Abstract
In order to satisfy the growing industrial need for Diffractive Optical Elements (DOEs), fabricated at a low price, we investigated the gray level mask fabrication aproach. Our apoach allows mask fabrication by a single e-beam direct write step without any involved resist processing. The mask can then be used in a optical lithography tool to generate a DOE structure in photoresist. This DOE structure will then be transfered into the substrate material by the use of a chemically assisted ion beam etching (CAIBE) process.
© 1996 Optical Society of America
PDF ArticleMore Like This
Edgar Pawlowski
DThA.5 Diffractive Optics and Micro-Optics (DOMO) 1996
Igor I. Smolyaninov, Joseph N. Mait, David L. Mazzoni, and Christopher C. Davis
DWD.3 Diffractive Optics and Micro-Optics (DOMO) 1996
Muzammil Iqbal, Thomas Dillon, Michael J. McFadden, Dennis Prather, and Michael W. Haney
JTuC24 Frontiers in Optics (FiO) 2005