Abstract

An algorithm-based stitching interferometry method was developed for the measurement of mirrors with large radii of curvature, where the single-shot measurement of the surface figure is not possible. The global and adjacent-subaperture stitching algorithms were compared and the influence of the overlap ratio, the effect of the defocusing error, and methods for its reduction were studied. Using the global stitching algorithm, a root mean square repeatability error of the surface measurement of 0.24 nm was achieved. The centerlines of the stitching result showed good agreement with those from the Nanometer Optical Component Measuring Machine.

© 2019 Optical Society of America under the terms of the OSA Open Access Publishing Agreement

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  1. Y. Inubushi, I. Inoue, J. Kim, A. Nishihara, S. Matsuyama, H. Yumoto, T. Koyama, K. Tono, H. Ohashi, K. Yamauchi, and M. Yabashi, “Measurement of the X-ray Spectrum of a Free Electron Laser with a Wide-Range High-Resolution Single-Shot Spectrometer,” Appl. Sci. 7(6), 584 (2017).
    [Crossref]
  2. D. Laundy, K. Sawhney, and V. Dhamgaye, “Using refractive optics to broaden the focus of an X-ray mirror,” J. Synchrotron Radiat. 24(4), 744–749 (2017).
    [Crossref]
  3. E. Ikenaga, M. Kobata, H. Matsuda, T. Sugiyama, H. Daimon, and K. Kobayashi, “Development of high lateral and wide angle resolved hard X-ray photoemission spectroscopy at BL47XU in SPring-8,” J. Electron Spectrosc. Relat. Phenom. 190(B), 180–187 (2013).
    [Crossref]
  4. K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Moriet, “Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining,” Rev. Sci. Instrum. 74(10), 4549–4553 (2003).
    [Crossref]
  5. P. Z. Takacs, S. K. Feng, E. L. Church, S. Qian, and W. Liu, “Long Trace Profile Measurements On Cylindrical Aspheres,” Proc. SPIE 0966, 354–364 (1988).
    [Crossref]
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    [Crossref]
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    [Crossref]
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    [Crossref]
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    [Crossref]
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    [Crossref]
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    [Crossref]
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    [Crossref]
  20. S. Chen, W. Liao, Y. Dai, and S. Li, “Self-calibrated subaperture stitching test of hyper-hemispheres using latitude and longitude coordinates,” Appl. Opt. 51(17), 3817 (2012).
    [Crossref]
  21. D. Golini, G. Forbes, and P. Murphy, “Method for self-calibrated sub-aperture stitching for surface figure measurement,” US Patent Specification 6956657 (2005)
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    [Crossref]
  23. M. Otsubo, K. Okada, and J. Tsujiuchi, “Measurement of large plane surface shapes by connecting small-aperture Interferograms,” Opt. Eng. 33(2), 608–613 (1994).
    [Crossref]
  24. X. Xudong, H. Qiushi, S. Zhengxiang, and W. Zhanshan, “Subaperture stitching interferometry with reduced reference errors for ultrasmooth surfaces,” Proc. SPIE 9962, 996208 (2016).
    [Crossref]
  25. X. Xudong, S. Zhengxiang, T. Guangde, and W. Zhanshan, “Sparse subaperture stitching method for measuring large aperture planar optics,” Opt. Eng. 55(2), 024103 (2016).
    [Crossref]

2018 (1)

X. Xudong, S. Zhengxiang, and W. Zhanshan, “Sensitivity coefficient for monitoring residual surface error in plane subaperture stitching interferometry,” Meas. Sci. Technol. 29(8), 085009 (2018).
[Crossref]

2017 (3)

Y. Inubushi, I. Inoue, J. Kim, A. Nishihara, S. Matsuyama, H. Yumoto, T. Koyama, K. Tono, H. Ohashi, K. Yamauchi, and M. Yabashi, “Measurement of the X-ray Spectrum of a Free Electron Laser with a Wide-Range High-Resolution Single-Shot Spectrometer,” Appl. Sci. 7(6), 584 (2017).
[Crossref]

D. Laundy, K. Sawhney, and V. Dhamgaye, “Using refractive optics to broaden the focus of an X-ray mirror,” J. Synchrotron Radiat. 24(4), 744–749 (2017).
[Crossref]

S. Chen, S. Xue, Y. Dai, and S. Li, “Subaperture stitching test of convex aspheres by using the reconfigurable optical null,” Opt. Laser Technol. 91, 175–184 (2017).
[Crossref]

2016 (2)

X. Xudong, H. Qiushi, S. Zhengxiang, and W. Zhanshan, “Subaperture stitching interferometry with reduced reference errors for ultrasmooth surfaces,” Proc. SPIE 9962, 996208 (2016).
[Crossref]

X. Xudong, S. Zhengxiang, T. Guangde, and W. Zhanshan, “Sparse subaperture stitching method for measuring large aperture planar optics,” Opt. Eng. 55(2), 024103 (2016).
[Crossref]

2015 (1)

2014 (1)

2013 (2)

E. Ikenaga, M. Kobata, H. Matsuda, T. Sugiyama, H. Daimon, and K. Kobayashi, “Development of high lateral and wide angle resolved hard X-ray photoemission spectroscopy at BL47XU in SPring-8,” J. Electron Spectrosc. Relat. Phenom. 190(B), 180–187 (2013).
[Crossref]

Y. Wen, H. Cheng, H.-Y. Tam, and D. Zhou, “Modified stitching algorithm for annular subaperture stitching interferometry for aspheric surfaces,” Appl. Opt. 52(23), 5686–5694 (2013).
[Crossref]

2012 (1)

2008 (1)

C. Zhao and J. Burge, “Stitching of off-axis sub-aperture null measurements of an aspheric surface,” Proc. SPIE 7063, 706316 (2008).
[Crossref]

2007 (2)

A. Rommeveaux, L. Assoufid, H. Ohashi, H. Mimura, K. Yamauchi, J. Qian, T. Ishikawa, C. Morawe, A. T. Macrander, A. Khounsary, and S. Goto, “Second metrology round-robin of APS, ESRF and SPring-8 laboratories of elliptical and spherical hard-x-ray mirrors,” Proc. SPIE 6704, 67040B (2007).
[Crossref]

H. Ohashi, T. Tsumura, H. Okada, H. Mimura, T. Masunaga, Y. Senba, S. Goto, K. Yamauchi, and T. Ishikawa, “Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long X-ray mirror,” Proc. SPIE 6704, 670405 (2007).
[Crossref]

2006 (1)

2005 (1)

2004 (2)

H. Mimura, H. Yumoto H, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, and K. Yamauchi, “Microstitching interferometry for nanofocusing mirror optics,” Proc. SPIE 5533, 171–180 (2004).
[Crossref]

F. Siewert, T. Noll, T. Schlegel, T. Zeschke, and H. Lammert, “The Nanometer Optical Component Measuring Machine: a new sub-nm topography measuring device for X-ray optics at BESSY,” AIP Conf. Proc. 705(1), 847–850 (2004).
[Crossref]

2003 (2)

K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Moriet, “Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining,” Rev. Sci. Instrum. 74(10), 4549–4553 (2003).
[Crossref]

K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, “Microstitching interferometry for x-ray reflective optics,” Rev. Sci. Instrum. 74(5), 2894–2898 (2003).
[Crossref]

1994 (1)

M. Otsubo, K. Okada, and J. Tsujiuchi, “Measurement of large plane surface shapes by connecting small-aperture Interferograms,” Opt. Eng. 33(2), 608–613 (1994).
[Crossref]

1988 (1)

P. Z. Takacs, S. K. Feng, E. L. Church, S. Qian, and W. Liu, “Long Trace Profile Measurements On Cylindrical Aspheres,” Proc. SPIE 0966, 354–364 (1988).
[Crossref]

Assoufid, L.

A. Rommeveaux, L. Assoufid, H. Ohashi, H. Mimura, K. Yamauchi, J. Qian, T. Ishikawa, C. Morawe, A. T. Macrander, A. Khounsary, and S. Goto, “Second metrology round-robin of APS, ESRF and SPring-8 laboratories of elliptical and spherical hard-x-ray mirrors,” Proc. SPIE 6704, 67040B (2007).
[Crossref]

Bichra, M.

M. Bichra, D. Ramua, K. K. Pant, G. S. Khan, S. Sinzinger, and C. Shakher, “Investigations on sub-aperture stitching approach for testing freeform optics,” in Imaging and Applied Optics 2015, OSA Technical Digest (online) (Optical Society of America, 2015), paper JT5A.12.

Burge, J.

C. Zhao and J. Burge, “Stitching of off-axis sub-aperture null measurements of an aspheric surface,” Proc. SPIE 7063, 706316 (2008).
[Crossref]

Burge, J. H.

Chen, S.

Chen, Y.

Cheng, H.

Church, E. L.

P. Z. Takacs, S. K. Feng, E. L. Church, S. Qian, and W. Liu, “Long Trace Profile Measurements On Cylindrical Aspheres,” Proc. SPIE 0966, 354–364 (1988).
[Crossref]

Dai, Y.

S. Chen, S. Xue, Y. Dai, and S. Li, “Subaperture stitching test of convex aspheres by using the reconfigurable optical null,” Opt. Laser Technol. 91, 175–184 (2017).
[Crossref]

S. Chen, W. Liao, Y. Dai, and S. Li, “Self-calibrated subaperture stitching test of hyper-hemispheres using latitude and longitude coordinates,” Appl. Opt. 51(17), 3817 (2012).
[Crossref]

S. Chen, S. Li, Y. Dai, and Z. Zheng, “Iterative algorithm for subaperture stitching test with spherical interferometers,” J. Opt. Soc. Am. A 23(5), 1219–1226 (2006).
[Crossref]

S. Li and Y. Dai, “Subaperture Stitching Interferometry,” in Large and Middle-Scale Aperture Aspheric Surfaces: Lapping, Polishing, and Measurement, S. Li and Y. Dai, eds. (John Wiley & Sons Singapore Pte. Ltd, 2017)

Dai Y, Y.

Daimon, H.

E. Ikenaga, M. Kobata, H. Matsuda, T. Sugiyama, H. Daimon, and K. Kobayashi, “Development of high lateral and wide angle resolved hard X-ray photoemission spectroscopy at BL47XU in SPring-8,” J. Electron Spectrosc. Relat. Phenom. 190(B), 180–187 (2013).
[Crossref]

Dhamgaye, V.

D. Laundy, K. Sawhney, and V. Dhamgaye, “Using refractive optics to broaden the focus of an X-ray mirror,” J. Synchrotron Radiat. 24(4), 744–749 (2017).
[Crossref]

Endo, K.

H. Mimura, H. Yumoto H, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, and K. Yamauchi, “Microstitching interferometry for nanofocusing mirror optics,” Proc. SPIE 5533, 171–180 (2004).
[Crossref]

K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, “Microstitching interferometry for x-ray reflective optics,” Rev. Sci. Instrum. 74(5), 2894–2898 (2003).
[Crossref]

K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Moriet, “Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining,” Rev. Sci. Instrum. 74(10), 4549–4553 (2003).
[Crossref]

Feng, S. K.

P. Z. Takacs, S. K. Feng, E. L. Church, S. Qian, and W. Liu, “Long Trace Profile Measurements On Cylindrical Aspheres,” Proc. SPIE 0966, 354–364 (1988).
[Crossref]

Forbes, G.

D. Golini, G. Forbes, and P. Murphy, “Method for self-calibrated sub-aperture stitching for surface figure measurement,” US Patent Specification 6956657 (2005)

Golini, D.

D. Golini, G. Forbes, and P. Murphy, “Method for self-calibrated sub-aperture stitching for surface figure measurement,” US Patent Specification 6956657 (2005)

Goto, S.

H. Ohashi, T. Tsumura, H. Okada, H. Mimura, T. Masunaga, Y. Senba, S. Goto, K. Yamauchi, and T. Ishikawa, “Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long X-ray mirror,” Proc. SPIE 6704, 670405 (2007).
[Crossref]

A. Rommeveaux, L. Assoufid, H. Ohashi, H. Mimura, K. Yamauchi, J. Qian, T. Ishikawa, C. Morawe, A. T. Macrander, A. Khounsary, and S. Goto, “Second metrology round-robin of APS, ESRF and SPring-8 laboratories of elliptical and spherical hard-x-ray mirrors,” Proc. SPIE 6704, 67040B (2007).
[Crossref]

Guangde, T.

X. Xudong, S. Zhengxiang, T. Guangde, and W. Zhanshan, “Sparse subaperture stitching method for measuring large aperture planar optics,” Opt. Eng. 55(2), 024103 (2016).
[Crossref]

Ikenaga, E.

E. Ikenaga, M. Kobata, H. Matsuda, T. Sugiyama, H. Daimon, and K. Kobayashi, “Development of high lateral and wide angle resolved hard X-ray photoemission spectroscopy at BL47XU in SPring-8,” J. Electron Spectrosc. Relat. Phenom. 190(B), 180–187 (2013).
[Crossref]

Inoue, I.

Y. Inubushi, I. Inoue, J. Kim, A. Nishihara, S. Matsuyama, H. Yumoto, T. Koyama, K. Tono, H. Ohashi, K. Yamauchi, and M. Yabashi, “Measurement of the X-ray Spectrum of a Free Electron Laser with a Wide-Range High-Resolution Single-Shot Spectrometer,” Appl. Sci. 7(6), 584 (2017).
[Crossref]

Inubushi, Y.

Y. Inubushi, I. Inoue, J. Kim, A. Nishihara, S. Matsuyama, H. Yumoto, T. Koyama, K. Tono, H. Ohashi, K. Yamauchi, and M. Yabashi, “Measurement of the X-ray Spectrum of a Free Electron Laser with a Wide-Range High-Resolution Single-Shot Spectrometer,” Appl. Sci. 7(6), 584 (2017).
[Crossref]

Ishikawa, T.

A. Rommeveaux, L. Assoufid, H. Ohashi, H. Mimura, K. Yamauchi, J. Qian, T. Ishikawa, C. Morawe, A. T. Macrander, A. Khounsary, and S. Goto, “Second metrology round-robin of APS, ESRF and SPring-8 laboratories of elliptical and spherical hard-x-ray mirrors,” Proc. SPIE 6704, 67040B (2007).
[Crossref]

H. Ohashi, T. Tsumura, H. Okada, H. Mimura, T. Masunaga, Y. Senba, S. Goto, K. Yamauchi, and T. Ishikawa, “Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long X-ray mirror,” Proc. SPIE 6704, 670405 (2007).
[Crossref]

H. Mimura, H. Yumoto H, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, and K. Yamauchi, “Microstitching interferometry for nanofocusing mirror optics,” Proc. SPIE 5533, 171–180 (2004).
[Crossref]

K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, “Microstitching interferometry for x-ray reflective optics,” Rev. Sci. Instrum. 74(5), 2894–2898 (2003).
[Crossref]

K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Moriet, “Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining,” Rev. Sci. Instrum. 74(10), 4549–4553 (2003).
[Crossref]

Khan, G. S.

M. Bichra, D. Ramua, K. K. Pant, G. S. Khan, S. Sinzinger, and C. Shakher, “Investigations on sub-aperture stitching approach for testing freeform optics,” in Imaging and Applied Optics 2015, OSA Technical Digest (online) (Optical Society of America, 2015), paper JT5A.12.

Khounsary, A.

A. Rommeveaux, L. Assoufid, H. Ohashi, H. Mimura, K. Yamauchi, J. Qian, T. Ishikawa, C. Morawe, A. T. Macrander, A. Khounsary, and S. Goto, “Second metrology round-robin of APS, ESRF and SPring-8 laboratories of elliptical and spherical hard-x-ray mirrors,” Proc. SPIE 6704, 67040B (2007).
[Crossref]

Kim, J.

Y. Inubushi, I. Inoue, J. Kim, A. Nishihara, S. Matsuyama, H. Yumoto, T. Koyama, K. Tono, H. Ohashi, K. Yamauchi, and M. Yabashi, “Measurement of the X-ray Spectrum of a Free Electron Laser with a Wide-Range High-Resolution Single-Shot Spectrometer,” Appl. Sci. 7(6), 584 (2017).
[Crossref]

Kobata, M.

E. Ikenaga, M. Kobata, H. Matsuda, T. Sugiyama, H. Daimon, and K. Kobayashi, “Development of high lateral and wide angle resolved hard X-ray photoemission spectroscopy at BL47XU in SPring-8,” J. Electron Spectrosc. Relat. Phenom. 190(B), 180–187 (2013).
[Crossref]

Kobayashi, K.

E. Ikenaga, M. Kobata, H. Matsuda, T. Sugiyama, H. Daimon, and K. Kobayashi, “Development of high lateral and wide angle resolved hard X-ray photoemission spectroscopy at BL47XU in SPring-8,” J. Electron Spectrosc. Relat. Phenom. 190(B), 180–187 (2013).
[Crossref]

Koyama, T.

Y. Inubushi, I. Inoue, J. Kim, A. Nishihara, S. Matsuyama, H. Yumoto, T. Koyama, K. Tono, H. Ohashi, K. Yamauchi, and M. Yabashi, “Measurement of the X-ray Spectrum of a Free Electron Laser with a Wide-Range High-Resolution Single-Shot Spectrometer,” Appl. Sci. 7(6), 584 (2017).
[Crossref]

Lammert, H.

F. Siewert, T. Noll, T. Schlegel, T. Zeschke, and H. Lammert, “The Nanometer Optical Component Measuring Machine: a new sub-nm topography measuring device for X-ray optics at BESSY,” AIP Conf. Proc. 705(1), 847–850 (2004).
[Crossref]

Laundy, D.

D. Laundy, K. Sawhney, and V. Dhamgaye, “Using refractive optics to broaden the focus of an X-ray mirror,” J. Synchrotron Radiat. 24(4), 744–749 (2017).
[Crossref]

Li, S.

S. Chen, S. Xue, Y. Dai, and S. Li, “Subaperture stitching test of convex aspheres by using the reconfigurable optical null,” Opt. Laser Technol. 91, 175–184 (2017).
[Crossref]

S. Chen, W. Liao, Y. Dai, and S. Li, “Self-calibrated subaperture stitching test of hyper-hemispheres using latitude and longitude coordinates,” Appl. Opt. 51(17), 3817 (2012).
[Crossref]

S. Chen, S. Li, Y. Dai, and Z. Zheng, “Iterative algorithm for subaperture stitching test with spherical interferometers,” J. Opt. Soc. Am. A 23(5), 1219–1226 (2006).
[Crossref]

S. Chen, S. Li, and Y. Dai Y, “Iterative algorithm for subaperture stitching interferometry for general surfaces,” J. Opt. Soc. Am. A 22(9), 1929–1936 (2005).
[Crossref]

S. Li and Y. Dai, “Subaperture Stitching Interferometry,” in Large and Middle-Scale Aperture Aspheric Surfaces: Lapping, Polishing, and Measurement, S. Li and Y. Dai, eds. (John Wiley & Sons Singapore Pte. Ltd, 2017)

Liao, W.

Liu, W.

P. Z. Takacs, S. K. Feng, E. L. Church, S. Qian, and W. Liu, “Long Trace Profile Measurements On Cylindrical Aspheres,” Proc. SPIE 0966, 354–364 (1988).
[Crossref]

Macrander, A. T.

A. Rommeveaux, L. Assoufid, H. Ohashi, H. Mimura, K. Yamauchi, J. Qian, T. Ishikawa, C. Morawe, A. T. Macrander, A. Khounsary, and S. Goto, “Second metrology round-robin of APS, ESRF and SPring-8 laboratories of elliptical and spherical hard-x-ray mirrors,” Proc. SPIE 6704, 67040B (2007).
[Crossref]

Masunaga, T.

H. Ohashi, T. Tsumura, H. Okada, H. Mimura, T. Masunaga, Y. Senba, S. Goto, K. Yamauchi, and T. Ishikawa, “Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long X-ray mirror,” Proc. SPIE 6704, 670405 (2007).
[Crossref]

Matsuda, H.

E. Ikenaga, M. Kobata, H. Matsuda, T. Sugiyama, H. Daimon, and K. Kobayashi, “Development of high lateral and wide angle resolved hard X-ray photoemission spectroscopy at BL47XU in SPring-8,” J. Electron Spectrosc. Relat. Phenom. 190(B), 180–187 (2013).
[Crossref]

Matsuyama, S.

Y. Inubushi, I. Inoue, J. Kim, A. Nishihara, S. Matsuyama, H. Yumoto, T. Koyama, K. Tono, H. Ohashi, K. Yamauchi, and M. Yabashi, “Measurement of the X-ray Spectrum of a Free Electron Laser with a Wide-Range High-Resolution Single-Shot Spectrometer,” Appl. Sci. 7(6), 584 (2017).
[Crossref]

H. Mimura, H. Yumoto H, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, and K. Yamauchi, “Microstitching interferometry for nanofocusing mirror optics,” Proc. SPIE 5533, 171–180 (2004).
[Crossref]

Miao, E.

Mimura, H.

A. Rommeveaux, L. Assoufid, H. Ohashi, H. Mimura, K. Yamauchi, J. Qian, T. Ishikawa, C. Morawe, A. T. Macrander, A. Khounsary, and S. Goto, “Second metrology round-robin of APS, ESRF and SPring-8 laboratories of elliptical and spherical hard-x-ray mirrors,” Proc. SPIE 6704, 67040B (2007).
[Crossref]

H. Ohashi, T. Tsumura, H. Okada, H. Mimura, T. Masunaga, Y. Senba, S. Goto, K. Yamauchi, and T. Ishikawa, “Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long X-ray mirror,” Proc. SPIE 6704, 670405 (2007).
[Crossref]

H. Mimura, H. Yumoto H, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, and K. Yamauchi, “Microstitching interferometry for nanofocusing mirror optics,” Proc. SPIE 5533, 171–180 (2004).
[Crossref]

K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, “Microstitching interferometry for x-ray reflective optics,” Rev. Sci. Instrum. 74(5), 2894–2898 (2003).
[Crossref]

K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Moriet, “Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining,” Rev. Sci. Instrum. 74(10), 4549–4553 (2003).
[Crossref]

Morawe, C.

A. Rommeveaux, L. Assoufid, H. Ohashi, H. Mimura, K. Yamauchi, J. Qian, T. Ishikawa, C. Morawe, A. T. Macrander, A. Khounsary, and S. Goto, “Second metrology round-robin of APS, ESRF and SPring-8 laboratories of elliptical and spherical hard-x-ray mirrors,” Proc. SPIE 6704, 67040B (2007).
[Crossref]

Mori, Y.

H. Mimura, H. Yumoto H, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, and K. Yamauchi, “Microstitching interferometry for nanofocusing mirror optics,” Proc. SPIE 5533, 171–180 (2004).
[Crossref]

K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, “Microstitching interferometry for x-ray reflective optics,” Rev. Sci. Instrum. 74(5), 2894–2898 (2003).
[Crossref]

Moriet, Y.

K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Moriet, “Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining,” Rev. Sci. Instrum. 74(10), 4549–4553 (2003).
[Crossref]

Murphy, P.

D. Golini, G. Forbes, and P. Murphy, “Method for self-calibrated sub-aperture stitching for surface figure measurement,” US Patent Specification 6956657 (2005)

Nishihara, A.

Y. Inubushi, I. Inoue, J. Kim, A. Nishihara, S. Matsuyama, H. Yumoto, T. Koyama, K. Tono, H. Ohashi, K. Yamauchi, and M. Yabashi, “Measurement of the X-ray Spectrum of a Free Electron Laser with a Wide-Range High-Resolution Single-Shot Spectrometer,” Appl. Sci. 7(6), 584 (2017).
[Crossref]

Nishino, Y.

H. Mimura, H. Yumoto H, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, and K. Yamauchi, “Microstitching interferometry for nanofocusing mirror optics,” Proc. SPIE 5533, 171–180 (2004).
[Crossref]

Noll, T.

F. Siewert, T. Noll, T. Schlegel, T. Zeschke, and H. Lammert, “The Nanometer Optical Component Measuring Machine: a new sub-nm topography measuring device for X-ray optics at BESSY,” AIP Conf. Proc. 705(1), 847–850 (2004).
[Crossref]

Ohashi, H.

Y. Inubushi, I. Inoue, J. Kim, A. Nishihara, S. Matsuyama, H. Yumoto, T. Koyama, K. Tono, H. Ohashi, K. Yamauchi, and M. Yabashi, “Measurement of the X-ray Spectrum of a Free Electron Laser with a Wide-Range High-Resolution Single-Shot Spectrometer,” Appl. Sci. 7(6), 584 (2017).
[Crossref]

A. Rommeveaux, L. Assoufid, H. Ohashi, H. Mimura, K. Yamauchi, J. Qian, T. Ishikawa, C. Morawe, A. T. Macrander, A. Khounsary, and S. Goto, “Second metrology round-robin of APS, ESRF and SPring-8 laboratories of elliptical and spherical hard-x-ray mirrors,” Proc. SPIE 6704, 67040B (2007).
[Crossref]

H. Ohashi, T. Tsumura, H. Okada, H. Mimura, T. Masunaga, Y. Senba, S. Goto, K. Yamauchi, and T. Ishikawa, “Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long X-ray mirror,” Proc. SPIE 6704, 670405 (2007).
[Crossref]

Okada, H.

H. Ohashi, T. Tsumura, H. Okada, H. Mimura, T. Masunaga, Y. Senba, S. Goto, K. Yamauchi, and T. Ishikawa, “Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long X-ray mirror,” Proc. SPIE 6704, 670405 (2007).
[Crossref]

Okada, K.

M. Otsubo, K. Okada, and J. Tsujiuchi, “Measurement of large plane surface shapes by connecting small-aperture Interferograms,” Opt. Eng. 33(2), 608–613 (1994).
[Crossref]

Otsubo, M.

M. Otsubo, K. Okada, and J. Tsujiuchi, “Measurement of large plane surface shapes by connecting small-aperture Interferograms,” Opt. Eng. 33(2), 608–613 (1994).
[Crossref]

Pant, K. K.

M. Bichra, D. Ramua, K. K. Pant, G. S. Khan, S. Sinzinger, and C. Shakher, “Investigations on sub-aperture stitching approach for testing freeform optics,” in Imaging and Applied Optics 2015, OSA Technical Digest (online) (Optical Society of America, 2015), paper JT5A.12.

Qian, J.

A. Rommeveaux, L. Assoufid, H. Ohashi, H. Mimura, K. Yamauchi, J. Qian, T. Ishikawa, C. Morawe, A. T. Macrander, A. Khounsary, and S. Goto, “Second metrology round-robin of APS, ESRF and SPring-8 laboratories of elliptical and spherical hard-x-ray mirrors,” Proc. SPIE 6704, 67040B (2007).
[Crossref]

Qian, S.

P. Z. Takacs, S. K. Feng, E. L. Church, S. Qian, and W. Liu, “Long Trace Profile Measurements On Cylindrical Aspheres,” Proc. SPIE 0966, 354–364 (1988).
[Crossref]

Qiushi, H.

X. Xudong, H. Qiushi, S. Zhengxiang, and W. Zhanshan, “Subaperture stitching interferometry with reduced reference errors for ultrasmooth surfaces,” Proc. SPIE 9962, 996208 (2016).
[Crossref]

Ramua, D.

M. Bichra, D. Ramua, K. K. Pant, G. S. Khan, S. Sinzinger, and C. Shakher, “Investigations on sub-aperture stitching approach for testing freeform optics,” in Imaging and Applied Optics 2015, OSA Technical Digest (online) (Optical Society of America, 2015), paper JT5A.12.

Rommeveaux, A.

A. Rommeveaux, L. Assoufid, H. Ohashi, H. Mimura, K. Yamauchi, J. Qian, T. Ishikawa, C. Morawe, A. T. Macrander, A. Khounsary, and S. Goto, “Second metrology round-robin of APS, ESRF and SPring-8 laboratories of elliptical and spherical hard-x-ray mirrors,” Proc. SPIE 6704, 67040B (2007).
[Crossref]

Saito, A.

K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Moriet, “Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining,” Rev. Sci. Instrum. 74(10), 4549–4553 (2003).
[Crossref]

K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, “Microstitching interferometry for x-ray reflective optics,” Rev. Sci. Instrum. 74(5), 2894–2898 (2003).
[Crossref]

Sano, Y.

H. Mimura, H. Yumoto H, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, and K. Yamauchi, “Microstitching interferometry for nanofocusing mirror optics,” Proc. SPIE 5533, 171–180 (2004).
[Crossref]

K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, “Microstitching interferometry for x-ray reflective optics,” Rev. Sci. Instrum. 74(5), 2894–2898 (2003).
[Crossref]

K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Moriet, “Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining,” Rev. Sci. Instrum. 74(10), 4549–4553 (2003).
[Crossref]

Sawhney, K.

D. Laundy, K. Sawhney, and V. Dhamgaye, “Using refractive optics to broaden the focus of an X-ray mirror,” J. Synchrotron Radiat. 24(4), 744–749 (2017).
[Crossref]

Schlegel, T.

F. Siewert, T. Noll, T. Schlegel, T. Zeschke, and H. Lammert, “The Nanometer Optical Component Measuring Machine: a new sub-nm topography measuring device for X-ray optics at BESSY,” AIP Conf. Proc. 705(1), 847–850 (2004).
[Crossref]

Senba, Y.

H. Ohashi, T. Tsumura, H. Okada, H. Mimura, T. Masunaga, Y. Senba, S. Goto, K. Yamauchi, and T. Ishikawa, “Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long X-ray mirror,” Proc. SPIE 6704, 670405 (2007).
[Crossref]

Shakher, C.

M. Bichra, D. Ramua, K. K. Pant, G. S. Khan, S. Sinzinger, and C. Shakher, “Investigations on sub-aperture stitching approach for testing freeform optics,” in Imaging and Applied Optics 2015, OSA Technical Digest (online) (Optical Society of America, 2015), paper JT5A.12.

Siewert, F.

F. Siewert, T. Noll, T. Schlegel, T. Zeschke, and H. Lammert, “The Nanometer Optical Component Measuring Machine: a new sub-nm topography measuring device for X-ray optics at BESSY,” AIP Conf. Proc. 705(1), 847–850 (2004).
[Crossref]

Sinzinger, S.

M. Bichra, D. Ramua, K. K. Pant, G. S. Khan, S. Sinzinger, and C. Shakher, “Investigations on sub-aperture stitching approach for testing freeform optics,” in Imaging and Applied Optics 2015, OSA Technical Digest (online) (Optical Society of America, 2015), paper JT5A.12.

Smith, G. A.

Souvorov, A.

K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Moriet, “Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining,” Rev. Sci. Instrum. 74(10), 4549–4553 (2003).
[Crossref]

K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, “Microstitching interferometry for x-ray reflective optics,” Rev. Sci. Instrum. 74(5), 2894–2898 (2003).
[Crossref]

Sugiyama, T.

E. Ikenaga, M. Kobata, H. Matsuda, T. Sugiyama, H. Daimon, and K. Kobayashi, “Development of high lateral and wide angle resolved hard X-ray photoemission spectroscopy at BL47XU in SPring-8,” J. Electron Spectrosc. Relat. Phenom. 190(B), 180–187 (2013).
[Crossref]

Sui, Y.

Takacs, P. Z.

P. Z. Takacs, S. K. Feng, E. L. Church, S. Qian, and W. Liu, “Long Trace Profile Measurements On Cylindrical Aspheres,” Proc. SPIE 0966, 354–364 (1988).
[Crossref]

Tam, H.-Y.

Tamasaku, K.

H. Mimura, H. Yumoto H, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, and K. Yamauchi, “Microstitching interferometry for nanofocusing mirror optics,” Proc. SPIE 5533, 171–180 (2004).
[Crossref]

K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, “Microstitching interferometry for x-ray reflective optics,” Rev. Sci. Instrum. 74(5), 2894–2898 (2003).
[Crossref]

K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Moriet, “Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining,” Rev. Sci. Instrum. 74(10), 4549–4553 (2003).
[Crossref]

Tono, K.

Y. Inubushi, I. Inoue, J. Kim, A. Nishihara, S. Matsuyama, H. Yumoto, T. Koyama, K. Tono, H. Ohashi, K. Yamauchi, and M. Yabashi, “Measurement of the X-ray Spectrum of a Free Electron Laser with a Wide-Range High-Resolution Single-Shot Spectrometer,” Appl. Sci. 7(6), 584 (2017).
[Crossref]

Tsujiuchi, J.

M. Otsubo, K. Okada, and J. Tsujiuchi, “Measurement of large plane surface shapes by connecting small-aperture Interferograms,” Opt. Eng. 33(2), 608–613 (1994).
[Crossref]

Tsumura, T.

H. Ohashi, T. Tsumura, H. Okada, H. Mimura, T. Masunaga, Y. Senba, S. Goto, K. Yamauchi, and T. Ishikawa, “Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long X-ray mirror,” Proc. SPIE 6704, 670405 (2007).
[Crossref]

Ueno, K.

H. Mimura, H. Yumoto H, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, and K. Yamauchi, “Microstitching interferometry for nanofocusing mirror optics,” Proc. SPIE 5533, 171–180 (2004).
[Crossref]

K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, “Microstitching interferometry for x-ray reflective optics,” Rev. Sci. Instrum. 74(5), 2894–2898 (2003).
[Crossref]

Wen, Y.

Xudong, X.

X. Xudong, S. Zhengxiang, and W. Zhanshan, “Sensitivity coefficient for monitoring residual surface error in plane subaperture stitching interferometry,” Meas. Sci. Technol. 29(8), 085009 (2018).
[Crossref]

X. Xudong, H. Qiushi, S. Zhengxiang, and W. Zhanshan, “Subaperture stitching interferometry with reduced reference errors for ultrasmooth surfaces,” Proc. SPIE 9962, 996208 (2016).
[Crossref]

X. Xudong, S. Zhengxiang, T. Guangde, and W. Zhanshan, “Sparse subaperture stitching method for measuring large aperture planar optics,” Opt. Eng. 55(2), 024103 (2016).
[Crossref]

Xue, S.

S. Chen, S. Xue, Y. Dai, and S. Li, “Subaperture stitching test of convex aspheres by using the reconfigurable optical null,” Opt. Laser Technol. 91, 175–184 (2017).
[Crossref]

Yabashi, M.

Y. Inubushi, I. Inoue, J. Kim, A. Nishihara, S. Matsuyama, H. Yumoto, T. Koyama, K. Tono, H. Ohashi, K. Yamauchi, and M. Yabashi, “Measurement of the X-ray Spectrum of a Free Electron Laser with a Wide-Range High-Resolution Single-Shot Spectrometer,” Appl. Sci. 7(6), 584 (2017).
[Crossref]

H. Mimura, H. Yumoto H, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, and K. Yamauchi, “Microstitching interferometry for nanofocusing mirror optics,” Proc. SPIE 5533, 171–180 (2004).
[Crossref]

K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, “Microstitching interferometry for x-ray reflective optics,” Rev. Sci. Instrum. 74(5), 2894–2898 (2003).
[Crossref]

K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Moriet, “Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining,” Rev. Sci. Instrum. 74(10), 4549–4553 (2003).
[Crossref]

Yamamura, K.

H. Mimura, H. Yumoto H, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, and K. Yamauchi, “Microstitching interferometry for nanofocusing mirror optics,” Proc. SPIE 5533, 171–180 (2004).
[Crossref]

K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, “Microstitching interferometry for x-ray reflective optics,” Rev. Sci. Instrum. 74(5), 2894–2898 (2003).
[Crossref]

K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Moriet, “Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining,” Rev. Sci. Instrum. 74(10), 4549–4553 (2003).
[Crossref]

Yamauchi, K.

Y. Inubushi, I. Inoue, J. Kim, A. Nishihara, S. Matsuyama, H. Yumoto, T. Koyama, K. Tono, H. Ohashi, K. Yamauchi, and M. Yabashi, “Measurement of the X-ray Spectrum of a Free Electron Laser with a Wide-Range High-Resolution Single-Shot Spectrometer,” Appl. Sci. 7(6), 584 (2017).
[Crossref]

A. Rommeveaux, L. Assoufid, H. Ohashi, H. Mimura, K. Yamauchi, J. Qian, T. Ishikawa, C. Morawe, A. T. Macrander, A. Khounsary, and S. Goto, “Second metrology round-robin of APS, ESRF and SPring-8 laboratories of elliptical and spherical hard-x-ray mirrors,” Proc. SPIE 6704, 67040B (2007).
[Crossref]

H. Ohashi, T. Tsumura, H. Okada, H. Mimura, T. Masunaga, Y. Senba, S. Goto, K. Yamauchi, and T. Ishikawa, “Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long X-ray mirror,” Proc. SPIE 6704, 670405 (2007).
[Crossref]

H. Mimura, H. Yumoto H, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, and K. Yamauchi, “Microstitching interferometry for nanofocusing mirror optics,” Proc. SPIE 5533, 171–180 (2004).
[Crossref]

K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, “Microstitching interferometry for x-ray reflective optics,” Rev. Sci. Instrum. 74(5), 2894–2898 (2003).
[Crossref]

K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Moriet, “Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining,” Rev. Sci. Instrum. 74(10), 4549–4553 (2003).
[Crossref]

Yang, H.

Yumoto, H.

Y. Inubushi, I. Inoue, J. Kim, A. Nishihara, S. Matsuyama, H. Yumoto, T. Koyama, K. Tono, H. Ohashi, K. Yamauchi, and M. Yabashi, “Measurement of the X-ray Spectrum of a Free Electron Laser with a Wide-Range High-Resolution Single-Shot Spectrometer,” Appl. Sci. 7(6), 584 (2017).
[Crossref]

Yumoto H, H.

H. Mimura, H. Yumoto H, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, and K. Yamauchi, “Microstitching interferometry for nanofocusing mirror optics,” Proc. SPIE 5533, 171–180 (2004).
[Crossref]

Zeschke, T.

F. Siewert, T. Noll, T. Schlegel, T. Zeschke, and H. Lammert, “The Nanometer Optical Component Measuring Machine: a new sub-nm topography measuring device for X-ray optics at BESSY,” AIP Conf. Proc. 705(1), 847–850 (2004).
[Crossref]

Zhanshan, W.

X. Xudong, S. Zhengxiang, and W. Zhanshan, “Sensitivity coefficient for monitoring residual surface error in plane subaperture stitching interferometry,” Meas. Sci. Technol. 29(8), 085009 (2018).
[Crossref]

X. Xudong, S. Zhengxiang, T. Guangde, and W. Zhanshan, “Sparse subaperture stitching method for measuring large aperture planar optics,” Opt. Eng. 55(2), 024103 (2016).
[Crossref]

X. Xudong, H. Qiushi, S. Zhengxiang, and W. Zhanshan, “Subaperture stitching interferometry with reduced reference errors for ultrasmooth surfaces,” Proc. SPIE 9962, 996208 (2016).
[Crossref]

Zhao, C.

C. Zhao and J. Burge, “Stitching of off-axis sub-aperture null measurements of an aspheric surface,” Proc. SPIE 7063, 706316 (2008).
[Crossref]

Zheng, Z.

Zhengxiang, S.

X. Xudong, S. Zhengxiang, and W. Zhanshan, “Sensitivity coefficient for monitoring residual surface error in plane subaperture stitching interferometry,” Meas. Sci. Technol. 29(8), 085009 (2018).
[Crossref]

X. Xudong, H. Qiushi, S. Zhengxiang, and W. Zhanshan, “Subaperture stitching interferometry with reduced reference errors for ultrasmooth surfaces,” Proc. SPIE 9962, 996208 (2016).
[Crossref]

X. Xudong, S. Zhengxiang, T. Guangde, and W. Zhanshan, “Sparse subaperture stitching method for measuring large aperture planar optics,” Opt. Eng. 55(2), 024103 (2016).
[Crossref]

Zhou, D.

AIP Conf. Proc. (1)

F. Siewert, T. Noll, T. Schlegel, T. Zeschke, and H. Lammert, “The Nanometer Optical Component Measuring Machine: a new sub-nm topography measuring device for X-ray optics at BESSY,” AIP Conf. Proc. 705(1), 847–850 (2004).
[Crossref]

Appl. Opt. (3)

Appl. Sci. (1)

Y. Inubushi, I. Inoue, J. Kim, A. Nishihara, S. Matsuyama, H. Yumoto, T. Koyama, K. Tono, H. Ohashi, K. Yamauchi, and M. Yabashi, “Measurement of the X-ray Spectrum of a Free Electron Laser with a Wide-Range High-Resolution Single-Shot Spectrometer,” Appl. Sci. 7(6), 584 (2017).
[Crossref]

J. Electron Spectrosc. Relat. Phenom. (1)

E. Ikenaga, M. Kobata, H. Matsuda, T. Sugiyama, H. Daimon, and K. Kobayashi, “Development of high lateral and wide angle resolved hard X-ray photoemission spectroscopy at BL47XU in SPring-8,” J. Electron Spectrosc. Relat. Phenom. 190(B), 180–187 (2013).
[Crossref]

J. Opt. Soc. Am. A (2)

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[Crossref]

Meas. Sci. Technol. (1)

X. Xudong, S. Zhengxiang, and W. Zhanshan, “Sensitivity coefficient for monitoring residual surface error in plane subaperture stitching interferometry,” Meas. Sci. Technol. 29(8), 085009 (2018).
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S. Chen, S. Xue, Y. Dai, and S. Li, “Subaperture stitching test of convex aspheres by using the reconfigurable optical null,” Opt. Laser Technol. 91, 175–184 (2017).
[Crossref]

Proc. SPIE (6)

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Rev. Sci. Instrum. (2)

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M. Bichra, D. Ramua, K. K. Pant, G. S. Khan, S. Sinzinger, and C. Shakher, “Investigations on sub-aperture stitching approach for testing freeform optics,” in Imaging and Applied Optics 2015, OSA Technical Digest (online) (Optical Society of America, 2015), paper JT5A.12.

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Figures (7)

Fig. 1.
Fig. 1. (a) Schematic of the stitching interferometry measurement system, (b) the arrangement of the subapertures and the black box represents the measured rectangular mirror (c) two neighboring single aperture images before stitching.
Fig. 2.
Fig. 2. Figure differences of the two measurements performed from the left to the right and from the right to the left of the mirror using the adjacent stitching algorithm (a) and using the global stitching algorithm (b).
Fig. 3.
Fig. 3. Figure differences between the backward and forward measurements using: (a) 24-subaperture stitching (overlap ratio of 79.0%) and (b) 16-subaperture stitching (overlap ratio of 68.8%).
Fig. 4.
Fig. 4. Stitching surface of experiment #1 (a) and experiment #3 (b) with the best-fit spheres removed. (c) Figure difference between the results of experiments #1 and #3.
Fig. 5.
Fig. 5. (a) Centerlines of the center subaperture in experiments #1 and #3 with the best-fit sphere removed. (b) Centerlines of the two stitching surfaces with the best-fit sphere removed.
Fig. 6.
Fig. 6. Stitching results using 5 × 10−5 rad slope threshold: (a) figure difference between the stitching surfaces of experiments #1 and #3 and (b) centerlines with the best-fit sphere removed.
Fig. 7.
Fig. 7. Comparison of the stitching and NOM measurement results: (a) the centerline of the stitching surface in experiment #1 using a threshold slope of 5 × 10−5 rad and the centerline measured using SSRF NOM with the best-fit sphere subtracted in both cases and (b) the height difference of the two measurements shown in (a).

Equations (3)

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z n ( x , y ) = z n ( x , y ) + a n x + b n y + c n ,
f = j = 1 N i = 0 j 1 { i j [ z i ( x , y ) z j ( x , y ) ] 2 } = j = 1 N i = 0 j 1 { i j [ z i ( x , y ) z j ( x , y ) + a i x + b i y + c i a j x b j y c j ] 2 } = min
{ z ( x , y ) = { z o ( x , y ) ,  if  θ ( x , y ) < θ Ths NaN ,  if  θ ( x , y ) θ Ths     θ ( x , y ) = θ x 2 ( x , y ) + θ y 2 ( x , y ) θ x ( x , y ) = 1 2 d [ z o ( x + 1 , y ) z o ( x 1 , y ) ] θ y ( x , y ) = 1 2 d [ z o ( x , y + 1 ) z o ( x , y 1 ) ]

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