Abstract
A two-step white-light spectral interferometric technique is used to retrieve the ellipsometric phase of a thin-film structure from the spectral interferograms recorded in a polarimetry configuration with a birefringent crystal. In the first step, the phase difference between p- and s-polarized waves propagating in the crystal alone is retrieved. In the second step, the additional phase change that the polarized waves undergo on reflection from the thin-film structure is retrieved. The new method is used in determining the thin-film thickness from ellipsometric phase measured for thin film on a Si substrate in a range from . The thicknesses of three different samples obtained are compared with those resulting from polarimetric measurements, and good agreement is confirmed.
© 2009 Optical Society of America
Full Article | PDF ArticleMore Like This
Jiři Luňáček, Petr Hlubina, and Milena Luňáčková
Appl. Opt. 48(5) 985-989 (2009)
P. Hlubina, D. Ciprian, J. Luňáňek, and M. Lesňák
Opt. Express 14(17) 7678-7685 (2006)
Zheng Zheng, Yuhang Wan, Xin Zhao, and Jinsong Zhu
Appl. Opt. 48(13) 2491-2495 (2009)