Abstract

Ion-beam-figuring techniques have been applied to fabricate high-power transmission gratings for use in photo-acoustic spectroscopy. A thin-film assembly of SiO2 and TiO2 layers on an SiO2 substrate provides a high-reflecting characteristic at a desired wavelength. With standard photolithographic techniques a grating pattern is developed on the surface of the assembly then ion etched with ion-beam-figuring techniques. These gratings exhibit an increased factor of 25 in acoustic signal levels when compared with previously used chemical-etched silicon gratings. This increase was obtained owing to higher transmission, less thermal distortion, and the ability to withstand higher incident power levels.

© 1991 Optical Society of America

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