Compact Sources, Metrology, and X-ray Optics (ETh1A)

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O. de la Rochefoucauld, M. Piponnier, F. Harms, G. Dovillaire, X. Levecq, M. Idir, L. Raimondi, and P. Zeitoun, "Single-shot, self-calibrated, real-time wavefront sensing in the EUV and Hard X-ray range for source metrology and beamline optimization," in OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), L. Assoufid, P. Naulleau, M. Couprie, T. Ishikawa, J. Rocca, C. Haefner, G. Sansone, T. Metzger, F. Quéré, M. Ebrahim-Zadeh, A. Helmy, F. Laurell, and G. Leo, eds., OSA Technical Digest (Optica Publishing Group, 2020), paper ETh1A.2.

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Abstract

We present Hartmann wavefront sensors as versatile metrology tools to provide real-time characterization and optimization of sources as well as easy, at lambda optical alignment, on a spectral range from EUV to hard X-Ray.

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