Abstract
A 3D lithographic microfabrication process has been developed that is high throughput, scalable, and capable of producing arbitrary patterns. It offers the possibility for industrial scale manufacturing of 3D microdevices such as photonic crystals, tissue engineering scaffolds, and microfluidics chips. This method is based on depth-resolved wide-field illumination by temporally focusing femtosecond light pulses. We characterized the axial resolution of this technique, and the result is consistent with the theoretical prediction. As proof-of-concept experiments, we demonstrated photobleaching of 3D resolved patterns in a fluorescent medium and fabricating 3D microstructures with SU-8 photoresist.
© 2010 Optical Society of America
Full Article | PDF ArticleMore Like This
Shoji Maruo, Osamu Nakamura, and Satoshi Kawata
Opt. Lett. 22(2) 132-134 (1997)
Edgar E. Morales-Delgado, Loic Urio, Donald B. Conkey, Nicolino Stasio, Demetri Psaltis, and Christophe Moser
Opt. Express 25(6) 7031-7045 (2017)
Andrius Marcinkevičius, Saulius Juodkazis, Mitsuru Watanabe, Masafumi Miwa, Shigeki Matsuo, Hiroaki Misawa, and Junji Nishii
Opt. Lett. 26(5) 277-279 (2001)