Abstract
Surface grating couplers are fundamental building blocks for coupling the light between optical fibers and integrated photonic devices. However, the operational bandwidth of conventional grating couplers is intrinsically limited by their wavelength-dependent radiation angle. The few dual-band grating couplers that have been experimentally demonstrated exhibit low coupling efficiencies and rely on complex fabrication processes. Here we demonstrate for the first time, to the best of our knowledge, the realization of an efficient dual-band grating coupler fabricated using 193 nm deep-ultraviolet lithography for 10 Gbit symmetric passive optical networks. The footprint of the device is ${17} \times {10}\;{{\unicode{x00B5}{\rm m}}^2}$. We measured coupling efficiencies of ${-}{4.9}$ and ${-}{5.2}\;{\rm dB}$ with a 3-dB bandwidth of 27 and 56 nm at the wavelengths of 1270 and 1577 nm, corresponding to the upstream and downstream channels, respectively.
© 2021 Optical Society of America
Full Article | PDF ArticleMore Like This
Lirong Cheng, Simei Mao, Zhi Li, Xin Tu, and H. Y. Fu
Opt. Lett. 46(13) 3308-3311 (2021)
Julian L. Pita Ruiz, Lucas G. Rocha, Jun Yang, Şükrü Ekin Kocabaş, Ming-Jun Li, Ivan Aldaya, Paulo Dainese, and Lucas H. Gabrielli
Opt. Lett. 46(15) 3649-3652 (2021)
Daniel Benedikovic, Carlos Alonso-Ramos, Diego Pérez-Galacho, Sylvain Guerber, Vladyslav Vakarin, Guillaume Marcaud, Xavier Le Roux, Eric Cassan, Delphine Marris-Morini, Pavel Cheben, Frédéric Boeuf, Charles Baudot, and Laurent Vivien
Opt. Lett. 42(17) 3439-3442 (2017)