Abstract
With a new ultrahigh-vacuum deposition/reflectometer system, Mo/Y multilayer mirrors were deposited by dc-magnetron sputtering and characterized in situ with synchrotron radiation. The Mo/Y multilayer mirrors, measured before exposure to air, had near-normal-incidence reflectances as high as 46% at wavelengths near 11.4 nm. After several days of exposure these samples typically had a relative reflectance loss of ~10% as a result of oxidation of the top Mo layer. The best Mo/Y multilayers were fabricated with base pressures below the low 10−9 Torr range and after a bakeout to reduce water vapor in the chamber.
© 1995 Optical Society of America
Full Article | PDF ArticleMore Like This
Claude Montcalm, Patrick A. Kearney, J. M. Slaughter, Brian T. Sullivan, M. Chaker, Henri Pépin, and Charles M. Falco
Appl. Opt. 35(25) 5134-5147 (1996)
Benjawan Sae-Lao and Claude Montcalm
Opt. Lett. 26(7) 468-470 (2001)
Claude Montcalm, Brian T. Sullivan, M. Ranger, J. M. Slaughter, Patrick A. Kearney, Charles M. Falco, and M. Chaker
Opt. Lett. 19(13) 1004-1006 (1994)