Abstract
Production of crystalline carbon nitride(CN) thin films with nitrogen content up to 57 % has remained an intriguing problem in the field of material science. Up to date numerous investigations in CN thin films deposition resulted in nanocrystalline specimen with nitrogen content less than 45 %. We reported about crystalline CN thin films deposition by nitrogen DC arc source evaporation combined with pulsed laser ablation(PLA) as a source of gas phase carbon.
© 1998 IEEE
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