Abstract

A method for forming multilevel diffractive elements (kinoforms) that have highly accurate level heights so as to obtain high diffraction efficiencies is presented. The method, which leads to heterostructure multilevel binary optical elements, relies on conventional deposition technology, selective etching, and multimask lithography. As an illustration, a reflective multilevel element for 10.6-μm radiation is designed, recorded, and tested.

© 1991 Optical Society of America

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