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Novel MCVD process control technique

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In the MCVD process,1 the chemicals SiCl4, GeCl4, and O2 are reacted as they flow through a silica tube to form SiO2 and GeO2 in particulate form. These particles deposit on the inner wall of the tube downstream from the reaction zone and are sintered into a transparent glass layer as the oxyhydrogen torch travels along the tube. Conventional MCVD process control consists of carefully metering the reactant chemicals into the tube during each pass and using an optical pyrometer to control the tube temperature by regulating gas flow to the oxyhydrogen torch.

© 1986 Optical Society of America

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