Abstract

A tunable ArF* (193-nm) excimer source is described that produces over 125 mJ/pulse (peak) at 10 pulses/sec. This device has a spectral width of less than 2 cm⁻¹ and a demonstrated tunability of nearly 320 cm⁻¹ from 192.8 to 193.9 nm. Tunability, bandwidth, and mode control are achieved by injecting the fourth anti-Stokes line (in H₂) of a frequency-doubled dye laser into an ArF* excimer-amplifier system.

© 1981 Optical Society of America

High-power Lyman-? source generated with an ArF excimer laser

Scott A. Meyer and Gregory W. Faris
Opt. Lett. 23(3) 204-206 (1998)

Generation of 224-nm radiation by stimulated Raman scattering of ArF excimer laser radiation in a mixture of H₂ and D₂

Genie G. M. Stoffels, Patrick Schmidt, Nico Dam, and J. J. ter Meulen
Appl. Opt. 36(27) 6797-6801 (1997)

Efficient tunable ultraviolet source based on stimulated Raman scattering of an excimer-pumped dye laser

D. J. Brink and D. Proch
Opt. Lett. 7(10) 494-496 (1982)

Frequency calibration in the ArF excimer laser-tuning range using laser-induced fluorescence of NO

Michel Versluis, Maarten Ebben, Marcel Drabbels, and J. J. ter Meulen
Appl. Opt. 30(36) 5229-5234 (1991)

Short-pulse amplification and gain dynamics of an ArF excimer amplifier

C. Momma, H. Eichmann, H. Jacobs, A. Tünnermann, H. Welling, and B. Wellegehausen
Opt. Lett. 18(7) 516-518 (1993)