VUV Laser Photolithography

J. C. White; H. G. Craighead; R. E. Howard; L. D. Jackel; O. R. Wood

doi:10.1364/EUV.1984.TuC3

Second Topical Meeting on Laser Techniques in the Extreme Ultraviolet
Technical Digest Series (Optica Publishing Group, 1984),
paper TuC3
•https://doi.org/10.1364/EUV.1984.TuC3

VUV Laser Photolithography

J. C. White, H. G. Craighead, R. E. Howard, L. D. Jackel, and O. R. Wood

Laser Techniques in the Extreme Ultraviolet 1984

Boulder, Colorado United States
5–7 March 1984
ISBN:

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Mirrors, Optics, and Microscopy (TuC)

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J. C. White, H. G. Craighead, R. E. Howard, L. D. Jackel, and O. R. Wood, "VUV Laser Photolithography," in Second Topical Meeting on Laser Techniques in the Extreme Ultraviolet, Technical Digest Series (Optica Publishing Group, 1984), paper TuC3.

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Abstract

In this paper we describe experiments using a molecular fluorine (i.e., F₂ dimer) laser operating at 157 nm as a vacuum ultraviolet (VUV) source for high resolution photolithography. The F₂ excimer laser is now the only commercially available laser with high average power at a wavelength as short as 157 nm. Using this laser as a source for contact lithography, we made resist lines as narrow as 150 nm, the smallest features yet reproduced by photolithography.

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