Optical properties of refractory metal based thin films

Archan Banerjee; Robert M. Heath; Dmitry Morozov; Dilini Hemakumara; Umberto Nasti; Iain Thayne; Robert H. Hadfield

doi:10.1364/OME.8.002072

Optical properties of refractory metal based thin films

Archan Banerjee, Robert M. Heath, Dmitry Morozov, Dilini Hemakumara, Umberto Nasti, Iain Thayne, and Robert H. Hadfield

Optical Materials Express
Vol. 8,
Issue 8,
pp. 2072-2088
(2018)
•https://doi.org/10.1364/OME.8.002072

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Archan Banerjee, Robert M. Heath, Dmitry Morozov, Dilini Hemakumara, Umberto Nasti, Iain Thayne, and Robert H. Hadfield, "Optical properties of refractory metal based thin films," Opt. Mater. Express 8, 2072-2088 (2018)

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Related Topics
Table of Contents Category
- Plasmonics
Optics & Photonics Topics
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The topics in this list come from the OSA Optics and Photonics Topics applied to this article.

About this Article
History
- Original Manuscript: March 23, 2018
- Revised Manuscript: May 19, 2018
- Manuscript Accepted: June 21, 2018
- Published: July 5, 2018

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Open Access

Abstract

There is growing interest in refractory metal thin films for a range of emerging nanophotonic applications, including high temperature plasmonic structures and infrared superconducting single photon detectors. We present a detailed comparison of optical properties for key representative materials in this class (NbN, NbTiN, TiN and MoSi) with texture varying from crystalline to amorphous. NbN, NbTiN and MoSi have been grown in an ultra-high vacuum sputter deposition system on silicon substrates at room temperature. Two different techniques (sputtering and atomic layer deposition) have been employed to deposit TiN. We have carried out variable angle ellipsometric measurements of optical properties from ultraviolet to mid-infrared wavelengths. We compare with high resolution transmission electron microscopy analysis of microstructure. Sputter-deposited TiN and MoSi have shown the highest optical absorption in the infrared wavelengths relative to NbN, NbTiN and ALD-deposited TiN. We have also modelled the performance of a semi-infinite metal air interface as a plasmonic structure with the above mentioned refractory metal based thin films as the plasmonic components. This study has implications for the design of next-generation superconducting nanowire single photon detectors and plasmonic nanostructure-based devices.

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P. Patsalas, N. Kalfagiannis, S. Kassavetis, G. Abadias, D. V. Bellas, C. Lekka, and E. Lidorikis, “Conductive nitrides: growth principles, optical and electronic properties, and their perspectives in photonics and plasmonics,” Mater. Sci. Eng. Rep. 123, 1–55 (2018).
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[Crossref]

2017 (3)

D. Shah, H. Reddy, N. Kinsey, V. M. Shalaev, and A. Boltasseva, “Optical properties of plasmonic ultrathin TiN Films,” Adv. Opt. Mater. 5(13), 1700065 (2017).
[Crossref]

A. Banerjee, L. J. Baker, A. Doye, M. Nord, R. M. Heath, K. Erotokritou, D. Bosworth, Z. H. Barber, I. MacLaren, and R. H. Hadfield, “Characterisation of amorphous molybdenum silicide (MoSi) superconducting thin films and nanowires,” Supercond. Sci. Technol. 30(8), 084010 (2017).
[Crossref]

J. A. Briggs, G. V. Naik, Y. Zhao, T. A. Petach, K. Sahasrabuddhe, D. Goldhaber-Gordon, N. A. Melosh, and J. A. Dionne, “Temperature-dependent optical properties of titanium nitride,” Appl. Phys. Lett. 110(10), 101901 (2017).
[Crossref]

2016 (3)

A. Lalisse, G. Tessier, J. Plain, and G. Baffou, “Plasmonic efficiencies of nanoparticles made of metal nitrides (TiN, ZrN) compared with gold,” Sci. Rep. 6(1), 38647 (2016).
[Crossref] [PubMed]

J. Li, R. A. Kirkwood, L. J. Baker, D. Bosworth, K. Erotokritou, A. Banerjee, R. M. Heath, C. M. Natarajan, Z. H. Barber, M. Sorel, and R. H. Hadfield, “Nano-optical single-photon response mapping of waveguide integrated molybdenum silicide (MoSi) superconducting nanowires,” Opt. Express 24(13), 13931–13938 (2016).
[Crossref] [PubMed]

C. Della Giovampaola and N. Engheta, “Plasmonics without negative dielectrics,” Phys. Rev. B 93(19), 195152 (2016).
[Crossref]

2015 (6)

R. M. Heath, M. G. Tanner, T. D. Drysdale, S. Miki, V. Giannini, S. A. Maier, and R. H. Hadfield, “Nanoantenna enhancement for telecom-wavelength superconducting single photon detectors,” Nano Lett. 15(2), 819–822 (2015).
[Crossref] [PubMed]

M. S. Allman, V. B. Verma, M. Stevens, T. Gerrits, R. D. Horansky, E. Lita, F. Marsili, A. Beyer, M. D. Shaw, D. Kumor, R. Mirin, and S. W. Nam, “A near-infrared 64-pixel superconducting nanowire single photon detector array with integrated multiplexed readout,” Appl. Phys. Lett. 106(19), 192601 (2015).
[Crossref]

P. Patsalas, N. Kalfagiannis, and S. Kassavetis, “Optical properties and plasmonic performance of titanium nitride,” Materials (Basel) 8(12), 3128–3154 (2015).
[Crossref]

D. Bosworth, S.-L. Sahonta, R. H. Hadfield, and Z. H. Barber, “Amorphous molybdenum silicon superconducting thin films,” AIP Adv. 5(8), 087106 (2015).
[Crossref]

D. M. O’Carroll, “Nanophotonics and plasmonics for solar energy harvesting and conversion,” J. Photonics Energy 5(1), 057001 (2015).
[Crossref]

C. M. Zgrabik and E. L. Hu, “Optimization of sputtered titanium nitride as a tunable metal for plasmonic applications,” Opt. Mater. Express 5(12), 2786 (2015).
[Crossref]

2014 (2)

W. Li, U. Guler, N. Kinsey, G. V. Naik, A. Boltasseva, J. Guan, V. M. Shalaev, and A. V. Kildishev, “Refractory plasmonics with titanium nitride: broadband metamaterial absorber,” Adv. Mater. 26(47), 7959–7965 (2014).
[Crossref] [PubMed]

Y. P. Korneeva, M. Y. Mikhailov, Y. P. Pershin, N. N. Manova, A. V. Divochiy, Y. B. Vakhtomin, A. A. Korneev, K. V. Smirnov, A. G. Sivakov, A. Y. Devizenko, and G. N. Goltsman, “Superconducting single-photon detector made of MoSi film,” Supercond. Sci. Technol. 27(9), 095012 (2014).
[Crossref]

2013 (2)

S. Miki, T. Yamashita, H. Terai, and Z. Wang, “High performance fiber-coupled NbTiN superconducting nanowire single photon detectors with Gifford-McMahon cryocooler,” Opt. Express 21(8), 10208–10214 (2013).
[Crossref] [PubMed]

H. Van Bui, A. Y. Kovalgin, and R. A. M. Wolters, “On the difference between optically and electrically determined resistivity of ultra-thin titanium nitride films,” Appl. Surf. Sci. 269, 45–49 (2013).
[Crossref]

2012 (1)

C. M. Natarajan, M. G. Tanner, and R. H. Hadfield, “Superconducting nanowire single-photon detectors: physics and applications,” Supercond. Sci. Technol. 25(6), 063001 (2012).
[Crossref]

2011 (1)

A. Boltasseva and H. A. Atwater, “Materials science. Low-loss plasmonic metamaterials,” Science 331(6015), 290–291 (2011).
[Crossref] [PubMed]

2008 (5)

J. N. Anker, W. P. Hall, O. Lyandres, N. C. Shah, J. Zhao, and R. P. Van Duyne, “Biosensing with plasmonic nanosensors,” Nat. Mater. 7(6), 442–453 (2008).
[Crossref] [PubMed]

F. Marsili, D. Bitauld, A. Fiore, A. Gaggero, F. Mattioli, R. Leoni, M. Benkahoul, and F. Lévy, “High efficiency NbN nanowire superconducting single photon detectors fabricated on MgO substrates from a low temperature process,” Opt. Express 16(5), 3191–3196 (2008).
[Crossref] [PubMed]

J. Chen, J. B. Altepeter, M. Medic, K. F. Lee, B. Gokden, R. H. Hadfield, S. W. Nam, and P. Kumar, “Demonstration of a quantum controlled-NOT gate in the telecommunications band,” Phys. Rev. Lett. 100(13), 133603 (2008).
[Crossref] [PubMed]

J. N. Hilfiker, N. Singh, T. Tiwald, D. Convey, S. M. Smith, J. H. Baker, and H. G. Tompkins, “Survey of methods to characterize thin absorbing films with spectroscopic ellipsometry,” Thin Solid Films 516(22), 7979–7989 (2008).
[Crossref]

G. Zou, M. Jain, H. Zhou, H. Luo, S. A. Baily, L. Civale, E. Bauer, T. M. McCleskey, A. K. Burrell, and Q. Jia, “Ultrathin epitaxial superconducting niobium nitride films grown by a chemical solution technique,” Chem. Commun. (Camb.) 44(45), 6022–6024 (2008).
[Crossref] [PubMed]

2007 (1)

R. H. Hadfield, M. J. Stevens, R. P. Mirin, and S. W. Nam, “Single-photon source characterization with twin infrared-sensitive superconducting single-photon detectors,” J. Appl. Phys. 101(10), 103104 (2007).
[Crossref]

2003 (1)

J. Zhang, N. Boiadjieva, G. Chulkova, H. Deslandes, G. N. Gol’tsman, A. Korneev, P. Kouminov, M. Leibowitz, W. Lo, R. Malinsky, O. Okunev, A. Pearlman, W. Slysz, K. Smirnov, C. Tsao, A. Verevkin, B. Voronov, K. Wilsher, and R. Sobolewski, “Noninvasive CMOS circuit testing with NbN superconducting single-photon detectors,” Electron. Lett. 39(14), 1086 (2003).
[Crossref]

2002 (1)

M. Leskela and M. Ritalä, “Atomic layer deposition (ALD) : from precursors to thin film structures,” Thin Solid Films 409(1), 138–146 (2002).
[Crossref]

2001 (1)

G. N. Gol’tsman, O. Okunev, G. Chulkova, A. Lipatov, A. Semenov, K. Smirnov, B. Voronov, A. Dzardanov, C. Williams, and R. Sobolewski, “Picosecond superconducting single-photon optical detector,” Appl. Phys. Lett. 79(6), 705–707 (2001).
[Crossref]

2000 (1)

M. Marlo and V. Milman, “Density-functional study of bulk and surface properties of titanium nitride using different exchange-correlation functionals,” Phys. Rev. B 62(4), 2899–2907 (2000).
[Crossref]

1998 (1)

A. Misra, J. J. Petrovic, and T. E. Mitchell, “Microstructures and mechanical properties of a Mo3Si-Mo5Si3 composite,” Scr. Mater. 40(2), 191–196 (1998).
[Crossref]

1984 (1)

C. M. Perlov and C. Y. Fong, “Calculation of the superconducting transition temperature in niobium,” Phys. Rev. B 29(3), 1243–1249 (1984).
[Crossref]

1978 (1)

W. Spengler, R. Kaiser, A. N. Christensen, and G. Müller-Vogt, “Raman scattering, superconductivity, and phonon density of states of stoichiometric and nonstoichiometric TiN,” Phys. Rev. B 17(3), 1095–1101 (1978).
[Crossref]

1974 (1)

P. Ettmayer, R. Kieffer, and F. Hattinger, “Determination of melting points of metal nitrides under nitrogen pressure,” Metall 28(12), 1151–1156 (1974).

1972 (1)

M. E. Packer and M. J. Murray, “A floating zone furnace for melting refractory metals and metal-like compounds,” J. Phys. Educ. 5(3), 246 (1972).

1970 (1)

M. E. Straumanis and S. Zyszczynski, “Lattice parameters, thermal expansion coefficients and densities of Nb, and of solid solutions Nb–O and Nb–N–O and their defect structure,” J. Appl. Cryst. 3(1), 1–6 (1970).
[Crossref]

1968 (1)

R. R. Pawar and V. T. Deshpande, “The anisotropy of the thermal expansion of α-titanium,” Acta Crystallogr. A 24(2), 316–317 (1968).
[Crossref]

1966 (1)

I. G. D ’yakov and A. D. Shvets, “Investigation of superconducting properties of molybdenum,” Sov. Phys. 22(49), 1091–1093 (1966).

1963 (1)

R. G. Ross and W. Hume-Rothery, “High temperature X-ray metallography: I. A new debye-scherrer camera for use at very high temperatures II. A new parafocusing camera III. Applications to the study of chromium, hafnium, molybdenum, rhodium, ruthenium and tungsten,” J. Less Common Met. 5(3), 258–270 (1963).
[Crossref]

1957 (1)

J. Bardeen, L. N. Cooper, and J. R. Schrieffer, “Theory of superconductivity,” Phys. Rev. 108(5), 1175–1204 (1957).
[Crossref]

1953 (1)

M. C. Steele and R. A. Hein, “Superconductivity of Titanium,” Phys. Rev. 92(2), 243–247 (1953).
[Crossref]

Abadias, G.

Allman, M. S.

Altepeter, J. B.

Anker, J. N.

J. N. Anker, W. P. Hall, O. Lyandres, N. C. Shah, J. Zhao, and R. P. Van Duyne, “Biosensing with plasmonic nanosensors,” Nat. Mater. 7(6), 442–453 (2008).
[Crossref] [PubMed]

Atwater, H. A.

A. Boltasseva and H. A. Atwater, “Materials science. Low-loss plasmonic metamaterials,” Science 331(6015), 290–291 (2011).
[Crossref] [PubMed]

Baffou, G.

A. Lalisse, G. Tessier, J. Plain, and G. Baffou, “Plasmonic efficiencies of nanoparticles made of metal nitrides (TiN, ZrN) compared with gold,” Sci. Rep. 6(1), 38647 (2016).
[Crossref] [PubMed]

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Baker, J. H.

Baker, L. J.

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D. Bosworth, S.-L. Sahonta, R. H. Hadfield, and Z. H. Barber, “Amorphous molybdenum silicon superconducting thin films,” AIP Adv. 5(8), 087106 (2015).
[Crossref]

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J. Bardeen, L. N. Cooper, and J. R. Schrieffer, “Theory of superconductivity,” Phys. Rev. 108(5), 1175–1204 (1957).
[Crossref]

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Bellas, D. V.

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Bitauld, D.

Boiadjieva, N.

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D. Shah, H. Reddy, N. Kinsey, V. M. Shalaev, and A. Boltasseva, “Optical properties of plasmonic ultrathin TiN Films,” Adv. Opt. Mater. 5(13), 1700065 (2017).
[Crossref]

A. Boltasseva and H. A. Atwater, “Materials science. Low-loss plasmonic metamaterials,” Science 331(6015), 290–291 (2011).
[Crossref] [PubMed]

Bosworth, D.

D. Bosworth, S.-L. Sahonta, R. H. Hadfield, and Z. H. Barber, “Amorphous molybdenum silicon superconducting thin films,” AIP Adv. 5(8), 087106 (2015).
[Crossref]

Briggs, J. A.

Burrell, A. K.

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Civale, L.

Convey, D.

Cooper, L. N.

J. Bardeen, L. N. Cooper, and J. R. Schrieffer, “Theory of superconductivity,” Phys. Rev. 108(5), 1175–1204 (1957).
[Crossref]

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I. G. D ’yakov and A. D. Shvets, “Investigation of superconducting properties of molybdenum,” Sov. Phys. 22(49), 1091–1093 (1966).

de la Osa, R. A.

Della Giovampaola, C.

C. Della Giovampaola and N. Engheta, “Plasmonics without negative dielectrics,” Phys. Rev. B 93(19), 195152 (2016).
[Crossref]

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[Crossref]

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Guan, J.

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Gutiérrez, Y.

Hadfield, R. H.

D. Bosworth, S.-L. Sahonta, R. H. Hadfield, and Z. H. Barber, “Amorphous molybdenum silicon superconducting thin films,” AIP Adv. 5(8), 087106 (2015).
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C. M. Natarajan, M. G. Tanner, and R. H. Hadfield, “Superconducting nanowire single-photon detectors: physics and applications,” Supercond. Sci. Technol. 25(6), 063001 (2012).
[Crossref]

Hall, W. P.

J. N. Anker, W. P. Hall, O. Lyandres, N. C. Shah, J. Zhao, and R. P. Van Duyne, “Biosensing with plasmonic nanosensors,” Nat. Mater. 7(6), 442–453 (2008).
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P. Ettmayer, R. Kieffer, and F. Hattinger, “Determination of melting points of metal nitrides under nitrogen pressure,” Metall 28(12), 1151–1156 (1974).

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Hein, R. A.

M. C. Steele and R. A. Hein, “Superconductivity of Titanium,” Phys. Rev. 92(2), 243–247 (1953).
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Hilfiker, J. N.

Horansky, R. D.

Hu, E. L.

C. M. Zgrabik and E. L. Hu, “Optimization of sputtered titanium nitride as a tunable metal for plasmonic applications,” Opt. Mater. Express 5(12), 2786 (2015).
[Crossref]

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Jain, M.

Jia, Q.

Kaiser, R.

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P. Patsalas, N. Kalfagiannis, and S. Kassavetis, “Optical properties and plasmonic performance of titanium nitride,” Materials (Basel) 8(12), 3128–3154 (2015).
[Crossref]

Kassavetis, S.

P. Patsalas, N. Kalfagiannis, and S. Kassavetis, “Optical properties and plasmonic performance of titanium nitride,” Materials (Basel) 8(12), 3128–3154 (2015).
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P. Ettmayer, R. Kieffer, and F. Hattinger, “Determination of melting points of metal nitrides under nitrogen pressure,” Metall 28(12), 1151–1156 (1974).

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Kinsey, N.

D. Shah, H. Reddy, N. Kinsey, V. M. Shalaev, and A. Boltasseva, “Optical properties of plasmonic ultrathin TiN Films,” Adv. Opt. Mater. 5(13), 1700065 (2017).
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A. Lalisse, G. Tessier, J. Plain, and G. Baffou, “Plasmonic efficiencies of nanoparticles made of metal nitrides (TiN, ZrN) compared with gold,” Sci. Rep. 6(1), 38647 (2016).
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M. Leskela and M. Ritalä, “Atomic layer deposition (ALD) : from precursors to thin film structures,” Thin Solid Films 409(1), 138–146 (2002).
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J. N. Anker, W. P. Hall, O. Lyandres, N. C. Shah, J. Zhao, and R. P. Van Duyne, “Biosensing with plasmonic nanosensors,” Nat. Mater. 7(6), 442–453 (2008).
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[Crossref]

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D. M. O’Carroll, “Nanophotonics and plasmonics for solar energy harvesting and conversion,” J. Photonics Energy 5(1), 057001 (2015).
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P. Patsalas, N. Kalfagiannis, and S. Kassavetis, “Optical properties and plasmonic performance of titanium nitride,” Materials (Basel) 8(12), 3128–3154 (2015).
[Crossref]

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R. R. Pawar and V. T. Deshpande, “The anisotropy of the thermal expansion of α-titanium,” Acta Crystallogr. A 24(2), 316–317 (1968).
[Crossref]

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C. M. Perlov and C. Y. Fong, “Calculation of the superconducting transition temperature in niobium,” Phys. Rev. B 29(3), 1243–1249 (1984).
[Crossref]

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Petach, T. A.

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A. Misra, J. J. Petrovic, and T. E. Mitchell, “Microstructures and mechanical properties of a Mo3Si-Mo5Si3 composite,” Scr. Mater. 40(2), 191–196 (1998).
[Crossref]

Plain, J.

A. Lalisse, G. Tessier, J. Plain, and G. Baffou, “Plasmonic efficiencies of nanoparticles made of metal nitrides (TiN, ZrN) compared with gold,” Sci. Rep. 6(1), 38647 (2016).
[Crossref] [PubMed]

Reddy, H.

D. Shah, H. Reddy, N. Kinsey, V. M. Shalaev, and A. Boltasseva, “Optical properties of plasmonic ultrathin TiN Films,” Adv. Opt. Mater. 5(13), 1700065 (2017).
[Crossref]

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M. Leskela and M. Ritalä, “Atomic layer deposition (ALD) : from precursors to thin film structures,” Thin Solid Films 409(1), 138–146 (2002).
[Crossref]

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Sahasrabuddhe, K.

Sahonta, S.-L.

D. Bosworth, S.-L. Sahonta, R. H. Hadfield, and Z. H. Barber, “Amorphous molybdenum silicon superconducting thin films,” AIP Adv. 5(8), 087106 (2015).
[Crossref]

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J. Bardeen, L. N. Cooper, and J. R. Schrieffer, “Theory of superconductivity,” Phys. Rev. 108(5), 1175–1204 (1957).
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Shah, D.

D. Shah, H. Reddy, N. Kinsey, V. M. Shalaev, and A. Boltasseva, “Optical properties of plasmonic ultrathin TiN Films,” Adv. Opt. Mater. 5(13), 1700065 (2017).
[Crossref]

Shah, N. C.

J. N. Anker, W. P. Hall, O. Lyandres, N. C. Shah, J. Zhao, and R. P. Van Duyne, “Biosensing with plasmonic nanosensors,” Nat. Mater. 7(6), 442–453 (2008).
[Crossref] [PubMed]

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D. Shah, H. Reddy, N. Kinsey, V. M. Shalaev, and A. Boltasseva, “Optical properties of plasmonic ultrathin TiN Films,” Adv. Opt. Mater. 5(13), 1700065 (2017).
[Crossref]

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C. M. Natarajan, M. G. Tanner, and R. H. Hadfield, “Superconducting nanowire single-photon detectors: physics and applications,” Supercond. Sci. Technol. 25(6), 063001 (2012).
[Crossref]

Terai, H.

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A. Lalisse, G. Tessier, J. Plain, and G. Baffou, “Plasmonic efficiencies of nanoparticles made of metal nitrides (TiN, ZrN) compared with gold,” Sci. Rep. 6(1), 38647 (2016).
[Crossref] [PubMed]

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J. N. Anker, W. P. Hall, O. Lyandres, N. C. Shah, J. Zhao, and R. P. Van Duyne, “Biosensing with plasmonic nanosensors,” Nat. Mater. 7(6), 442–453 (2008).
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C. M. Zgrabik and E. L. Hu, “Optimization of sputtered titanium nitride as a tunable metal for plasmonic applications,” Opt. Mater. Express 5(12), 2786 (2015).
[Crossref]

Zhang, J.

Zhao, J.

J. N. Anker, W. P. Hall, O. Lyandres, N. C. Shah, J. Zhao, and R. P. Van Duyne, “Biosensing with plasmonic nanosensors,” Nat. Mater. 7(6), 442–453 (2008).
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Acta Crystallogr. A (1)

R. R. Pawar and V. T. Deshpande, “The anisotropy of the thermal expansion of α-titanium,” Acta Crystallogr. A 24(2), 316–317 (1968).
[Crossref]

Adv. Mater. (1)

Adv. Opt. Mater. (1)

D. Shah, H. Reddy, N. Kinsey, V. M. Shalaev, and A. Boltasseva, “Optical properties of plasmonic ultrathin TiN Films,” Adv. Opt. Mater. 5(13), 1700065 (2017).
[Crossref]

AIP Adv. (1)

D. Bosworth, S.-L. Sahonta, R. H. Hadfield, and Z. H. Barber, “Amorphous molybdenum silicon superconducting thin films,” AIP Adv. 5(8), 087106 (2015).
[Crossref]

Appl. Phys. Lett. (3)

Appl. Sci. (1)

Appl. Surf. Sci. (1)

Chem. Commun. (Camb.) (1)

Electron. Lett. (1)

J. Appl. Cryst. (1)

J. Appl. Phys. (1)

J. Less Common Met. (1)

J. Photonics Energy (1)

D. M. O’Carroll, “Nanophotonics and plasmonics for solar energy harvesting and conversion,” J. Photonics Energy 5(1), 057001 (2015).
[Crossref]

J. Phys. Educ. (1)

M. E. Packer and M. J. Murray, “A floating zone furnace for melting refractory metals and metal-like compounds,” J. Phys. Educ. 5(3), 246 (1972).

Mater. Sci. Eng. Rep. (1)

Materials (Basel) (1)

P. Patsalas, N. Kalfagiannis, and S. Kassavetis, “Optical properties and plasmonic performance of titanium nitride,” Materials (Basel) 8(12), 3128–3154 (2015).
[Crossref]

Metall (1)

P. Ettmayer, R. Kieffer, and F. Hattinger, “Determination of melting points of metal nitrides under nitrogen pressure,” Metall 28(12), 1151–1156 (1974).

Nano Lett. (1)

Nat. Mater. (1)

J. N. Anker, W. P. Hall, O. Lyandres, N. C. Shah, J. Zhao, and R. P. Van Duyne, “Biosensing with plasmonic nanosensors,” Nat. Mater. 7(6), 442–453 (2008).
[Crossref] [PubMed]

Opt. Express (3)

Opt. Mater. Express (1)

C. M. Zgrabik and E. L. Hu, “Optimization of sputtered titanium nitride as a tunable metal for plasmonic applications,” Opt. Mater. Express 5(12), 2786 (2015).
[Crossref]

Phys. Rev. (2)

M. C. Steele and R. A. Hein, “Superconductivity of Titanium,” Phys. Rev. 92(2), 243–247 (1953).
[Crossref]

J. Bardeen, L. N. Cooper, and J. R. Schrieffer, “Theory of superconductivity,” Phys. Rev. 108(5), 1175–1204 (1957).
[Crossref]

Phys. Rev. B (4)

C. M. Perlov and C. Y. Fong, “Calculation of the superconducting transition temperature in niobium,” Phys. Rev. B 29(3), 1243–1249 (1984).
[Crossref]

C. Della Giovampaola and N. Engheta, “Plasmonics without negative dielectrics,” Phys. Rev. B 93(19), 195152 (2016).
[Crossref]

Phys. Rev. Lett. (1)

Sci. Rep. (1)

A. Lalisse, G. Tessier, J. Plain, and G. Baffou, “Plasmonic efficiencies of nanoparticles made of metal nitrides (TiN, ZrN) compared with gold,” Sci. Rep. 6(1), 38647 (2016).
[Crossref] [PubMed]

Science (1)

A. Boltasseva and H. A. Atwater, “Materials science. Low-loss plasmonic metamaterials,” Science 331(6015), 290–291 (2011).
[Crossref] [PubMed]

Scr. Mater. (1)

A. Misra, J. J. Petrovic, and T. E. Mitchell, “Microstructures and mechanical properties of a Mo3Si-Mo5Si3 composite,” Scr. Mater. 40(2), 191–196 (1998).
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I. G. D ’yakov and A. D. Shvets, “Investigation of superconducting properties of molybdenum,” Sov. Phys. 22(49), 1091–1093 (1966).

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C. M. Natarajan, M. G. Tanner, and R. H. Hadfield, “Superconducting nanowire single-photon detectors: physics and applications,” Supercond. Sci. Technol. 25(6), 063001 (2012).
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Fig. 1 Complex refractive index measurement for uncapped and capped MoSi films using variable angle spectroscopic ellipsometry (VASE) and comparison with optical constants (index of refraction n and extinction coefficient κ) measurements of NbN and NbTiN films (a) refractive index measurement of MoSi film with Si cap, MoSi film without a Si cap, NbN film and NbTiN film; (b) extinction coefficient measurement of MoSi film with Si cap, MoSi film without a Si cap, NbN film and NbTiN film.

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Fig. 2 High resolution transmission electron microscopy (HRTEM) analysis of NbTiN and MoSi thin films (a) TEM image of 5 nm thick NbTiN, the image shows the existence of polycrystalline structures and large grains in the film; (b) 5 nm thick MoSi with a Si cap, since the Si cap has been deposited without breaking the vacuum of the deposition system there is no sharp interface between MoSi thin film and silicon cap; (c) 5 nm thick MoSi without any Si cap (diffraction pattern recorded from the sample has been shown at the bottom of the figure) indicating the amorphous nature of the film.

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Fig. 3 Evaluation of complex refractive index of TiN thin films grown in the sputter deposition system (In the inset of top figure, a magnified view of n(λ) curve for 5 nm, 30 nm and 100 nm thick TiN films).

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Fig. 4 Measurement of complex refractive index of TiN thin films grown in the atomic layer deposition system: extinction coefficient falls consistently with film thickness, thinnest film (3 nm thick) shows lowest value of κ over whole wavelength range.

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Fig. 5 Extinction coefficient (κ) for TiN films grown in two different deposition techniques (sputtering and atomic layer deposition) as a function of film thickness at 1550 nm wavelength

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Fig. 6 High resolution transmission microscopy (HRTEM) images of TiN films grown on silicon substrate (a) film grown using sputter deposition system; (b) ALD (Atomic layer deposition) deposited film; the existence of crystalline structure is evident in both the images.

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Fig. 7 Wavelength dependence of real part and imaginary part of permittivity, ε (a) Re(ε) of 5 nm thick MoSi (without any silicon cap), NbN and NbTiN thin films as a function of wavelength; (b) spectral variation of Re(ε) for TiN thin films grown in the atomic layer deposition system, thickness varying from 3 nm to 30 nm; (c) Im(ε) of 5 nm thick MoSi (without any silicon cap), NbN and NbTiN thin films; (d) Im(ε) of ALD deposited TiN films

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Fig. 8 Wavelength dependence of propagation length (quantifying the 1/e field-decay length along the direction of propagation of surface plasmon polariton wave in a metal/dielectric interface) of refractory metal-based thin materials we have explored in this study:(a) TiN grown in the sputter system; (b) TiN films deposited in ALD; (c) a comparison of propagation length of 5 nm thick MoSi (without Si cap), NbN, NbTiN and TiN grown by the two different techniques.

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Fig. 9 Spectral variation of evanescent decay length (quantifying the confinement of surface plasmon polariton wave in a metal/dielectric interface) of refractory metal-based thin materials we have explored in this study (a) TiN grown in the sputter system; (b) TiN films deposited in ALD; (c) a comparison of propagation length of 5 nm thick MoSi (without any Si cap), NbN, NbTiN and TiN grown in the 2 different techniques.

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Fig. 10 Variation of superconducting transition temperature of NbTiN, MoSi and TiN (sputtered and ALD grown) films with film thickness. As described in Section 2, sputtered films have been grown on silicon substrates at room temperature and ALD TiN films were grown on silicon substrates at 350°C.

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Tables (3)

Table 1 Comparison of melting points and superconducting properties of refractory metals or metal-based alloys or compounds

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Table 2 Deposition parameters used for film growth in the sputter system

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Table 3 Optical absorption of 5 nm thick NbN, NbTiN, MoSi and TiN

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Equations (4)

Equations on this page are rendered with MathJax. Learn more.

L = {[2 Im (β)]}^{- 1}

β = \frac{2 π}{λ} \sqrt{\frac{ε_{m}}{ε_{m} + 1}};

\hat{z} = \frac{1}{| k_{z} |}

k_{z} = \sqrt{β^{2} - {(\frac{2 π}{λ})}^{2}} .

Material	Melting Point (°C)	Crystalline Structure	Lattice Parameter (Å)	Bulk Superconducting Transition Temperature, T_c (K)
Nb	2472 [28]	Crystalline(body-centred cubic)	3.30 [29]	9.1 [30]
NbN^a	2573 [31]	Crystalline/Poly-crystalline(cF₈: 2 interpenetrating face-centred cubic lattices)	4.39 [32]	16 [23]
Mo	2623 [28]	Crystalline(body-centred cubic)	3.15 [33]	0.9 [34]
MoSi^b	2025 [35]	Amorphous		7.5 [8]
Ti	1668 [28]	Crystalline(hexagonal close packed)	2.95 [36]	0.5 [37]
TiN^c	2930 [38]	Crystalline(cF₈: 2 interpenetrating face-centred cubic lattices)	4.24 [39]	6 [40]

	Current and Power Supplied at the targets	Gas Flow	Chamber Pressure
NbN	Nb:0.9 A	Ar:18 Sccm;N₂: 5 Sccm	0.14 Pa
NbTiN	Nb:0.9A; Ti: 0.450A	Ar:18 Sccm;N₂: 5 Sccm	0.14 Pa
MoSi	Mo: 0.3 A; Si: 125 W	Ar: 30 Sccm	0.2 Pa
TiN	Ti:0.6 A	Ar: 18 Sccm	0.18 Pa

	NbN		NbTiN		MoSi (without Si Cap)		MoSi (with Si cap)		TiN (sputtered)		TiN (ALD)
	α (nm⁻¹)	k	α (nm⁻¹)	k	α(nm⁻¹)	k	α(nm⁻¹)	k	α(nm⁻¹)	k	a (nm⁻¹)	k
1000 nm	0.04	3.16	0.042	3.37	0.051	4.14	0.053	4.25	0.041	3.28	0.03	2.39
1550 nm	0.028	3.50	0.031	3.84	0.039	4.77	0.04	4.88	0.036	4.48	0.021	2.58
2000 nm	0.023	3.81	0.026	4.19	0.033	5.24	0.034	5.37	0.032	5.17	0.015	2.43

Material	Melting Point (°C)	Crystalline Structure	Lattice Parameter (Å)	Bulk Superconducting Transition Temperature, T_c (K)
Nb	2472 [28]	Crystalline(body-centred cubic)	3.30 [29]	9.1 [30]
NbN^a	2573 [31]	Crystalline/Poly-crystalline(cF₈: 2 interpenetrating face-centred cubic lattices)	4.39 [32]	16 [23]
Mo	2623 [28]	Crystalline(body-centred cubic)	3.15 [33]	0.9 [34]
MoSi^b	2025 [35]	Amorphous		7.5 [8]
Ti	1668 [28]	Crystalline(hexagonal close packed)	2.95 [36]	0.5 [37]
TiN^c	2930 [38]	Crystalline(cF₈: 2 interpenetrating face-centred cubic lattices)	4.24 [39]	6 [40]

	Current and Power Supplied at the targets	Gas Flow	Chamber Pressure
NbN	Nb:0.9 A	Ar:18 Sccm;N₂: 5 Sccm	0.14 Pa
NbTiN	Nb:0.9A; Ti: 0.450A	Ar:18 Sccm;N₂: 5 Sccm	0.14 Pa
MoSi	Mo: 0.3 A; Si: 125 W	Ar: 30 Sccm	0.2 Pa
TiN	Ti:0.6 A	Ar: 18 Sccm	0.18 Pa