Abstract
Industrial optical measurement has been mainly based on geometrical optics, for example, triangulation, light sectioning, moire, etc. Now more and more wave optical measurements are being introduced such as interferometry, laser Doppler technique, holography, speckle metrology, and diffractometry, because of demands for higher sensitivity and flexibility. This tendency is also supported by advances in optoelectronic devices and components as well as computers. In this tutorial I will first explain the basic principles of the above methods and then discuss how to overcome the problems hindering their practical uses, for example, suppression of external perturbations, acceleration of measurement, simplification and compactization of optical systems, and linkage between measurement and control.
© 1995 IEEE
PDF ArticleMore Like This
Steen G. Hanson
CThB3 Conference on Lasers and Electro-Optics (CLEO:S&I) 1998
ROBERT DEWAR
FJ1 Conference on Lasers and Electro-Optics (CLEO:S&I) 1985
Alan C. Stanton, David S. Bomse, Joel A. Silver, D. Christian Hovde, Daniel J. Kane, Daniel B. Oh, and Mark E. Paige
MB.1 Semiconductor Lasers: Advanced Devices and Applications (ASLA) 1995