Abstract

SiO-LIF fields, and temperatures based on OH-LIF and OH* where used to optimize the burner to substrate distance and the thread temperature during SiOx layer deposition on glass and threads in an atmospheric HMDSO/propane/air flame.

© 2013 Optical Society of America

PDF Article

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription