Abstract
Pulse-laser deposition techniques provide a variety of thin films with special structural and functional properties useful for application. The method is suitable for the preparation of layers and layer stacks of virtually all substances, including refractory and nonconducting materials as well as stoichiometric compounds. It is distinguished from other methods by its very high instantaneous deposition rate and by particle energies up to 1 keV.
© 1994 IEEE
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