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Influence of defects on the femtosecond laser damage resistance of multi-layer dielectric grating

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Abstract

The influence of various defects on the femtosecond laser damage resistance of a HfO2/SiO2/Ta2O5-based 48-layer grating designed for 800 nm is studied using the finite-difference time-domain method incorporated with the Keldysh photoionization theory.

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