Graphene oxide (GO) ultrathin film can be wafer-scale deposited by spin coating, can be patterned by laser interference lithography and oxygen plasma etching, can be thinned atomically (0.26 nm/min) and oxidized by ozone treatment, and is a relatively transparent and low-refractive-index material compared to pristine graphene. All those unique properties prompt us to realize a low-loss (), high-extinction-ratio (19 dB), and narrowband (0.425 nm) GO/silicon hybrid waveguide Bragg reflector by transferring 7-nm-thick GO gratings () atop a silicon strip waveguide. Unlike a sidewall-corrugated strip waveguide Bragg reflector that generally exhibits distorted corrugation profiles and is sensitive to fabrication errors, the as-realized GO-grating-covered strip waveguide Bragg reflector exhibits a stable reflecting wavelength and controllable reflection bandwidth that can be well predicted by numerical simulations.
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17 November 2017: A typographical correction was made to the author listing.
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