Abstract

In this Letter, we report a large-area and single-step optical fabrication technique based on phase engineering interference lithography that is scalable and reconfigurable for the realization of submicrometer scale periodic face-centered cubic inverse woodpile photonic structures. The realized inverse woodpile structure on positive having four number axial layers with 740 nm spatial and 1046 nm axial periodicities shows 10% reflectance and 90% transmittance at 776 nm wavelength that can further be improved for the addition of axial layers. The realized structure can be transferred to crystalline silicon for realizing a bandpass/rejection near-infrared filter in a reflection/transmission mode. Further, woodpile structures based on low-contrast silicon nitride (${\mathrm{Si}}_3{\mathrm{N}}_4$) are designed as selective narrow frequency filters at 1310 and 1550 nm wavelengths for telecommunication applications and omnidirectional red-green-blue filters for display devices by tuning the design parameters.

© 2017 Optical Society of America

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