Abstract
We have developed a multilevel interference lithography process to fabricate period gratings using light with a wavelength. In this process multiple grating levels patterned by interference lithography are overlaid and spatial–phase aligned to a common reference grating using interferometry. Each grating level is patterned with offset phase shifts and etched into a single layer to achieve spatial-frequency multiplication. The effect of the multilayer periodic structure on interference lithography is examined to optimize the fabrication process. This process presents a general scheme for overlaying periodic structures and can be used to fabricate more complex periodic structures.
© 2008 Optical Society of America
Full Article | PDF ArticleMore Like This
Anthony Yen, M. L Schattenburg, and Henry I. Smith
Appl. Opt. 31(16) 2972-2973 (1992)
Yannick Bourgin, Daniel Voigt, Thomas Käsebier, Thomas Siefke, Ernst-Bernhard Kley, and Uwe D. Zeitner
Opt. Lett. 42(19) 3816-3819 (2017)
Abhijeet Bagal and Chih-Hao Chang
Opt. Lett. 38(14) 2531-2534 (2013)