Abstract

We describe the formation of ZrO_xF_y optical waveguides by oxygen ion-beam-assisted deposition of ZrF₄ films. Waveguide losses less than 1 dB/cm for the TE₀ mode at 514 nm resulted from bombardment with 600-eV ${\text{O}}_2^{+}$ ions, and the waveguide index was a function of bombarding current at this energy, with a maximum change of Δn = 0.28. Local bombardment of a waveguide resulted in generation of an integrated planar lens compatible with holographic fabrication. The process is also suitable for the formation of graded-index waveguides.

© 1995 Optical Society of America

Ion-beam-assisted deposition of thin films

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