Optical properties of ZnO film by plasma-assisted MOCVD

Xinqiang Wang; Shuren Yang; Jinzhong Wang; Jingzhi Yin; Xiuying Jiang; Guotong Du

The 4th Pacific Rim Conference on Lasers and Electro-Optics
Technical Digest Series (Optica Publishing Group, 2001),
paper TuH4_4

Optical properties of ZnO film by plasma-assisted MOCVD

Xinqiang Wang, Shuren Yang, Jinzhong Wang, Jingzhi Yin, Xiuying Jiang, and Guotong Du

Conference on Lasers and Electro-Optics/Pacific Rim 2001

Chiba Japan
15–19 July 2001
ISBN:

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Semiconductor Materials-2 [Room H] (TuH4)

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X. Wang, S. Yang, J. Wang, J. Yin, X. Jiang, and G. Du, "Optical properties of ZnO film by plasma-assisted MOCVD," in The 4th Pacific Rim Conference on Lasers and Electro-Optics, Technical Digest Series (Optica Publishing Group, 2001), paper TuH4_4.

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Abstract

In this article, non-doped and nitrogen doped ZnO films were deposited by plasma-assisted Metal-organic Chemical Vapor Deposition (MOCVD) on sapphire. The optical properties were investigated by the measurement of photoluminescence, Raman scattering and ultraviolet absorption.

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