Abstract

Buffered HF-based etching can effectively improve the laser damage resistance of the fused silica, but deep etching would cause the deteriorations in surface roughness and hardness, and decrease the laser-induced damage threshold. Capping a glass thin layer on the etched surface via plasma chemical vapor deposition in one step could overcome those deteriorations. We found that the deposition of the glass thin layer can further reduce the impurity element contamination and the PL intensity while retaining the low subsurface defect density as well as for the deeply etched sample. The surface quality, surface hardness and the laser damage resistance of the fused silica can be significantly improved by the glass thin layer, which reveals the potential application in high power laser facility.

© 2019 Optical Society of America under the terms of the OSA Open Access Publishing Agreement

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2017 (6)

Y. L. Jiang, J. Chen, K. Yang, Y. Jiang, W. Liao, C. C. Zhang, Y. Y. Ye, X. Y. Luan, H. J. Wang, X. L. Jiang, X. D. Yuan, and L. J. Zhang, “UV laser conditioning of the sol-gel SiO2 film coated fused silica optics,” Optik (Stuttg.) 139, 178–184 (2017).
[Crossref]

J. Cheng, J. H. Wang, J. Hou, H. X. Wang, and L. Zhang, “Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with HF Acid Etching,” Appl. Sci. (Basel) 7(8), 838–861 (2017).
[Crossref]

Y. C. Sun, X. F. Song, X. R. Du, X. Q. Zhang, H. Wang, and X. H. Yang, “Influence of Ionizing Gas Flow on Structural Homogeneity of Type IV Silica Glass,” Key Eng. Mater. 726, 409–413 (2017).
[Crossref]

J. Huang, F. Wang, H. Liu, F. Geng, X. Jiang, L. Sun, X. Ye, Q. Li, W. Wu, W. Zheng, and D. Sun, “Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics,” Sci. Rep. 7(1), 16239 (2017).
[Crossref] [PubMed]

Y. Li, H. Yan, K. Yang, C. Yao, Z. Wang, X. Zou, C. Yan, X. Yuan, X. Ju, and L. Yang, “Surface molecular structure defects and laser-induced damage threshold of fused silica during a manufacturing process,” Sci. Rep. 7(1), 17870 (2017).
[Crossref] [PubMed]

X. Li, L. Jiang, L. Li, and Y. Yan, “Effects of HF etching on nanoindentation response of ion-exchanged aluminosilicate float glass on air and tin sides,” J. Mater. Sci. 52(8), 4367–4377 (2017).
[Crossref]

2016 (3)

2014 (2)

H. J. Liu, X. Ye, X. D. Zhou, J. Huang, F. R. Wang, X. Y. Zhou, W. D. Wu, X. D. Jiang, Z. Sui, and W. G. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

M. P. Zhu, K. Yi, D. W. Li, X. F. Liu, H. J. Qi, and J. D. Shao, “Influence of SiO2 overcoat layer and electric field distribution on laser damage threshold and damage morphology of transport mirror coatings,” Opt. Commun. 319, 75–79 (2014).
[Crossref]

2013 (2)

L. Hongjie, H. Jin, W. Fengrui, Z. Xinda, Y. Xin, Z. Xiaoyan, S. Laixi, J. Xiaodong, S. Zhan, and Z. Wanguo, “Subsurface defects of fused silica optics and laser induced damage at 351 nm,” Opt. Express 21(10), 12204–12217 (2013).
[Crossref] [PubMed]

N. Shen, M. J. Matthews, S. Elhadj, P. E. Miller, A. J. Nelson, and J. Hamilton, “Correlating optical damage threshold with intrinsic defect populations in fused silica as a function of heat treatment temperature,” J. Phys. D Appl. Phys. 46(16), 165305 (2013).
[Crossref]

2012 (1)

Z. Zheng, X. T. Zu, X. D. Jiang, X. Xiang, J. Huang, X. D. Zhou, C. H. Li, W. G. Zheng, and L. Li, “Effect of HF etching on the surface quality and laser-induced damage of fused silica,” Opt. Laser Technol. 44(4), 1039–1042 (2012).
[Crossref]

2011 (2)

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

Y. G. Li, N. Zheng, H. B. Li, J. Hou, X. Y. Lei, X. H. Chen, Z. G. Yuan, Z. Z. Guo, J. Wang, Y. B. Guo, and Q. Xu, “Morphology and distribution of subsurface damage in optical fused silica parts,” Appl. Surf. Sci. 257(6), 2066–2073 (2011).
[Crossref]

2010 (2)

2009 (3)

2008 (1)

X. F. Song, Y. C. Sun, H. Zhong, H. J. Wang, and Z. A. Gu, “Synthesis of silica glass by plasma chemical vapor deposition method,” J. Chinese Ceram. Soc. 36, 531–534 (2008).

2006 (2)

I. L. Bass, V. G. Draggoo, G. M. Guss, R. P. Hackel, and M. A. Norton, “Mitigation of laser damage growth in fused silica with a galvanometer scanned CO2 laser,” Proc. SPIE 5991, 62612A (2006).
[Crossref]

A. During, P. Bouchut, J.-G. Coutard, C. Leymarie, and H. Bercegol, “Mitigation of laser damage on fused silica surfaces with a variable profile CO2 laser beam,” Proc. SPIE 6403, 640323 (2006).
[Crossref]

2005 (1)

P. E. Miller, T. I. Suratwala, L. L. Wong, M. D. Feit, J. A. Menapace, P. J. Davis, and R. A. Steele, “The distribution of subsurface damage in fused silica,” Proc. SPIE 5991, 599101 (2005).
[Crossref]

2004 (2)

M. D. Feit and A. M. Rubenchik, “Influence of subsurface cracks on laser-induced surface damage,” Proc. SPIE 5273, 264–272 (2004).
[Crossref]

L. Lamaignere, H. Bercegol, P. Bouchut, A. During, J. Neauport, H. Piombini, and G. Raze, “Enhanced optical damage resistance of fused silica surfaces using UV laser conditioning and CO2 laser treatment,” Proc. SPIE 5448, 952–960 (2004).
[Crossref]

2003 (1)

S. O. Kucheyev and S. G. Demos, “Optical defects produced in fused silica during laser-induced breakdown,” Appl. Phys. Lett. 82(19), 3230–3232 (2003).
[Crossref]

2001 (1)

1996 (1)

Z. X. Chen, W. R. Jiang, and S. N. He, “Strengthening of Fused Quartz Ceramic by Surface Coating,” Glass Enamel 25, 40–43 (1996).

Adams, J. J.

Ambard, C.

Bass, I. L.

I. L. Bass, V. G. Draggoo, G. M. Guss, R. P. Hackel, and M. A. Norton, “Mitigation of laser damage growth in fused silica with a galvanometer scanned CO2 laser,” Proc. SPIE 5991, 62612A (2006).
[Crossref]

Bercegol, H.

A. During, P. Bouchut, J.-G. Coutard, C. Leymarie, and H. Bercegol, “Mitigation of laser damage on fused silica surfaces with a variable profile CO2 laser beam,” Proc. SPIE 6403, 640323 (2006).
[Crossref]

L. Lamaignere, H. Bercegol, P. Bouchut, A. During, J. Neauport, H. Piombini, and G. Raze, “Enhanced optical damage resistance of fused silica surfaces using UV laser conditioning and CO2 laser treatment,” Proc. SPIE 5448, 952–960 (2004).
[Crossref]

Bouchut, P.

A. During, P. Bouchut, J.-G. Coutard, C. Leymarie, and H. Bercegol, “Mitigation of laser damage on fused silica surfaces with a variable profile CO2 laser beam,” Proc. SPIE 6403, 640323 (2006).
[Crossref]

L. Lamaignere, H. Bercegol, P. Bouchut, A. During, J. Neauport, H. Piombini, and G. Raze, “Enhanced optical damage resistance of fused silica surfaces using UV laser conditioning and CO2 laser treatment,” Proc. SPIE 5448, 952–960 (2004).
[Crossref]

Bude, J. D.

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

M. D. Feit, T. I. Suratwala, L. L. Wong, W. A. Steele, P. E. Miller, and J. D. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

Carr, C. W.

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

Chase, L. L.

Chen, J.

Y. L. Jiang, J. Chen, K. Yang, Y. Jiang, W. Liao, C. C. Zhang, Y. Y. Ye, X. Y. Luan, H. J. Wang, X. L. Jiang, X. D. Yuan, and L. J. Zhang, “UV laser conditioning of the sol-gel SiO2 film coated fused silica optics,” Optik (Stuttg.) 139, 178–184 (2017).
[Crossref]

Chen, X.

Chen, X. H.

Y. G. Li, N. Zheng, H. B. Li, J. Hou, X. Y. Lei, X. H. Chen, Z. G. Yuan, Z. Z. Guo, J. Wang, Y. B. Guo, and Q. Xu, “Morphology and distribution of subsurface damage in optical fused silica parts,” Appl. Surf. Sci. 257(6), 2066–2073 (2011).
[Crossref]

Chen, Z. X.

Z. X. Chen, W. R. Jiang, and S. N. He, “Strengthening of Fused Quartz Ceramic by Surface Coating,” Glass Enamel 25, 40–43 (1996).

Cheng, J.

J. Cheng, J. H. Wang, J. Hou, H. X. Wang, and L. Zhang, “Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with HF Acid Etching,” Appl. Sci. (Basel) 7(8), 838–861 (2017).
[Crossref]

Cormont, P.

Coutard, J.-G.

A. During, P. Bouchut, J.-G. Coutard, C. Leymarie, and H. Bercegol, “Mitigation of laser damage on fused silica surfaces with a variable profile CO2 laser beam,” Proc. SPIE 6403, 640323 (2006).
[Crossref]

Darbois, N.

Davis, P. J.

P. E. Miller, T. I. Suratwala, L. L. Wong, M. D. Feit, J. A. Menapace, P. J. Davis, and R. A. Steele, “The distribution of subsurface damage in fused silica,” Proc. SPIE 5991, 599101 (2005).
[Crossref]

Demos, S. G.

Deng, Y.

Destribats, J.

Draggoo, V. G.

I. L. Bass, V. G. Draggoo, G. M. Guss, R. P. Hackel, and M. A. Norton, “Mitigation of laser damage growth in fused silica with a galvanometer scanned CO2 laser,” Proc. SPIE 5991, 62612A (2006).
[Crossref]

Du, X. R.

Y. C. Sun, X. F. Song, X. R. Du, X. Q. Zhang, H. Wang, and X. H. Yang, “Influence of Ionizing Gas Flow on Structural Homogeneity of Type IV Silica Glass,” Key Eng. Mater. 726, 409–413 (2017).
[Crossref]

During, A.

A. During, P. Bouchut, J.-G. Coutard, C. Leymarie, and H. Bercegol, “Mitigation of laser damage on fused silica surfaces with a variable profile CO2 laser beam,” Proc. SPIE 6403, 640323 (2006).
[Crossref]

L. Lamaignere, H. Bercegol, P. Bouchut, A. During, J. Neauport, H. Piombini, and G. Raze, “Enhanced optical damage resistance of fused silica surfaces using UV laser conditioning and CO2 laser treatment,” Proc. SPIE 5448, 952–960 (2004).
[Crossref]

Elhadj, S.

N. Shen, M. J. Matthews, S. Elhadj, P. E. Miller, A. J. Nelson, and J. Hamilton, “Correlating optical damage threshold with intrinsic defect populations in fused silica as a function of heat treatment temperature,” J. Phys. D Appl. Phys. 46(16), 165305 (2013).
[Crossref]

Feit, M. D.

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

M. D. Feit, T. I. Suratwala, L. L. Wong, W. A. Steele, P. E. Miller, and J. D. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

P. E. Miller, T. I. Suratwala, L. L. Wong, M. D. Feit, J. A. Menapace, P. J. Davis, and R. A. Steele, “The distribution of subsurface damage in fused silica,” Proc. SPIE 5991, 599101 (2005).
[Crossref]

M. D. Feit and A. M. Rubenchik, “Influence of subsurface cracks on laser-induced surface damage,” Proc. SPIE 5273, 264–272 (2004).
[Crossref]

Fengrui, W.

Geng, F.

J. Huang, F. Wang, H. Liu, F. Geng, X. Jiang, L. Sun, X. Ye, Q. Li, W. Wu, W. Zheng, and D. Sun, “Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics,” Sci. Rep. 7(1), 16239 (2017).
[Crossref] [PubMed]

Génin, F. Y.

Gu, Z. A.

X. F. Song, Y. C. Sun, H. Zhong, H. J. Wang, and Z. A. Gu, “Synthesis of silica glass by plasma chemical vapor deposition method,” J. Chinese Ceram. Soc. 36, 531–534 (2008).

Guo, Y.

Guo, Y. B.

Y. G. Li, N. Zheng, H. B. Li, J. Hou, X. Y. Lei, X. H. Chen, Z. G. Yuan, Z. Z. Guo, J. Wang, Y. B. Guo, and Q. Xu, “Morphology and distribution of subsurface damage in optical fused silica parts,” Appl. Surf. Sci. 257(6), 2066–2073 (2011).
[Crossref]

Guo, Z. Z.

Y. G. Li, N. Zheng, H. B. Li, J. Hou, X. Y. Lei, X. H. Chen, Z. G. Yuan, Z. Z. Guo, J. Wang, Y. B. Guo, and Q. Xu, “Morphology and distribution of subsurface damage in optical fused silica parts,” Appl. Surf. Sci. 257(6), 2066–2073 (2011).
[Crossref]

Guss, G. M.

I. L. Bass, V. G. Draggoo, G. M. Guss, R. P. Hackel, and M. A. Norton, “Mitigation of laser damage growth in fused silica with a galvanometer scanned CO2 laser,” Proc. SPIE 5991, 62612A (2006).
[Crossref]

Hackel, R. P.

I. L. Bass, V. G. Draggoo, G. M. Guss, R. P. Hackel, and M. A. Norton, “Mitigation of laser damage growth in fused silica with a galvanometer scanned CO2 laser,” Proc. SPIE 5991, 62612A (2006).
[Crossref]

Hamilton, J.

N. Shen, M. J. Matthews, S. Elhadj, P. E. Miller, A. J. Nelson, and J. Hamilton, “Correlating optical damage threshold with intrinsic defect populations in fused silica as a function of heat treatment temperature,” J. Phys. D Appl. Phys. 46(16), 165305 (2013).
[Crossref]

He, S. N.

Z. X. Chen, W. R. Jiang, and S. N. He, “Strengthening of Fused Quartz Ceramic by Surface Coating,” Glass Enamel 25, 40–43 (1996).

Hongjie, L.

Hou, J.

J. Cheng, J. H. Wang, J. Hou, H. X. Wang, and L. Zhang, “Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with HF Acid Etching,” Appl. Sci. (Basel) 7(8), 838–861 (2017).
[Crossref]

Y. G. Li, N. Zheng, H. B. Li, J. Hou, X. Y. Lei, X. H. Chen, Z. G. Yuan, Z. Z. Guo, J. Wang, Y. B. Guo, and Q. Xu, “Morphology and distribution of subsurface damage in optical fused silica parts,” Appl. Surf. Sci. 257(6), 2066–2073 (2011).
[Crossref]

Huang, H.

Huang, J.

J. Huang, F. Wang, H. Liu, F. Geng, X. Jiang, L. Sun, X. Ye, Q. Li, W. Wu, W. Zheng, and D. Sun, “Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics,” Sci. Rep. 7(1), 16239 (2017).
[Crossref] [PubMed]

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Z. Zheng, X. T. Zu, X. D. Jiang, X. Xiang, J. Huang, X. D. Zhou, C. H. Li, W. G. Zheng, and L. Li, “Effect of HF etching on the surface quality and laser-induced damage of fused silica,” Opt. Laser Technol. 44(4), 1039–1042 (2012).
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J. Huang, F. Wang, H. Liu, F. Geng, X. Jiang, L. Sun, X. Ye, Q. Li, W. Wu, W. Zheng, and D. Sun, “Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics,” Sci. Rep. 7(1), 16239 (2017).
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Li, X.

X. Li, L. Jiang, L. Li, and Y. Yan, “Effects of HF etching on nanoindentation response of ion-exchanged aluminosilicate float glass on air and tin sides,” J. Mater. Sci. 52(8), 4367–4377 (2017).
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Li, Y.

Y. Li, H. Yan, K. Yang, C. Yao, Z. Wang, X. Zou, C. Yan, X. Yuan, X. Ju, and L. Yang, “Surface molecular structure defects and laser-induced damage threshold of fused silica during a manufacturing process,” Sci. Rep. 7(1), 17870 (2017).
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J. Huang, F. Wang, H. Liu, F. Geng, X. Jiang, L. Sun, X. Ye, Q. Li, W. Wu, W. Zheng, and D. Sun, “Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics,” Sci. Rep. 7(1), 16239 (2017).
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L. Sun, H. Jin, X. Ye, H. Liu, F. Wang, X. Jiang, W. Wu, and W. Zheng, “Surface modification and etch process optimization of fused silica during reaction CHF 3 –Ar plasma etching,” Optik (Stuttg.) 127(1), 206–211 (2016).
[Crossref]

L. Sun, H. Liu, J. Huang, X. Ye, H. Xia, Q. Li, X. Jiang, W. Wu, L. Yang, and W. Zheng, “Reaction ion etching process for improving laser damage resistance of fused silica optical surface,” Opt. Express 24(1), 199–211 (2016).
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L. Sun, J. Huang, H. Liu, X. Ye, J. Wu, X. Jiang, L. Yang, W. Zheng, and W. Wu, “Combination of reaction ion etching and dynamic chemical etching for improving laser damage resistance of fused silica optical surfaces,” Opt. Lett. 41(19), 4464–4467 (2016).
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Liu, H. J.

H. J. Liu, X. Ye, X. D. Zhou, J. Huang, F. R. Wang, X. Y. Zhou, W. D. Wu, X. D. Jiang, Z. Sui, and W. G. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
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Liu, X. F.

M. P. Zhu, K. Yi, D. W. Li, X. F. Liu, H. J. Qi, and J. D. Shao, “Influence of SiO2 overcoat layer and electric field distribution on laser damage threshold and damage morphology of transport mirror coatings,” Opt. Commun. 319, 75–79 (2014).
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Liu, Z.

Y. Li, Z. Liu, R. Xie, J. Wang, and Q. Xu, “The surface layer of fused silica finished by various polishing techniques.,” in Symposium on Photonics and Optoelectronic (2010), 1–6.
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Matthews, M. J.

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Miller, P. E.

N. Shen, M. J. Matthews, S. Elhadj, P. E. Miller, A. J. Nelson, and J. Hamilton, “Correlating optical damage threshold with intrinsic defect populations in fused silica as a function of heat treatment temperature,” J. Phys. D Appl. Phys. 46(16), 165305 (2013).
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T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
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M. D. Feit, T. I. Suratwala, L. L. Wong, W. A. Steele, P. E. Miller, and J. D. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
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P. E. Miller, T. I. Suratwala, L. L. Wong, M. D. Feit, J. A. Menapace, P. J. Davis, and R. A. Steele, “The distribution of subsurface damage in fused silica,” Proc. SPIE 5991, 599101 (2005).
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T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
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Nelson, A. J.

N. Shen, M. J. Matthews, S. Elhadj, P. E. Miller, A. J. Nelson, and J. Hamilton, “Correlating optical damage threshold with intrinsic defect populations in fused silica as a function of heat treatment temperature,” J. Phys. D Appl. Phys. 46(16), 165305 (2013).
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Norton, M. A.

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
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L. Lamaignere, H. Bercegol, P. Bouchut, A. During, J. Neauport, H. Piombini, and G. Raze, “Enhanced optical damage resistance of fused silica surfaces using UV laser conditioning and CO2 laser treatment,” Proc. SPIE 5448, 952–960 (2004).
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Qi, H. J.

M. P. Zhu, K. Yi, D. W. Li, X. F. Liu, H. J. Qi, and J. D. Shao, “Influence of SiO2 overcoat layer and electric field distribution on laser damage threshold and damage morphology of transport mirror coatings,” Opt. Commun. 319, 75–79 (2014).
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Raze, G.

L. Lamaignere, H. Bercegol, P. Bouchut, A. During, J. Neauport, H. Piombini, and G. Raze, “Enhanced optical damage resistance of fused silica surfaces using UV laser conditioning and CO2 laser treatment,” Proc. SPIE 5448, 952–960 (2004).
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Shao, J. D.

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N. Shen, M. J. Matthews, S. Elhadj, P. E. Miller, A. J. Nelson, and J. Hamilton, “Correlating optical damage threshold with intrinsic defect populations in fused silica as a function of heat treatment temperature,” J. Phys. D Appl. Phys. 46(16), 165305 (2013).
[Crossref]

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
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Y. C. Sun, X. F. Song, X. R. Du, X. Q. Zhang, H. Wang, and X. H. Yang, “Influence of Ionizing Gas Flow on Structural Homogeneity of Type IV Silica Glass,” Key Eng. Mater. 726, 409–413 (2017).
[Crossref]

X. F. Song, Y. C. Sun, H. Zhong, H. J. Wang, and Z. A. Gu, “Synthesis of silica glass by plasma chemical vapor deposition method,” J. Chinese Ceram. Soc. 36, 531–534 (2008).

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T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

P. E. Miller, T. I. Suratwala, L. L. Wong, M. D. Feit, J. A. Menapace, P. J. Davis, and R. A. Steele, “The distribution of subsurface damage in fused silica,” Proc. SPIE 5991, 599101 (2005).
[Crossref]

Steele, W. A.

M. D. Feit, T. I. Suratwala, L. L. Wong, W. A. Steele, P. E. Miller, and J. D. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

Sui, Z.

H. J. Liu, X. Ye, X. D. Zhou, J. Huang, F. R. Wang, X. Y. Zhou, W. D. Wu, X. D. Jiang, Z. Sui, and W. G. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

Sun, D.

J. Huang, F. Wang, H. Liu, F. Geng, X. Jiang, L. Sun, X. Ye, Q. Li, W. Wu, W. Zheng, and D. Sun, “Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics,” Sci. Rep. 7(1), 16239 (2017).
[Crossref] [PubMed]

Sun, L.

J. Huang, F. Wang, H. Liu, F. Geng, X. Jiang, L. Sun, X. Ye, Q. Li, W. Wu, W. Zheng, and D. Sun, “Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics,” Sci. Rep. 7(1), 16239 (2017).
[Crossref] [PubMed]

L. Sun, H. Jin, X. Ye, H. Liu, F. Wang, X. Jiang, W. Wu, and W. Zheng, “Surface modification and etch process optimization of fused silica during reaction CHF 3 –Ar plasma etching,” Optik (Stuttg.) 127(1), 206–211 (2016).
[Crossref]

L. Sun, J. Huang, H. Liu, X. Ye, J. Wu, X. Jiang, L. Yang, W. Zheng, and W. Wu, “Combination of reaction ion etching and dynamic chemical etching for improving laser damage resistance of fused silica optical surfaces,” Opt. Lett. 41(19), 4464–4467 (2016).
[Crossref] [PubMed]

L. Sun, H. Liu, J. Huang, X. Ye, H. Xia, Q. Li, X. Jiang, W. Wu, L. Yang, and W. Zheng, “Reaction ion etching process for improving laser damage resistance of fused silica optical surface,” Opt. Express 24(1), 199–211 (2016).
[Crossref] [PubMed]

Sun, Y. C.

Y. C. Sun, X. F. Song, X. R. Du, X. Q. Zhang, H. Wang, and X. H. Yang, “Influence of Ionizing Gas Flow on Structural Homogeneity of Type IV Silica Glass,” Key Eng. Mater. 726, 409–413 (2017).
[Crossref]

X. F. Song, Y. C. Sun, H. Zhong, H. J. Wang, and Z. A. Gu, “Synthesis of silica glass by plasma chemical vapor deposition method,” J. Chinese Ceram. Soc. 36, 531–534 (2008).

Suratwala, T. I.

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

M. D. Feit, T. I. Suratwala, L. L. Wong, W. A. Steele, P. E. Miller, and J. D. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

P. E. Miller, T. I. Suratwala, L. L. Wong, M. D. Feit, J. A. Menapace, P. J. Davis, and R. A. Steele, “The distribution of subsurface damage in fused silica,” Proc. SPIE 5991, 599101 (2005).
[Crossref]

Wang, F.

J. Huang, F. Wang, H. Liu, F. Geng, X. Jiang, L. Sun, X. Ye, Q. Li, W. Wu, W. Zheng, and D. Sun, “Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics,” Sci. Rep. 7(1), 16239 (2017).
[Crossref] [PubMed]

L. Sun, H. Jin, X. Ye, H. Liu, F. Wang, X. Jiang, W. Wu, and W. Zheng, “Surface modification and etch process optimization of fused silica during reaction CHF 3 –Ar plasma etching,” Optik (Stuttg.) 127(1), 206–211 (2016).
[Crossref]

Wang, F. R.

H. J. Liu, X. Ye, X. D. Zhou, J. Huang, F. R. Wang, X. Y. Zhou, W. D. Wu, X. D. Jiang, Z. Sui, and W. G. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

Wang, H.

Y. C. Sun, X. F. Song, X. R. Du, X. Q. Zhang, H. Wang, and X. H. Yang, “Influence of Ionizing Gas Flow on Structural Homogeneity of Type IV Silica Glass,” Key Eng. Mater. 726, 409–413 (2017).
[Crossref]

Wang, H. J.

Y. L. Jiang, J. Chen, K. Yang, Y. Jiang, W. Liao, C. C. Zhang, Y. Y. Ye, X. Y. Luan, H. J. Wang, X. L. Jiang, X. D. Yuan, and L. J. Zhang, “UV laser conditioning of the sol-gel SiO2 film coated fused silica optics,” Optik (Stuttg.) 139, 178–184 (2017).
[Crossref]

X. F. Song, Y. C. Sun, H. Zhong, H. J. Wang, and Z. A. Gu, “Synthesis of silica glass by plasma chemical vapor deposition method,” J. Chinese Ceram. Soc. 36, 531–534 (2008).

Wang, H. X.

J. Cheng, J. H. Wang, J. Hou, H. X. Wang, and L. Zhang, “Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with HF Acid Etching,” Appl. Sci. (Basel) 7(8), 838–861 (2017).
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Wang, J.

Y. G. Li, N. Zheng, H. B. Li, J. Hou, X. Y. Lei, X. H. Chen, Z. G. Yuan, Z. Z. Guo, J. Wang, Y. B. Guo, and Q. Xu, “Morphology and distribution of subsurface damage in optical fused silica parts,” Appl. Surf. Sci. 257(6), 2066–2073 (2011).
[Crossref]

Y. Li, H. Huang, R. Xie, H. Li, Y. Deng, X. Chen, J. Wang, Q. Xu, W. Yang, and Y. Guo, “A method for evaluating subsurface damage in optical glass,” Opt. Express 18(16), 17180–17186 (2010).
[Crossref] [PubMed]

Y. Li, Z. Liu, R. Xie, J. Wang, and Q. Xu, “The surface layer of fused silica finished by various polishing techniques.,” in Symposium on Photonics and Optoelectronic (2010), 1–6.
[Crossref]

Wang, J. H.

J. Cheng, J. H. Wang, J. Hou, H. X. Wang, and L. Zhang, “Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with HF Acid Etching,” Appl. Sci. (Basel) 7(8), 838–861 (2017).
[Crossref]

Wang, Z.

Y. Li, H. Yan, K. Yang, C. Yao, Z. Wang, X. Zou, C. Yan, X. Yuan, X. Ju, and L. Yang, “Surface molecular structure defects and laser-induced damage threshold of fused silica during a manufacturing process,” Sci. Rep. 7(1), 17870 (2017).
[Crossref] [PubMed]

Wanguo, Z.

Wong, L. L.

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

M. D. Feit, T. I. Suratwala, L. L. Wong, W. A. Steele, P. E. Miller, and J. D. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

P. E. Miller, T. I. Suratwala, L. L. Wong, M. D. Feit, J. A. Menapace, P. J. Davis, and R. A. Steele, “The distribution of subsurface damage in fused silica,” Proc. SPIE 5991, 599101 (2005).
[Crossref]

Wu, J.

Wu, W.

J. Huang, F. Wang, H. Liu, F. Geng, X. Jiang, L. Sun, X. Ye, Q. Li, W. Wu, W. Zheng, and D. Sun, “Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics,” Sci. Rep. 7(1), 16239 (2017).
[Crossref] [PubMed]

L. Sun, H. Jin, X. Ye, H. Liu, F. Wang, X. Jiang, W. Wu, and W. Zheng, “Surface modification and etch process optimization of fused silica during reaction CHF 3 –Ar plasma etching,” Optik (Stuttg.) 127(1), 206–211 (2016).
[Crossref]

L. Sun, J. Huang, H. Liu, X. Ye, J. Wu, X. Jiang, L. Yang, W. Zheng, and W. Wu, “Combination of reaction ion etching and dynamic chemical etching for improving laser damage resistance of fused silica optical surfaces,” Opt. Lett. 41(19), 4464–4467 (2016).
[Crossref] [PubMed]

L. Sun, H. Liu, J. Huang, X. Ye, H. Xia, Q. Li, X. Jiang, W. Wu, L. Yang, and W. Zheng, “Reaction ion etching process for improving laser damage resistance of fused silica optical surface,” Opt. Express 24(1), 199–211 (2016).
[Crossref] [PubMed]

Wu, W. D.

H. J. Liu, X. Ye, X. D. Zhou, J. Huang, F. R. Wang, X. Y. Zhou, W. D. Wu, X. D. Jiang, Z. Sui, and W. G. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

Xia, H.

Xiang, X.

Z. Zheng, X. T. Zu, X. D. Jiang, X. Xiang, J. Huang, X. D. Zhou, C. H. Li, W. G. Zheng, and L. Li, “Effect of HF etching on the surface quality and laser-induced damage of fused silica,” Opt. Laser Technol. 44(4), 1039–1042 (2012).
[Crossref]

Xiaodong, J.

Xiaoyan, Z.

Xie, R.

Y. Li, H. Huang, R. Xie, H. Li, Y. Deng, X. Chen, J. Wang, Q. Xu, W. Yang, and Y. Guo, “A method for evaluating subsurface damage in optical glass,” Opt. Express 18(16), 17180–17186 (2010).
[Crossref] [PubMed]

Y. Li, Z. Liu, R. Xie, J. Wang, and Q. Xu, “The surface layer of fused silica finished by various polishing techniques.,” in Symposium on Photonics and Optoelectronic (2010), 1–6.
[Crossref]

Xin, Y.

Xinda, Z.

Xu, Q.

Y. G. Li, N. Zheng, H. B. Li, J. Hou, X. Y. Lei, X. H. Chen, Z. G. Yuan, Z. Z. Guo, J. Wang, Y. B. Guo, and Q. Xu, “Morphology and distribution of subsurface damage in optical fused silica parts,” Appl. Surf. Sci. 257(6), 2066–2073 (2011).
[Crossref]

Y. Li, H. Huang, R. Xie, H. Li, Y. Deng, X. Chen, J. Wang, Q. Xu, W. Yang, and Y. Guo, “A method for evaluating subsurface damage in optical glass,” Opt. Express 18(16), 17180–17186 (2010).
[Crossref] [PubMed]

Y. Li, Z. Liu, R. Xie, J. Wang, and Q. Xu, “The surface layer of fused silica finished by various polishing techniques.,” in Symposium on Photonics and Optoelectronic (2010), 1–6.
[Crossref]

Yan, C.

Y. Li, H. Yan, K. Yang, C. Yao, Z. Wang, X. Zou, C. Yan, X. Yuan, X. Ju, and L. Yang, “Surface molecular structure defects and laser-induced damage threshold of fused silica during a manufacturing process,” Sci. Rep. 7(1), 17870 (2017).
[Crossref] [PubMed]

Yan, H.

Y. Li, H. Yan, K. Yang, C. Yao, Z. Wang, X. Zou, C. Yan, X. Yuan, X. Ju, and L. Yang, “Surface molecular structure defects and laser-induced damage threshold of fused silica during a manufacturing process,” Sci. Rep. 7(1), 17870 (2017).
[Crossref] [PubMed]

Yan, Y.

X. Li, L. Jiang, L. Li, and Y. Yan, “Effects of HF etching on nanoindentation response of ion-exchanged aluminosilicate float glass on air and tin sides,” J. Mater. Sci. 52(8), 4367–4377 (2017).
[Crossref]

Yang, K.

Y. Li, H. Yan, K. Yang, C. Yao, Z. Wang, X. Zou, C. Yan, X. Yuan, X. Ju, and L. Yang, “Surface molecular structure defects and laser-induced damage threshold of fused silica during a manufacturing process,” Sci. Rep. 7(1), 17870 (2017).
[Crossref] [PubMed]

Y. L. Jiang, J. Chen, K. Yang, Y. Jiang, W. Liao, C. C. Zhang, Y. Y. Ye, X. Y. Luan, H. J. Wang, X. L. Jiang, X. D. Yuan, and L. J. Zhang, “UV laser conditioning of the sol-gel SiO2 film coated fused silica optics,” Optik (Stuttg.) 139, 178–184 (2017).
[Crossref]

Yang, L.

Yang, W.

Yang, X. H.

Y. C. Sun, X. F. Song, X. R. Du, X. Q. Zhang, H. Wang, and X. H. Yang, “Influence of Ionizing Gas Flow on Structural Homogeneity of Type IV Silica Glass,” Key Eng. Mater. 726, 409–413 (2017).
[Crossref]

Yao, C.

Y. Li, H. Yan, K. Yang, C. Yao, Z. Wang, X. Zou, C. Yan, X. Yuan, X. Ju, and L. Yang, “Surface molecular structure defects and laser-induced damage threshold of fused silica during a manufacturing process,” Sci. Rep. 7(1), 17870 (2017).
[Crossref] [PubMed]

Ye, X.

J. Huang, F. Wang, H. Liu, F. Geng, X. Jiang, L. Sun, X. Ye, Q. Li, W. Wu, W. Zheng, and D. Sun, “Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics,” Sci. Rep. 7(1), 16239 (2017).
[Crossref] [PubMed]

L. Sun, H. Jin, X. Ye, H. Liu, F. Wang, X. Jiang, W. Wu, and W. Zheng, “Surface modification and etch process optimization of fused silica during reaction CHF 3 –Ar plasma etching,” Optik (Stuttg.) 127(1), 206–211 (2016).
[Crossref]

L. Sun, J. Huang, H. Liu, X. Ye, J. Wu, X. Jiang, L. Yang, W. Zheng, and W. Wu, “Combination of reaction ion etching and dynamic chemical etching for improving laser damage resistance of fused silica optical surfaces,” Opt. Lett. 41(19), 4464–4467 (2016).
[Crossref] [PubMed]

L. Sun, H. Liu, J. Huang, X. Ye, H. Xia, Q. Li, X. Jiang, W. Wu, L. Yang, and W. Zheng, “Reaction ion etching process for improving laser damage resistance of fused silica optical surface,” Opt. Express 24(1), 199–211 (2016).
[Crossref] [PubMed]

H. J. Liu, X. Ye, X. D. Zhou, J. Huang, F. R. Wang, X. Y. Zhou, W. D. Wu, X. D. Jiang, Z. Sui, and W. G. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

Ye, Y. Y.

Y. L. Jiang, J. Chen, K. Yang, Y. Jiang, W. Liao, C. C. Zhang, Y. Y. Ye, X. Y. Luan, H. J. Wang, X. L. Jiang, X. D. Yuan, and L. J. Zhang, “UV laser conditioning of the sol-gel SiO2 film coated fused silica optics,” Optik (Stuttg.) 139, 178–184 (2017).
[Crossref]

Yi, K.

M. P. Zhu, K. Yi, D. W. Li, X. F. Liu, H. J. Qi, and J. D. Shao, “Influence of SiO2 overcoat layer and electric field distribution on laser damage threshold and damage morphology of transport mirror coatings,” Opt. Commun. 319, 75–79 (2014).
[Crossref]

Yuan, X.

Y. Li, H. Yan, K. Yang, C. Yao, Z. Wang, X. Zou, C. Yan, X. Yuan, X. Ju, and L. Yang, “Surface molecular structure defects and laser-induced damage threshold of fused silica during a manufacturing process,” Sci. Rep. 7(1), 17870 (2017).
[Crossref] [PubMed]

Yuan, X. D.

Y. L. Jiang, J. Chen, K. Yang, Y. Jiang, W. Liao, C. C. Zhang, Y. Y. Ye, X. Y. Luan, H. J. Wang, X. L. Jiang, X. D. Yuan, and L. J. Zhang, “UV laser conditioning of the sol-gel SiO2 film coated fused silica optics,” Optik (Stuttg.) 139, 178–184 (2017).
[Crossref]

Yuan, Z. G.

Y. G. Li, N. Zheng, H. B. Li, J. Hou, X. Y. Lei, X. H. Chen, Z. G. Yuan, Z. Z. Guo, J. Wang, Y. B. Guo, and Q. Xu, “Morphology and distribution of subsurface damage in optical fused silica parts,” Appl. Surf. Sci. 257(6), 2066–2073 (2011).
[Crossref]

Zhan, S.

Zhang, C. C.

Y. L. Jiang, J. Chen, K. Yang, Y. Jiang, W. Liao, C. C. Zhang, Y. Y. Ye, X. Y. Luan, H. J. Wang, X. L. Jiang, X. D. Yuan, and L. J. Zhang, “UV laser conditioning of the sol-gel SiO2 film coated fused silica optics,” Optik (Stuttg.) 139, 178–184 (2017).
[Crossref]

Zhang, L.

J. Cheng, J. H. Wang, J. Hou, H. X. Wang, and L. Zhang, “Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with HF Acid Etching,” Appl. Sci. (Basel) 7(8), 838–861 (2017).
[Crossref]

Zhang, L. J.

Y. L. Jiang, J. Chen, K. Yang, Y. Jiang, W. Liao, C. C. Zhang, Y. Y. Ye, X. Y. Luan, H. J. Wang, X. L. Jiang, X. D. Yuan, and L. J. Zhang, “UV laser conditioning of the sol-gel SiO2 film coated fused silica optics,” Optik (Stuttg.) 139, 178–184 (2017).
[Crossref]

Zhang, X. Q.

Y. C. Sun, X. F. Song, X. R. Du, X. Q. Zhang, H. Wang, and X. H. Yang, “Influence of Ionizing Gas Flow on Structural Homogeneity of Type IV Silica Glass,” Key Eng. Mater. 726, 409–413 (2017).
[Crossref]

Zheng, N.

Y. G. Li, N. Zheng, H. B. Li, J. Hou, X. Y. Lei, X. H. Chen, Z. G. Yuan, Z. Z. Guo, J. Wang, Y. B. Guo, and Q. Xu, “Morphology and distribution of subsurface damage in optical fused silica parts,” Appl. Surf. Sci. 257(6), 2066–2073 (2011).
[Crossref]

Zheng, W.

J. Huang, F. Wang, H. Liu, F. Geng, X. Jiang, L. Sun, X. Ye, Q. Li, W. Wu, W. Zheng, and D. Sun, “Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics,” Sci. Rep. 7(1), 16239 (2017).
[Crossref] [PubMed]

L. Sun, H. Jin, X. Ye, H. Liu, F. Wang, X. Jiang, W. Wu, and W. Zheng, “Surface modification and etch process optimization of fused silica during reaction CHF 3 –Ar plasma etching,” Optik (Stuttg.) 127(1), 206–211 (2016).
[Crossref]

L. Sun, H. Liu, J. Huang, X. Ye, H. Xia, Q. Li, X. Jiang, W. Wu, L. Yang, and W. Zheng, “Reaction ion etching process for improving laser damage resistance of fused silica optical surface,” Opt. Express 24(1), 199–211 (2016).
[Crossref] [PubMed]

L. Sun, J. Huang, H. Liu, X. Ye, J. Wu, X. Jiang, L. Yang, W. Zheng, and W. Wu, “Combination of reaction ion etching and dynamic chemical etching for improving laser damage resistance of fused silica optical surfaces,” Opt. Lett. 41(19), 4464–4467 (2016).
[Crossref] [PubMed]

Zheng, W. G.

H. J. Liu, X. Ye, X. D. Zhou, J. Huang, F. R. Wang, X. Y. Zhou, W. D. Wu, X. D. Jiang, Z. Sui, and W. G. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

Z. Zheng, X. T. Zu, X. D. Jiang, X. Xiang, J. Huang, X. D. Zhou, C. H. Li, W. G. Zheng, and L. Li, “Effect of HF etching on the surface quality and laser-induced damage of fused silica,” Opt. Laser Technol. 44(4), 1039–1042 (2012).
[Crossref]

Zheng, Z.

Z. Zheng, X. T. Zu, X. D. Jiang, X. Xiang, J. Huang, X. D. Zhou, C. H. Li, W. G. Zheng, and L. Li, “Effect of HF etching on the surface quality and laser-induced damage of fused silica,” Opt. Laser Technol. 44(4), 1039–1042 (2012).
[Crossref]

Zhong, H.

X. F. Song, Y. C. Sun, H. Zhong, H. J. Wang, and Z. A. Gu, “Synthesis of silica glass by plasma chemical vapor deposition method,” J. Chinese Ceram. Soc. 36, 531–534 (2008).

Zhou, X. D.

H. J. Liu, X. Ye, X. D. Zhou, J. Huang, F. R. Wang, X. Y. Zhou, W. D. Wu, X. D. Jiang, Z. Sui, and W. G. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

Z. Zheng, X. T. Zu, X. D. Jiang, X. Xiang, J. Huang, X. D. Zhou, C. H. Li, W. G. Zheng, and L. Li, “Effect of HF etching on the surface quality and laser-induced damage of fused silica,” Opt. Laser Technol. 44(4), 1039–1042 (2012).
[Crossref]

Zhou, X. Y.

H. J. Liu, X. Ye, X. D. Zhou, J. Huang, F. R. Wang, X. Y. Zhou, W. D. Wu, X. D. Jiang, Z. Sui, and W. G. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

Zhu, M. P.

M. P. Zhu, K. Yi, D. W. Li, X. F. Liu, H. J. Qi, and J. D. Shao, “Influence of SiO2 overcoat layer and electric field distribution on laser damage threshold and damage morphology of transport mirror coatings,” Opt. Commun. 319, 75–79 (2014).
[Crossref]

Zou, X.

Y. Li, H. Yan, K. Yang, C. Yao, Z. Wang, X. Zou, C. Yan, X. Yuan, X. Ju, and L. Yang, “Surface molecular structure defects and laser-induced damage threshold of fused silica during a manufacturing process,” Sci. Rep. 7(1), 17870 (2017).
[Crossref] [PubMed]

Zu, X. T.

Z. Zheng, X. T. Zu, X. D. Jiang, X. Xiang, J. Huang, X. D. Zhou, C. H. Li, W. G. Zheng, and L. Li, “Effect of HF etching on the surface quality and laser-induced damage of fused silica,” Opt. Laser Technol. 44(4), 1039–1042 (2012).
[Crossref]

Appl. Phys. Lett. (1)

S. O. Kucheyev and S. G. Demos, “Optical defects produced in fused silica during laser-induced breakdown,” Appl. Phys. Lett. 82(19), 3230–3232 (2003).
[Crossref]

Appl. Sci. (Basel) (1)

J. Cheng, J. H. Wang, J. Hou, H. X. Wang, and L. Zhang, “Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with HF Acid Etching,” Appl. Sci. (Basel) 7(8), 838–861 (2017).
[Crossref]

Appl. Surf. Sci. (1)

Y. G. Li, N. Zheng, H. B. Li, J. Hou, X. Y. Lei, X. H. Chen, Z. G. Yuan, Z. Z. Guo, J. Wang, Y. B. Guo, and Q. Xu, “Morphology and distribution of subsurface damage in optical fused silica parts,” Appl. Surf. Sci. 257(6), 2066–2073 (2011).
[Crossref]

Glass Enamel (1)

Z. X. Chen, W. R. Jiang, and S. N. He, “Strengthening of Fused Quartz Ceramic by Surface Coating,” Glass Enamel 25, 40–43 (1996).

J. Am. Ceram. Soc. (1)

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

J. Chinese Ceram. Soc. (1)

X. F. Song, Y. C. Sun, H. Zhong, H. J. Wang, and Z. A. Gu, “Synthesis of silica glass by plasma chemical vapor deposition method,” J. Chinese Ceram. Soc. 36, 531–534 (2008).

J. Mater. Sci. (1)

X. Li, L. Jiang, L. Li, and Y. Yan, “Effects of HF etching on nanoindentation response of ion-exchanged aluminosilicate float glass on air and tin sides,” J. Mater. Sci. 52(8), 4367–4377 (2017).
[Crossref]

J. Opt. Soc. Am. A (1)

J. Phys. D Appl. Phys. (1)

N. Shen, M. J. Matthews, S. Elhadj, P. E. Miller, A. J. Nelson, and J. Hamilton, “Correlating optical damage threshold with intrinsic defect populations in fused silica as a function of heat treatment temperature,” J. Phys. D Appl. Phys. 46(16), 165305 (2013).
[Crossref]

Key Eng. Mater. (1)

Y. C. Sun, X. F. Song, X. R. Du, X. Q. Zhang, H. Wang, and X. H. Yang, “Influence of Ionizing Gas Flow on Structural Homogeneity of Type IV Silica Glass,” Key Eng. Mater. 726, 409–413 (2017).
[Crossref]

Opt. Commun. (1)

M. P. Zhu, K. Yi, D. W. Li, X. F. Liu, H. J. Qi, and J. D. Shao, “Influence of SiO2 overcoat layer and electric field distribution on laser damage threshold and damage morphology of transport mirror coatings,” Opt. Commun. 319, 75–79 (2014).
[Crossref]

Opt. Express (6)

Opt. Laser Technol. (1)

Z. Zheng, X. T. Zu, X. D. Jiang, X. Xiang, J. Huang, X. D. Zhou, C. H. Li, W. G. Zheng, and L. Li, “Effect of HF etching on the surface quality and laser-induced damage of fused silica,” Opt. Laser Technol. 44(4), 1039–1042 (2012).
[Crossref]

Opt. Lett. (1)

Opt. Mater. (1)

H. J. Liu, X. Ye, X. D. Zhou, J. Huang, F. R. Wang, X. Y. Zhou, W. D. Wu, X. D. Jiang, Z. Sui, and W. G. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

Optik (Stuttg.) (2)

Y. L. Jiang, J. Chen, K. Yang, Y. Jiang, W. Liao, C. C. Zhang, Y. Y. Ye, X. Y. Luan, H. J. Wang, X. L. Jiang, X. D. Yuan, and L. J. Zhang, “UV laser conditioning of the sol-gel SiO2 film coated fused silica optics,” Optik (Stuttg.) 139, 178–184 (2017).
[Crossref]

L. Sun, H. Jin, X. Ye, H. Liu, F. Wang, X. Jiang, W. Wu, and W. Zheng, “Surface modification and etch process optimization of fused silica during reaction CHF 3 –Ar plasma etching,” Optik (Stuttg.) 127(1), 206–211 (2016).
[Crossref]

Proc. SPIE (6)

L. Lamaignere, H. Bercegol, P. Bouchut, A. During, J. Neauport, H. Piombini, and G. Raze, “Enhanced optical damage resistance of fused silica surfaces using UV laser conditioning and CO2 laser treatment,” Proc. SPIE 5448, 952–960 (2004).
[Crossref]

I. L. Bass, V. G. Draggoo, G. M. Guss, R. P. Hackel, and M. A. Norton, “Mitigation of laser damage growth in fused silica with a galvanometer scanned CO2 laser,” Proc. SPIE 5991, 62612A (2006).
[Crossref]

A. During, P. Bouchut, J.-G. Coutard, C. Leymarie, and H. Bercegol, “Mitigation of laser damage on fused silica surfaces with a variable profile CO2 laser beam,” Proc. SPIE 6403, 640323 (2006).
[Crossref]

P. E. Miller, T. I. Suratwala, L. L. Wong, M. D. Feit, J. A. Menapace, P. J. Davis, and R. A. Steele, “The distribution of subsurface damage in fused silica,” Proc. SPIE 5991, 599101 (2005).
[Crossref]

M. D. Feit and A. M. Rubenchik, “Influence of subsurface cracks on laser-induced surface damage,” Proc. SPIE 5273, 264–272 (2004).
[Crossref]

M. D. Feit, T. I. Suratwala, L. L. Wong, W. A. Steele, P. E. Miller, and J. D. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

Sci. Rep. (2)

Y. Li, H. Yan, K. Yang, C. Yao, Z. Wang, X. Zou, C. Yan, X. Yuan, X. Ju, and L. Yang, “Surface molecular structure defects and laser-induced damage threshold of fused silica during a manufacturing process,” Sci. Rep. 7(1), 17870 (2017).
[Crossref] [PubMed]

J. Huang, F. Wang, H. Liu, F. Geng, X. Jiang, L. Sun, X. Ye, Q. Li, W. Wu, W. Zheng, and D. Sun, “Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics,” Sci. Rep. 7(1), 16239 (2017).
[Crossref] [PubMed]

Other (1)

Y. Li, Z. Liu, R. Xie, J. Wang, and Q. Xu, “The surface layer of fused silica finished by various polishing techniques.,” in Symposium on Photonics and Optoelectronic (2010), 1–6.
[Crossref]

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Figures (10)

Fig. 1
Fig. 1 Schematic representation of the PCVD process.
Fig. 2
Fig. 2 Surface morphologies (a-d), surface roughness and peak-to-valley (PV) wave front properties (e), of the samples with various post-treatments.
Fig. 3
Fig. 3 Comparison of laser absorption distribution on the surface of fused silica samples with respect to various post-treatments.
Fig. 4
Fig. 4 Quantitative absorption results for all samples.
Fig. 5
Fig. 5 Depth profiles of the impurities in the surface for all the samples.
Fig. 6
Fig. 6 Fluorescence images detected on fused silica surface by confocal fluorescence microscope with respect to various post-treatments.
Fig. 7
Fig. 7 The normalized fluorescence emission spectra of samples.
Fig. 8
Fig. 8 Surface hardness of fused silica samples with respect to various post-treatments.
Fig. 9
Fig. 9 Laser damage probability of fused silica samples with respect to various post-treatments.
Fig. 10
Fig. 10 Surface morphologies of the initial damage sites with respect to various post-treatments.

Tables (2)

Tables Icon

Table 1 Surface post-process parameters of the 4 samples.

Tables Icon

Table 2 Total amount (0-80nm) of four elements (Al, K, Fe, and Ce) in the redeposition layer of the samples with respect to various post-treatments.

Metrics