Abstract

Ultrafast laser microprinting is studied and presented. The microprinting technique utilised a femtosecond laser (λ = 248 nm, τ= 500 fs), and an imaging system to induce ablation of metal or oxide of a thin film source, transparent support/film interface and forward it to a receiving surface in close-contact as illustrated in figure 1 a. The investigation involves the ablative transfer of Cr and indium oxide materials. The receiving substrates used were glass, Si and MgO (100). Parametric studies were performed to investigate the dependence of feature spread profiles on the laser fluence and source film thickness.

© 1998 IEEE