Abstract
The interface sensitivity of the optical Second Harmonic Generation (SHG) has increasingly been used recently to study the technologically very important Si-SiO2 interface. In some experiments large enhancements of and changes in the SHG anisotropy have been observed for thick oxide films.1,2 We show here that the SHG from thick thermal oxide films on Si(111) as a function of oxide thickness is dominated by linear optics, due to multiple reflections in the oxide film. The oxide film itself does not contribute to SHG.
© 1994 IEEE
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