Abstract

Over the past few years, thin film lithium niobate on insulator (LNOI) technology has emerge as one of the most capable platforms for integrated photonic as it combines several interesting optical properties such as: high electro-optic (EO) coefficient, high intrinsic 2nd and 3rd order nonlinearities, and a large transparency window (350nm - 5500nm). Despite several key milestones experiments such as high speed, low Vπ electro-optical modulators [1], wavelength conversion [2], the success of the LNOI technology has been limited to few academic groups around the world. Establishing a reliable, high quality and high yield “foundry like” fabrication process for LNOI PICs is the key to ensure that these academic progresses translate into an industrial scale technology. Reliably achieving low loss waveguides at wafer scale is the key to achieve this goal and, in this paper, we present the statistical measuring of waveguides losses and study the effects of waveguides width, bending radii and other parameters to understand the effect of sidewall scattering, bending losses and material absorption.

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