Abstract

The calculated data of propagation loss of the waveguide were incorrect. Corrected data show the actual results in the measurements. References and links

©2004 Optical Society of America

The calculated data of propagation loss of the waveguide in [1] were incorrect; actually, according to the definition of the propagation loss and the measured results, the calculated data of the propagation loss of the waveguide were positive values. The correct data involved in the propagation loss in [1] are positive values; the changes in details are as follows: 1. The minimum propagation loss of the waveguide in fused quartz can be reduced to 0.14 dB/cm in the abstract; 2. The data of the propagation loss of the waveguide are 6.81 dB/cm, 1.09 dB/cm, 0.37 dB/cm and 0.14 dB/cm in the page 4679 and 4680, respectively; 3. Figure 3 is corrected below.

 

Fig. 3. Natural logarithm of the scattered intensity of light vs. propagation distance along the fused quartz waveguides formed by 3.0 MeV O+ ion implantation at the dose of 1×1015 ions/cm2 before and after different annealing treatments in air measured with the wavelengths of 633 nm, respectively. A, as implanted; B, after annealing at 320°C, 60min; C, after annealing at 450°C, 60min; D, after annealing at 500°C, 60min.

Download Full Size | PPT Slide | PDF

References and links

1. X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675 [CrossRef]  

References

  • View by:
  • |
  • |
  • |

  1. X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
    [Crossref]

2004 (1)

X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
[Crossref]

Fu, G.

X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
[Crossref]

Li, S. L.

X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
[Crossref]

Ma, H, J.

X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
[Crossref]

Nie, R.

X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
[Crossref]

Shen, D, Y.

X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
[Crossref]

Wang, K. M.

X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
[Crossref]

Wang, X. L.

X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
[Crossref]

Opt. Express. (1)

X. L. Wang, K. M. Wang, G. Fu, S. L. Li, D, Y. Shen, H, J. Ma, and R. Nie, “Low propagation loss of the waveguides in fused quartz by oxygen ion implantation,” Opt. Express. 20, 4675–4680 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-20-4675
[Crossref]

Cited By

OSA participates in Crossref's Cited-By Linking service. Citing articles from OSA journals and other participating publishers are listed here.

Alert me when this article is cited.


Figures (1)

Fig. 3.
Fig. 3. Natural logarithm of the scattered intensity of light vs. propagation distance along the fused quartz waveguides formed by 3.0 MeV O+ ion implantation at the dose of 1×1015 ions/cm2 before and after different annealing treatments in air measured with the wavelengths of 633 nm, respectively. A, as implanted; B, after annealing at 320°C, 60min; C, after annealing at 450°C, 60min; D, after annealing at 500°C, 60min.

Metrics