Abstract

We demonstrate an apodization technique using tapered coupler gaps in grating-assisted asymmetric couplers, which circumvents the need for tapered waveguide perturbations and enables a higher tolerance to fabrication errors. A high sidelobe suppression ratio of 30 dB has been obtained on the submicrometer silicon-on-insulator platform using a CMOS-compatible photonics process with 193 nm lithography.

© 2013 Optical Society of America

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