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Conferences > CLEO_Europe > 1998 > CMF > CMF1

Nanoclusters formation by Laser Ablation

W. Marine, L. Patrone, and M. Sentis

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Abstract

In this communication we present a new synthesis method of silicon nanoclusters (Sin, where n > 20) by conventional laser ablation technique. Ablation and deposition were performed by ArF excimer laser (λ = 193 nm, pulse duration t = 15 ns, FWHM) in different background gases: He, Ar, O2, H2 or their mixtures. Typically, the gas pressure was about 0.1-5 Torr.

© 1998 IEEE

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