Abstract

We propose and analyze via simulation a novel approach to implement a complementary metal-oxide-semiconductor compatible and high extinction ratio transverse magnetic pass polarizer on the silicon-on-insulator platform with a 340 nm thick silicon core. The TM-pass polarizer utilizes a highly doped p-silicon waveguide as the transverse hybrid plasmonic waveguide. We observed an extinction ratio of 30.11 dB and an insertion loss of 3.08 dB for a device length of 15 µm. The fabrication process of the proposed TM-pass polarizer is simpler compared to the state-of-the-art since it only uses silicon waveguides and does not require any special material or feature size.

© 2018 Optical Society of America under the terms of the OSA Open Access Publishing Agreement

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2018 (2)

2017 (5)

N. Abadía, X. Dai, Q. Lu, W.-H. Guo, D. Patel, D. V. Plant, and J. F. Donegan, “Highly fabrication tolerant inp based polarization beam splitter based on pin structure,” Opt. Express 25, 10070–10077 (2017).
[Crossref]

M. G. Saber, Z. Xing, D. Patel, E. El-Fiky, N. Abadia, Y. Wang, M. Jacques, M. Morsy-Osman, and D. Plant, “A cmos compatible ultra-compact silicon photonic optical add-drop multiplexer with misaligned sidewall bragg gratings,” IEEE Photon. J. 91–10 (2017).
[Crossref]

X. Hu and J. Wang, “Ultrabroadband compact graphene–silicon tm-pass polarizer,” IEEE Photonics J. 9, 1–10 (2017).

B. Bai, L. Liu, R. Chen, and Z. Zhou, “Low loss, compact tm-pass polarizer based on hybrid plasmonic grating,” IEEE Photonics Technol. Lett. 29, 607–610 (2017).
[Crossref]

C. Li and D. Dai, “Compact polarization beam splitter for silicon photonic integrated circuits with a 340-nm-thick silicon core layer,” Opt. Lett. 42, 4243–4246 (2017).
[Crossref] [PubMed]

2016 (7)

M.-S. Rouifed, C. G. Littlejohns, G. X. Tina, Q. Haodong, T. Hu, Z. Zhang, C. Liu, G. T. Reed, and H. Wang, “Low loss soi waveguides and mmis at the mir wavelength of 2 µ m,” IEEE Photonics Technol. Lett. 28, 2827–2829 (2016).
[Crossref]

L. Liu, Q. Deng, and Z. Zhou, “Manipulation of beat length and wavelength dependence of a polarization beam splitter using a subwavelength grating,” Opt. letters 41, 5126–5129 (2016).
[Crossref]

Z. Qi, G. Hu, L. Li, B. Yun, R. Zhang, and Y. Cui, “Design and analysis of a compact soi-based aluminum/highly doped p-type silicon hybrid plasmonic modulator,” IEEE Photonics J. 8, 1–11 (2016).

K.-W. Chang and C.-C. Huang, “Ultrashort broadband polarization beam splitter based on a combined hybrid plasmonic waveguide,” Sci. reports 6, 19609 (2016).

D. W. Kim, M. H. Lee, Y. Kim, and K. H. Kim, “Ultracompact transverse magnetic mode-pass filter based on one-dimensional photonic crystals with subwavelength structures,” Opt. express 24, 21560–21565 (2016).
[Crossref] [PubMed]

X. Yin, X. Ke, L. Chen, T. Zhang, J. Li, Z. Zhu, and X. Li, “Ultra-broadband te-pass polarizer using a cascade of multiple few-layer graphene embedded silicon waveguides,” J. Light. Technol. 34, 3181–3187 (2016).
[Crossref]

S. I. Azzam and S. Obayya, “Titanium nitride-based cmos-compatible te-pass and tm-pass plasmonic polarizers,” IEEE Photonics Technol. Lett. 28, 367–370 (2016).
[Crossref]

2015 (5)

S. I. Azzam and S. S. Obayya, “Ultra-compact resonant tunneling-based te-pass and tm-pass polarizers for soi platform,” Opt. letters 40, 1061–1064 (2015).
[Crossref]

L. Sánchez, S. Lechago, and P. Sanchis, “Ultra-compact te and tm pass polarizers based on vanadium dioxide on silicon,” Opt. letters 40, 1452–1455 (2015).
[Crossref]

M. G. Saber and R. H. Sagor, “Analysis of cuprous oxide-based ultra-compact nanoplasmonic coupler,” Appl. Nanosci. 5, 217–221 (2015).
[Crossref]

M. G. Saber and R. H. Sagor, “Design and study of nano-plasmonic couplers using aluminium arsenide and alumina,” IET Optoelectronics 9, 125–130 (2015).
[Crossref]

Y. Xiong, D.-X. Xu, J. H. Schmid, P. Cheben, and N. Y. Winnie, “High extinction ratio and broadband silicon te-pass polarizer using subwavelength grating index engineering,” IEEE Photonics J. 7, 1–7 (2015).
[Crossref]

2014 (5)

W. D. Sacher, T. Barwicz, B. J. Taylor, and J. K. Poon, “Polarization rotator-splitters in standard active silicon photonics platforms,” Opt. express 22, 3777–3786 (2014).
[Crossref] [PubMed]

X. Guan, P. Chen, S. Chen, P. Xu, Y. Shi, and D. Dai, “Low-loss ultracompact transverse-magnetic-pass polarizer with a silicon subwavelength grating waveguide,” Opt. letters 39, 4514–4517 (2014).
[Crossref]

D. Linaschke, N. Schilling, I. Dani, U. Klotzbach, and C. Leyens, “Highly n-doped surfaces on n-type silicon wafers by laser-chemical processes,” Energy Procedia 55, 247–254 (2014).
[Crossref]

N. Abadía, T. Bernadin, P. Chaisakul, S. Olivier, D. Marris-Morini, R. E. de Lamaëstre, J. Weeber, and L. Vivien, “Low-power consumption franz-keldysh effect plasmonic modulator,” Opt. express 22, 11236–11243 (2014).
[Crossref] [PubMed]

D.-X. Xu, J. H. Schmid, G. T. Reed, G. Z. Mashanovich, D. J. Thomson, M. Nedeljkovic, X. Chen, D. Van Thourhout, S. Keyvaninia, and S. K. Selvaraja, “Silicon photonic integration platform–have we found the sweet spot?” IEEE J. Sel. Top. Quantum Electron. 20, 189–205 (2014).
[Crossref]

2013 (7)

X. Xiao, H. Xu, X. Li, Z. Li, T. Chu, Y. Yu, and J. Yu, “High-speed, low-loss silicon mach–zehnder modulators with doping optimization,” Opt. express 21, 4116–4125 (2013).
[Crossref] [PubMed]

S. Keyvaninia, G. Roelkens, D. Van Thourhout, C. Jany, M. Lamponi, A. Le Liepvre, F. Lelarge, D. Make, G.-H. Duan, D. Bordel, and J.-M. Fedeli, “Demonstration of a heterogeneously integrated iii-v/soi single wavelength tunable laser,” Opt. express 21, 3784–3792 (2013).
[Crossref] [PubMed]

Y. Huang, Z. Tu, H. Yi, Y. Li, X. Wang, and W. Hu, “Polarization beam splitter based on cascaded step-size multimode interference coupler,” Opt. Eng. 52, 077103 (2013).
[Crossref]

G. V. Naik, V. M. Shalaev, and A. Boltasseva, “Alternative plasmonic materials: beyond gold and silver,” Adv. Mater. 25, 3264–3294 (2013).
[Crossref] [PubMed]

Y. Huang, S. Zhu, H. Zhang, T.-Y. Liow, and G.-Q. Lo, “Cmos compatible horizontal nanoplasmonic slot waveguides te-pass polarizer on silicon-on-insulator platform,” Opt. express 21, 12790–12796 (2013).
[Crossref] [PubMed]

D. Dai, L. Liu, S. Gao, D.-X. Xu, and S. He, “Polarization management for silicon photonic integrated circuits,” Laser & Photonics Rev. 7, 303–328 (2013).
[Crossref]

M. G. Saber and R. H. Sagor, “Characteristics of symmetric surface plasmon polariton mode in glass–metal–glass waveguide,” Plasmonics 8, 1621–1625 (2013).
[Crossref]

2012 (3)

M. Alam, J. S. Aitchison, and M. Mojahedi, “Compact and silicon-on-insulator-compatible hybrid plasmonic te-pass polarizer,” Opt. letters 37, 55–57 (2012).
[Crossref]

Y. A. Vlasov, “Silicon cmos-integrated nano-photonics for computer and data communications beyond 100g,” IEEE Commun. Mag. 50, 567–572 (2012).
[Crossref]

T. K. Ng, M. Z. M. Khan, A. Al-Jabr, and B. S. Ooi, “Analysis of cmos compatible cu-based tm-pass optical polarizer,” IEEE Photon. Technol. Lett. 24, 724–726 (2012).
[Crossref]

2011 (1)

M. Alam, J. S. Aitchsion, and M. Mojahedi, “Compact hybrid tm-pass polarizer for silicon-on-insulator platform,” Appl. optics 50, 2294–2298 (2011).
[Crossref]

2010 (3)

D. Dai, Z. Wang, N. Julian, and J. E. Bowers, “Compact broadband polarizer based on shallowly-etched silicon-on-insulator ridge optical waveguides,” Opt. express 18, 27404–27415 (2010).
[Crossref]

Q. Wang and S.-T. Ho, “Ultracompact tm-pass silicon nanophotonic waveguide polarizer and design,” IEEE Photonics J. 2, 49–56 (2010).
[Crossref]

S. K. Selvaraja, W. Bogaerts, P. Dumon, D. Van Thourhout, and R. Baets, “Subnanometer linewidth uniformity in silicon nanophotonic waveguide devices using cmos fabrication technology,” IEEE J. Sel. Top. Quantum Electron. 16, 316–324 (2010).
[Crossref]

2007 (1)

T. Barwicz, M. R. Watts, M. A. Popović, P. T. Rakich, L. Socci, F. X. Kärtner, E. P. Ippen, and H. I. Smith, “Polarization-transparent microphotonic devices in the strong confinement limit,” Nat. Photonics 1, 57–60 (2007).
[Crossref]

1987 (1)

R. Soref and B. Bennett, “Electrooptical effects in silicon,” IEEE journal quantum electronics 23, 123–129 (1987).
[Crossref]

Abadia, N.

M. G. Saber, Y. Wang, E. El-Fiky, D. Patel, K. A. Shahriar, M. S. Alam, M. Jacques, Z. Xing, L. Xu, N. Abadia, and D. V. Plant, “Transversely coupled fabry-perot resonators with bragg grating reflectors,” Opt. Lett. 43, 13–16 (2018).
[Crossref] [PubMed]

M. G. Saber, Z. Xing, D. Patel, E. El-Fiky, N. Abadia, Y. Wang, M. Jacques, M. Morsy-Osman, and D. Plant, “A cmos compatible ultra-compact silicon photonic optical add-drop multiplexer with misaligned sidewall bragg gratings,” IEEE Photon. J. 91–10 (2017).
[Crossref]

Abadía, N.

Aitchison, J. S.

M. Alam, J. S. Aitchison, and M. Mojahedi, “Compact and silicon-on-insulator-compatible hybrid plasmonic te-pass polarizer,” Opt. letters 37, 55–57 (2012).
[Crossref]

X. Sun, M. Mojahedi, and J. S. Aitchison, “Low insertion loss hybrid plasmonic te-pass polarizer,” in “Lasers and Electro-Optics (CLEO), 2016 Conference on,” (IEEE, 2016), pp. 1–2.

Aitchsion, J. S.

M. Alam, J. S. Aitchsion, and M. Mojahedi, “Compact hybrid tm-pass polarizer for silicon-on-insulator platform,” Appl. optics 50, 2294–2298 (2011).
[Crossref]

Alam, M.

M. Alam, J. S. Aitchison, and M. Mojahedi, “Compact and silicon-on-insulator-compatible hybrid plasmonic te-pass polarizer,” Opt. letters 37, 55–57 (2012).
[Crossref]

M. Alam, J. S. Aitchsion, and M. Mojahedi, “Compact hybrid tm-pass polarizer for silicon-on-insulator platform,” Appl. optics 50, 2294–2298 (2011).
[Crossref]

Alam, M. S.

Al-Jabr, A.

T. K. Ng, M. Z. M. Khan, A. Al-Jabr, and B. S. Ooi, “Analysis of cmos compatible cu-based tm-pass optical polarizer,” IEEE Photon. Technol. Lett. 24, 724–726 (2012).
[Crossref]

Azzam, S. I.

S. I. Azzam and S. Obayya, “Titanium nitride-based cmos-compatible te-pass and tm-pass plasmonic polarizers,” IEEE Photonics Technol. Lett. 28, 367–370 (2016).
[Crossref]

S. I. Azzam and S. S. Obayya, “Ultra-compact resonant tunneling-based te-pass and tm-pass polarizers for soi platform,” Opt. letters 40, 1061–1064 (2015).
[Crossref]

Baets, R.

S. K. Selvaraja, W. Bogaerts, P. Dumon, D. Van Thourhout, and R. Baets, “Subnanometer linewidth uniformity in silicon nanophotonic waveguide devices using cmos fabrication technology,” IEEE J. Sel. Top. Quantum Electron. 16, 316–324 (2010).
[Crossref]

Bai, B.

B. Bai, L. Liu, R. Chen, and Z. Zhou, “Low loss, compact tm-pass polarizer based on hybrid plasmonic grating,” IEEE Photonics Technol. Lett. 29, 607–610 (2017).
[Crossref]

Barwicz, T.

W. D. Sacher, T. Barwicz, B. J. Taylor, and J. K. Poon, “Polarization rotator-splitters in standard active silicon photonics platforms,” Opt. express 22, 3777–3786 (2014).
[Crossref] [PubMed]

T. Barwicz, M. R. Watts, M. A. Popović, P. T. Rakich, L. Socci, F. X. Kärtner, E. P. Ippen, and H. I. Smith, “Polarization-transparent microphotonic devices in the strong confinement limit,” Nat. Photonics 1, 57–60 (2007).
[Crossref]

Bennett, B.

R. Soref and B. Bennett, “Electrooptical effects in silicon,” IEEE journal quantum electronics 23, 123–129 (1987).
[Crossref]

Bernadin, T.

Bogaerts, W.

S. K. Selvaraja, W. Bogaerts, P. Dumon, D. Van Thourhout, and R. Baets, “Subnanometer linewidth uniformity in silicon nanophotonic waveguide devices using cmos fabrication technology,” IEEE J. Sel. Top. Quantum Electron. 16, 316–324 (2010).
[Crossref]

Boltasseva, A.

G. V. Naik, V. M. Shalaev, and A. Boltasseva, “Alternative plasmonic materials: beyond gold and silver,” Adv. Mater. 25, 3264–3294 (2013).
[Crossref] [PubMed]

Bordel, D.

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M. G. Saber and R. H. Sagor, “Characteristics of symmetric surface plasmon polariton mode in glass–metal–glass waveguide,” Plasmonics 8, 1621–1625 (2013).
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Sacher, W. D.

Sagor, R. H.

M. G. Saber and R. H. Sagor, “Analysis of cuprous oxide-based ultra-compact nanoplasmonic coupler,” Appl. Nanosci. 5, 217–221 (2015).
[Crossref]

M. G. Saber and R. H. Sagor, “Design and study of nano-plasmonic couplers using aluminium arsenide and alumina,” IET Optoelectronics 9, 125–130 (2015).
[Crossref]

M. G. Saber and R. H. Sagor, “Characteristics of symmetric surface plasmon polariton mode in glass–metal–glass waveguide,” Plasmonics 8, 1621–1625 (2013).
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Samani, A.

E. Elfiky, A. Samani, D. Patel, and D. Plant, “A high extinction ratio, broadband, and compact polarization beam splitter enabled by cascaded mmis on silicon-on-insulator,” in “Optical Fiber Communication Conference,” (Optical Society of America, 2016), pp. W2A–8.

Sánchez, L.

L. Sánchez, S. Lechago, and P. Sanchis, “Ultra-compact te and tm pass polarizers based on vanadium dioxide on silicon,” Opt. letters 40, 1452–1455 (2015).
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Sanchis, P.

L. Sánchez, S. Lechago, and P. Sanchis, “Ultra-compact te and tm pass polarizers based on vanadium dioxide on silicon,” Opt. letters 40, 1452–1455 (2015).
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Sano, T.

Y. Tanushi, T. Kita, M. Toyama, M. Seki, K. Koshino, N. Yokoyama, M. Ohtsuka, A. Sugiyama, E. Ishitsuka, T. Sano, T. Horikawa, and Y. Hirohito, “Uniform characteristics of si-wire waveguide devices fabricated on 300 mm soi wafers by using arf immersion lithography,” in “Group IV Photonics (GFP), 2013 IEEE 10th International Conference on,” (IEEE, 2013), pp. 105–106.

Schilling, N.

D. Linaschke, N. Schilling, I. Dani, U. Klotzbach, and C. Leyens, “Highly n-doped surfaces on n-type silicon wafers by laser-chemical processes,” Energy Procedia 55, 247–254 (2014).
[Crossref]

Schmid, J. H.

Y. Xiong, D.-X. Xu, J. H. Schmid, P. Cheben, and N. Y. Winnie, “High extinction ratio and broadband silicon te-pass polarizer using subwavelength grating index engineering,” IEEE Photonics J. 7, 1–7 (2015).
[Crossref]

D.-X. Xu, J. H. Schmid, G. T. Reed, G. Z. Mashanovich, D. J. Thomson, M. Nedeljkovic, X. Chen, D. Van Thourhout, S. Keyvaninia, and S. K. Selvaraja, “Silicon photonic integration platform–have we found the sweet spot?” IEEE J. Sel. Top. Quantum Electron. 20, 189–205 (2014).
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Seki, M.

Y. Tanushi, T. Kita, M. Toyama, M. Seki, K. Koshino, N. Yokoyama, M. Ohtsuka, A. Sugiyama, E. Ishitsuka, T. Sano, T. Horikawa, and Y. Hirohito, “Uniform characteristics of si-wire waveguide devices fabricated on 300 mm soi wafers by using arf immersion lithography,” in “Group IV Photonics (GFP), 2013 IEEE 10th International Conference on,” (IEEE, 2013), pp. 105–106.

Selvaraja, S. K.

D.-X. Xu, J. H. Schmid, G. T. Reed, G. Z. Mashanovich, D. J. Thomson, M. Nedeljkovic, X. Chen, D. Van Thourhout, S. Keyvaninia, and S. K. Selvaraja, “Silicon photonic integration platform–have we found the sweet spot?” IEEE J. Sel. Top. Quantum Electron. 20, 189–205 (2014).
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S. K. Selvaraja, W. Bogaerts, P. Dumon, D. Van Thourhout, and R. Baets, “Subnanometer linewidth uniformity in silicon nanophotonic waveguide devices using cmos fabrication technology,” IEEE J. Sel. Top. Quantum Electron. 16, 316–324 (2010).
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Shi, Y.

X. Guan, P. Chen, S. Chen, P. Xu, Y. Shi, and D. Dai, “Low-loss ultracompact transverse-magnetic-pass polarizer with a silicon subwavelength grating waveguide,” Opt. letters 39, 4514–4517 (2014).
[Crossref]

X. Guan, P. Xu, Y. Shi, and D. Dai, “Ultra-compact broadband tm-pass polarizer using a silicon hybrid plasmonic waveguide grating,” in “Asia Communications and Photonics Conference,” (Optical Society of America, 2013), pp. ATh4A–2.

Smith, H. I.

T. Barwicz, M. R. Watts, M. A. Popović, P. T. Rakich, L. Socci, F. X. Kärtner, E. P. Ippen, and H. I. Smith, “Polarization-transparent microphotonic devices in the strong confinement limit,” Nat. Photonics 1, 57–60 (2007).
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Socci, L.

T. Barwicz, M. R. Watts, M. A. Popović, P. T. Rakich, L. Socci, F. X. Kärtner, E. P. Ippen, and H. I. Smith, “Polarization-transparent microphotonic devices in the strong confinement limit,” Nat. Photonics 1, 57–60 (2007).
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Soref, R.

R. Soref and B. Bennett, “Electrooptical effects in silicon,” IEEE journal quantum electronics 23, 123–129 (1987).
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Sugiyama, A.

Y. Tanushi, T. Kita, M. Toyama, M. Seki, K. Koshino, N. Yokoyama, M. Ohtsuka, A. Sugiyama, E. Ishitsuka, T. Sano, T. Horikawa, and Y. Hirohito, “Uniform characteristics of si-wire waveguide devices fabricated on 300 mm soi wafers by using arf immersion lithography,” in “Group IV Photonics (GFP), 2013 IEEE 10th International Conference on,” (IEEE, 2013), pp. 105–106.

Sun, X.

X. Sun, M. Mojahedi, and J. S. Aitchison, “Low insertion loss hybrid plasmonic te-pass polarizer,” in “Lasers and Electro-Optics (CLEO), 2016 Conference on,” (IEEE, 2016), pp. 1–2.

Tanushi, Y.

Y. Tanushi, T. Kita, M. Toyama, M. Seki, K. Koshino, N. Yokoyama, M. Ohtsuka, A. Sugiyama, E. Ishitsuka, T. Sano, T. Horikawa, and Y. Hirohito, “Uniform characteristics of si-wire waveguide devices fabricated on 300 mm soi wafers by using arf immersion lithography,” in “Group IV Photonics (GFP), 2013 IEEE 10th International Conference on,” (IEEE, 2013), pp. 105–106.

Taylor, B. J.

Thomson, D. J.

D.-X. Xu, J. H. Schmid, G. T. Reed, G. Z. Mashanovich, D. J. Thomson, M. Nedeljkovic, X. Chen, D. Van Thourhout, S. Keyvaninia, and S. K. Selvaraja, “Silicon photonic integration platform–have we found the sweet spot?” IEEE J. Sel. Top. Quantum Electron. 20, 189–205 (2014).
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Tina, G. X.

M.-S. Rouifed, C. G. Littlejohns, G. X. Tina, Q. Haodong, T. Hu, Z. Zhang, C. Liu, G. T. Reed, and H. Wang, “Low loss soi waveguides and mmis at the mir wavelength of 2 µ m,” IEEE Photonics Technol. Lett. 28, 2827–2829 (2016).
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Toyama, M.

Y. Tanushi, T. Kita, M. Toyama, M. Seki, K. Koshino, N. Yokoyama, M. Ohtsuka, A. Sugiyama, E. Ishitsuka, T. Sano, T. Horikawa, and Y. Hirohito, “Uniform characteristics of si-wire waveguide devices fabricated on 300 mm soi wafers by using arf immersion lithography,” in “Group IV Photonics (GFP), 2013 IEEE 10th International Conference on,” (IEEE, 2013), pp. 105–106.

Tu, Z.

Y. Huang, Z. Tu, H. Yi, Y. Li, X. Wang, and W. Hu, “Polarization beam splitter based on cascaded step-size multimode interference coupler,” Opt. Eng. 52, 077103 (2013).
[Crossref]

Van Thourhout, D.

D.-X. Xu, J. H. Schmid, G. T. Reed, G. Z. Mashanovich, D. J. Thomson, M. Nedeljkovic, X. Chen, D. Van Thourhout, S. Keyvaninia, and S. K. Selvaraja, “Silicon photonic integration platform–have we found the sweet spot?” IEEE J. Sel. Top. Quantum Electron. 20, 189–205 (2014).
[Crossref]

S. Keyvaninia, G. Roelkens, D. Van Thourhout, C. Jany, M. Lamponi, A. Le Liepvre, F. Lelarge, D. Make, G.-H. Duan, D. Bordel, and J.-M. Fedeli, “Demonstration of a heterogeneously integrated iii-v/soi single wavelength tunable laser,” Opt. express 21, 3784–3792 (2013).
[Crossref] [PubMed]

S. K. Selvaraja, W. Bogaerts, P. Dumon, D. Van Thourhout, and R. Baets, “Subnanometer linewidth uniformity in silicon nanophotonic waveguide devices using cmos fabrication technology,” IEEE J. Sel. Top. Quantum Electron. 16, 316–324 (2010).
[Crossref]

Vivien, L.

Vlasov, Y. A.

Y. A. Vlasov, “Silicon cmos-integrated nano-photonics for computer and data communications beyond 100g,” IEEE Commun. Mag. 50, 567–572 (2012).
[Crossref]

Wang, H.

M.-S. Rouifed, C. G. Littlejohns, G. X. Tina, Q. Haodong, T. Hu, Z. Zhang, C. Liu, G. T. Reed, and H. Wang, “Low loss soi waveguides and mmis at the mir wavelength of 2 µ m,” IEEE Photonics Technol. Lett. 28, 2827–2829 (2016).
[Crossref]

Wang, J.

X. Hu and J. Wang, “Ultrabroadband compact graphene–silicon tm-pass polarizer,” IEEE Photonics J. 9, 1–10 (2017).

Wang, Q.

Q. Wang and S.-T. Ho, “Ultracompact tm-pass silicon nanophotonic waveguide polarizer and design,” IEEE Photonics J. 2, 49–56 (2010).
[Crossref]

Wang, X.

Y. Huang, Z. Tu, H. Yi, Y. Li, X. Wang, and W. Hu, “Polarization beam splitter based on cascaded step-size multimode interference coupler,” Opt. Eng. 52, 077103 (2013).
[Crossref]

Wang, Y.

M. G. Saber, N. Abadía, Y. Wang, and D. V. Plant, “Fabry–perot resonators with transverse coupling on soi using loop mirrors,” Opt. Commun. 415, 121–126 (2018).
[Crossref]

M. G. Saber, Y. Wang, E. El-Fiky, D. Patel, K. A. Shahriar, M. S. Alam, M. Jacques, Z. Xing, L. Xu, N. Abadia, and D. V. Plant, “Transversely coupled fabry-perot resonators with bragg grating reflectors,” Opt. Lett. 43, 13–16 (2018).
[Crossref] [PubMed]

M. G. Saber, Z. Xing, D. Patel, E. El-Fiky, N. Abadia, Y. Wang, M. Jacques, M. Morsy-Osman, and D. Plant, “A cmos compatible ultra-compact silicon photonic optical add-drop multiplexer with misaligned sidewall bragg gratings,” IEEE Photon. J. 91–10 (2017).
[Crossref]

S. Yuan, Y. Wang, Q. Huang, J. Xia, and J. Yu, “Ultracompact tm-pass/te-reflected integrated polarizer based on a hybrid plasmonic waveguide for silicon photonics,” in “Group IV Photonics (GFP), 2014 IEEE 11th International Conference on,” (IEEE, 2014), pp. 183–184.

Wang, Z.

Watts, M. R.

T. Barwicz, M. R. Watts, M. A. Popović, P. T. Rakich, L. Socci, F. X. Kärtner, E. P. Ippen, and H. I. Smith, “Polarization-transparent microphotonic devices in the strong confinement limit,” Nat. Photonics 1, 57–60 (2007).
[Crossref]

Weeber, J.

Winnie, N. Y.

Y. Xiong, D.-X. Xu, J. H. Schmid, P. Cheben, and N. Y. Winnie, “High extinction ratio and broadband silicon te-pass polarizer using subwavelength grating index engineering,” IEEE Photonics J. 7, 1–7 (2015).
[Crossref]

Xia, J.

S. Yuan, Y. Wang, Q. Huang, J. Xia, and J. Yu, “Ultracompact tm-pass/te-reflected integrated polarizer based on a hybrid plasmonic waveguide for silicon photonics,” in “Group IV Photonics (GFP), 2014 IEEE 11th International Conference on,” (IEEE, 2014), pp. 183–184.

Xiao, X.

Xing, Z.

M. G. Saber, Y. Wang, E. El-Fiky, D. Patel, K. A. Shahriar, M. S. Alam, M. Jacques, Z. Xing, L. Xu, N. Abadia, and D. V. Plant, “Transversely coupled fabry-perot resonators with bragg grating reflectors,” Opt. Lett. 43, 13–16 (2018).
[Crossref] [PubMed]

M. G. Saber, Z. Xing, D. Patel, E. El-Fiky, N. Abadia, Y. Wang, M. Jacques, M. Morsy-Osman, and D. Plant, “A cmos compatible ultra-compact silicon photonic optical add-drop multiplexer with misaligned sidewall bragg gratings,” IEEE Photon. J. 91–10 (2017).
[Crossref]

Xiong, Y.

Y. Xiong, D.-X. Xu, J. H. Schmid, P. Cheben, and N. Y. Winnie, “High extinction ratio and broadband silicon te-pass polarizer using subwavelength grating index engineering,” IEEE Photonics J. 7, 1–7 (2015).
[Crossref]

Xu, D.-X.

Y. Xiong, D.-X. Xu, J. H. Schmid, P. Cheben, and N. Y. Winnie, “High extinction ratio and broadband silicon te-pass polarizer using subwavelength grating index engineering,” IEEE Photonics J. 7, 1–7 (2015).
[Crossref]

D.-X. Xu, J. H. Schmid, G. T. Reed, G. Z. Mashanovich, D. J. Thomson, M. Nedeljkovic, X. Chen, D. Van Thourhout, S. Keyvaninia, and S. K. Selvaraja, “Silicon photonic integration platform–have we found the sweet spot?” IEEE J. Sel. Top. Quantum Electron. 20, 189–205 (2014).
[Crossref]

D. Dai, L. Liu, S. Gao, D.-X. Xu, and S. He, “Polarization management for silicon photonic integrated circuits,” Laser & Photonics Rev. 7, 303–328 (2013).
[Crossref]

Xu, H.

Xu, L.

Xu, P.

X. Guan, P. Chen, S. Chen, P. Xu, Y. Shi, and D. Dai, “Low-loss ultracompact transverse-magnetic-pass polarizer with a silicon subwavelength grating waveguide,” Opt. letters 39, 4514–4517 (2014).
[Crossref]

X. Guan, P. Xu, Y. Shi, and D. Dai, “Ultra-compact broadband tm-pass polarizer using a silicon hybrid plasmonic waveguide grating,” in “Asia Communications and Photonics Conference,” (Optical Society of America, 2013), pp. ATh4A–2.

Yi, H.

Y. Huang, Z. Tu, H. Yi, Y. Li, X. Wang, and W. Hu, “Polarization beam splitter based on cascaded step-size multimode interference coupler,” Opt. Eng. 52, 077103 (2013).
[Crossref]

Yin, X.

X. Yin, X. Ke, L. Chen, T. Zhang, J. Li, Z. Zhu, and X. Li, “Ultra-broadband te-pass polarizer using a cascade of multiple few-layer graphene embedded silicon waveguides,” J. Light. Technol. 34, 3181–3187 (2016).
[Crossref]

Yokoyama, N.

Y. Tanushi, T. Kita, M. Toyama, M. Seki, K. Koshino, N. Yokoyama, M. Ohtsuka, A. Sugiyama, E. Ishitsuka, T. Sano, T. Horikawa, and Y. Hirohito, “Uniform characteristics of si-wire waveguide devices fabricated on 300 mm soi wafers by using arf immersion lithography,” in “Group IV Photonics (GFP), 2013 IEEE 10th International Conference on,” (IEEE, 2013), pp. 105–106.

Yu, J.

X. Xiao, H. Xu, X. Li, Z. Li, T. Chu, Y. Yu, and J. Yu, “High-speed, low-loss silicon mach–zehnder modulators with doping optimization,” Opt. express 21, 4116–4125 (2013).
[Crossref] [PubMed]

S. Yuan, Y. Wang, Q. Huang, J. Xia, and J. Yu, “Ultracompact tm-pass/te-reflected integrated polarizer based on a hybrid plasmonic waveguide for silicon photonics,” in “Group IV Photonics (GFP), 2014 IEEE 11th International Conference on,” (IEEE, 2014), pp. 183–184.

Yu, Y.

Yuan, S.

S. Yuan, Y. Wang, Q. Huang, J. Xia, and J. Yu, “Ultracompact tm-pass/te-reflected integrated polarizer based on a hybrid plasmonic waveguide for silicon photonics,” in “Group IV Photonics (GFP), 2014 IEEE 11th International Conference on,” (IEEE, 2014), pp. 183–184.

Yun, B.

Z. Qi, G. Hu, L. Li, B. Yun, R. Zhang, and Y. Cui, “Design and analysis of a compact soi-based aluminum/highly doped p-type silicon hybrid plasmonic modulator,” IEEE Photonics J. 8, 1–11 (2016).

Zhang, H.

Zhang, R.

Z. Qi, G. Hu, L. Li, B. Yun, R. Zhang, and Y. Cui, “Design and analysis of a compact soi-based aluminum/highly doped p-type silicon hybrid plasmonic modulator,” IEEE Photonics J. 8, 1–11 (2016).

Zhang, T.

X. Yin, X. Ke, L. Chen, T. Zhang, J. Li, Z. Zhu, and X. Li, “Ultra-broadband te-pass polarizer using a cascade of multiple few-layer graphene embedded silicon waveguides,” J. Light. Technol. 34, 3181–3187 (2016).
[Crossref]

Zhang, Z.

M.-S. Rouifed, C. G. Littlejohns, G. X. Tina, Q. Haodong, T. Hu, Z. Zhang, C. Liu, G. T. Reed, and H. Wang, “Low loss soi waveguides and mmis at the mir wavelength of 2 µ m,” IEEE Photonics Technol. Lett. 28, 2827–2829 (2016).
[Crossref]

Zhou, Z.

B. Bai, L. Liu, R. Chen, and Z. Zhou, “Low loss, compact tm-pass polarizer based on hybrid plasmonic grating,” IEEE Photonics Technol. Lett. 29, 607–610 (2017).
[Crossref]

L. Liu, Q. Deng, and Z. Zhou, “Manipulation of beat length and wavelength dependence of a polarization beam splitter using a subwavelength grating,” Opt. letters 41, 5126–5129 (2016).
[Crossref]

Zhu, S.

Zhu, Z.

X. Yin, X. Ke, L. Chen, T. Zhang, J. Li, Z. Zhu, and X. Li, “Ultra-broadband te-pass polarizer using a cascade of multiple few-layer graphene embedded silicon waveguides,” J. Light. Technol. 34, 3181–3187 (2016).
[Crossref]

Adv. Mater. (1)

G. V. Naik, V. M. Shalaev, and A. Boltasseva, “Alternative plasmonic materials: beyond gold and silver,” Adv. Mater. 25, 3264–3294 (2013).
[Crossref] [PubMed]

Appl. Nanosci. (1)

M. G. Saber and R. H. Sagor, “Analysis of cuprous oxide-based ultra-compact nanoplasmonic coupler,” Appl. Nanosci. 5, 217–221 (2015).
[Crossref]

Appl. optics (1)

M. Alam, J. S. Aitchsion, and M. Mojahedi, “Compact hybrid tm-pass polarizer for silicon-on-insulator platform,” Appl. optics 50, 2294–2298 (2011).
[Crossref]

Energy Procedia (1)

D. Linaschke, N. Schilling, I. Dani, U. Klotzbach, and C. Leyens, “Highly n-doped surfaces on n-type silicon wafers by laser-chemical processes,” Energy Procedia 55, 247–254 (2014).
[Crossref]

IEEE Commun. Mag. (1)

Y. A. Vlasov, “Silicon cmos-integrated nano-photonics for computer and data communications beyond 100g,” IEEE Commun. Mag. 50, 567–572 (2012).
[Crossref]

IEEE J. Sel. Top. Quantum Electron. (2)

D.-X. Xu, J. H. Schmid, G. T. Reed, G. Z. Mashanovich, D. J. Thomson, M. Nedeljkovic, X. Chen, D. Van Thourhout, S. Keyvaninia, and S. K. Selvaraja, “Silicon photonic integration platform–have we found the sweet spot?” IEEE J. Sel. Top. Quantum Electron. 20, 189–205 (2014).
[Crossref]

S. K. Selvaraja, W. Bogaerts, P. Dumon, D. Van Thourhout, and R. Baets, “Subnanometer linewidth uniformity in silicon nanophotonic waveguide devices using cmos fabrication technology,” IEEE J. Sel. Top. Quantum Electron. 16, 316–324 (2010).
[Crossref]

IEEE journal quantum electronics (1)

R. Soref and B. Bennett, “Electrooptical effects in silicon,” IEEE journal quantum electronics 23, 123–129 (1987).
[Crossref]

IEEE Photon. J. (1)

M. G. Saber, Z. Xing, D. Patel, E. El-Fiky, N. Abadia, Y. Wang, M. Jacques, M. Morsy-Osman, and D. Plant, “A cmos compatible ultra-compact silicon photonic optical add-drop multiplexer with misaligned sidewall bragg gratings,” IEEE Photon. J. 91–10 (2017).
[Crossref]

IEEE Photon. Technol. Lett. (1)

T. K. Ng, M. Z. M. Khan, A. Al-Jabr, and B. S. Ooi, “Analysis of cmos compatible cu-based tm-pass optical polarizer,” IEEE Photon. Technol. Lett. 24, 724–726 (2012).
[Crossref]

IEEE Photonics J. (4)

Q. Wang and S.-T. Ho, “Ultracompact tm-pass silicon nanophotonic waveguide polarizer and design,” IEEE Photonics J. 2, 49–56 (2010).
[Crossref]

Z. Qi, G. Hu, L. Li, B. Yun, R. Zhang, and Y. Cui, “Design and analysis of a compact soi-based aluminum/highly doped p-type silicon hybrid plasmonic modulator,” IEEE Photonics J. 8, 1–11 (2016).

Y. Xiong, D.-X. Xu, J. H. Schmid, P. Cheben, and N. Y. Winnie, “High extinction ratio and broadband silicon te-pass polarizer using subwavelength grating index engineering,” IEEE Photonics J. 7, 1–7 (2015).
[Crossref]

X. Hu and J. Wang, “Ultrabroadband compact graphene–silicon tm-pass polarizer,” IEEE Photonics J. 9, 1–10 (2017).

IEEE Photonics Technol. Lett. (3)

B. Bai, L. Liu, R. Chen, and Z. Zhou, “Low loss, compact tm-pass polarizer based on hybrid plasmonic grating,” IEEE Photonics Technol. Lett. 29, 607–610 (2017).
[Crossref]

M.-S. Rouifed, C. G. Littlejohns, G. X. Tina, Q. Haodong, T. Hu, Z. Zhang, C. Liu, G. T. Reed, and H. Wang, “Low loss soi waveguides and mmis at the mir wavelength of 2 µ m,” IEEE Photonics Technol. Lett. 28, 2827–2829 (2016).
[Crossref]

S. I. Azzam and S. Obayya, “Titanium nitride-based cmos-compatible te-pass and tm-pass plasmonic polarizers,” IEEE Photonics Technol. Lett. 28, 367–370 (2016).
[Crossref]

IET Optoelectronics (1)

M. G. Saber and R. H. Sagor, “Design and study of nano-plasmonic couplers using aluminium arsenide and alumina,” IET Optoelectronics 9, 125–130 (2015).
[Crossref]

J. Light. Technol. (1)

X. Yin, X. Ke, L. Chen, T. Zhang, J. Li, Z. Zhu, and X. Li, “Ultra-broadband te-pass polarizer using a cascade of multiple few-layer graphene embedded silicon waveguides,” J. Light. Technol. 34, 3181–3187 (2016).
[Crossref]

Laser & Photonics Rev. (1)

D. Dai, L. Liu, S. Gao, D.-X. Xu, and S. He, “Polarization management for silicon photonic integrated circuits,” Laser & Photonics Rev. 7, 303–328 (2013).
[Crossref]

Nat. Photonics (1)

T. Barwicz, M. R. Watts, M. A. Popović, P. T. Rakich, L. Socci, F. X. Kärtner, E. P. Ippen, and H. I. Smith, “Polarization-transparent microphotonic devices in the strong confinement limit,” Nat. Photonics 1, 57–60 (2007).
[Crossref]

Opt. Commun. (1)

M. G. Saber, N. Abadía, Y. Wang, and D. V. Plant, “Fabry–perot resonators with transverse coupling on soi using loop mirrors,” Opt. Commun. 415, 121–126 (2018).
[Crossref]

Opt. Eng. (1)

Y. Huang, Z. Tu, H. Yi, Y. Li, X. Wang, and W. Hu, “Polarization beam splitter based on cascaded step-size multimode interference coupler,” Opt. Eng. 52, 077103 (2013).
[Crossref]

Opt. express (7)

D. Dai, Z. Wang, N. Julian, and J. E. Bowers, “Compact broadband polarizer based on shallowly-etched silicon-on-insulator ridge optical waveguides,” Opt. express 18, 27404–27415 (2010).
[Crossref]

S. Keyvaninia, G. Roelkens, D. Van Thourhout, C. Jany, M. Lamponi, A. Le Liepvre, F. Lelarge, D. Make, G.-H. Duan, D. Bordel, and J.-M. Fedeli, “Demonstration of a heterogeneously integrated iii-v/soi single wavelength tunable laser,” Opt. express 21, 3784–3792 (2013).
[Crossref] [PubMed]

X. Xiao, H. Xu, X. Li, Z. Li, T. Chu, Y. Yu, and J. Yu, “High-speed, low-loss silicon mach–zehnder modulators with doping optimization,” Opt. express 21, 4116–4125 (2013).
[Crossref] [PubMed]

Y. Huang, S. Zhu, H. Zhang, T.-Y. Liow, and G.-Q. Lo, “Cmos compatible horizontal nanoplasmonic slot waveguides te-pass polarizer on silicon-on-insulator platform,” Opt. express 21, 12790–12796 (2013).
[Crossref] [PubMed]

W. D. Sacher, T. Barwicz, B. J. Taylor, and J. K. Poon, “Polarization rotator-splitters in standard active silicon photonics platforms,” Opt. express 22, 3777–3786 (2014).
[Crossref] [PubMed]

N. Abadía, T. Bernadin, P. Chaisakul, S. Olivier, D. Marris-Morini, R. E. de Lamaëstre, J. Weeber, and L. Vivien, “Low-power consumption franz-keldysh effect plasmonic modulator,” Opt. express 22, 11236–11243 (2014).
[Crossref] [PubMed]

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Figures (7)

Fig. 1
Fig. 1 (a) Real and imaginary parts of the complex permittivity of the highly doped p-silicon as a function of the carrier concentrations at 1.55 µm wavelength, (b) real and (c) imaginary parts of the complex permittivity of the highly doped p-silicon as a function of the wavelength for different carrier concentrations.
Fig. 2
Fig. 2 (a) Schematic and (b) cross-section of the proposed TM-pass polarizer.
Fig. 3
Fig. 3 Extinction ratio (defined in equation. (3)) as a function of the wavelength for different carrier concentrations with LpSi =15 µm, WpSi = 600 nm, WSi = 260 nm and gap = 200 nm.
Fig. 4
Fig. 4 Variation of the extinction ratio, insertion loss and figure of merit as a function of (a) the LpSi for WpSi = 600 nm, WSi = 260 nm, gap = 200 nm and N = 10×1020 cm −3, (b) the WpSi for LpSi = 15 µm, WSi = 260 nm, gap = 200 nm and N = 10×1020 cm −3, (c) the WSi for LpSi = 15 µm, WpSi = 600 nm, gap = 200 nm and N = 10 × 1020 cm −3, and (d) the gap between the waveguides for LpSi = 15 µm, WpSi = 600 nm, WSi = 260 nm and N = 10×1020 cm−3. Figure of merits are shown in the inset of each figure.
Fig. 5
Fig. 5 Extinction ratio and insertion loss as a function of the wavelength of the reported TM-pass polarizer for LpSi =15 µm, WpSi = 600 nm, WSi = 260 nm, gap = 200 nm and N = 10×1020 cm−3.
Fig. 6
Fig. 6 (a) Schematic showing the mode profiles at different points along the TM-pass polarizer, (b) TM and TE mode propagation through the polarizer. (Electric fields are plotted in both the figures.)
Fig. 7
Fig. 7 Fabrication tolerance analysis of the proposed TM-pass polarizer.

Tables (1)

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Table 1 Comparison with other TM-pass polarizers. ER = Extinction Ratio and IL = Insertion Loss.

Equations (5)

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ε ( ω ) = ε ω p 2 ω 2 ( 1 + i 1 ω τ ) = ( ε ω p 2 τ 2 1 + ω 2 τ 2 ) + i ω p 2 τ ω ( 1 + ω 2 τ 2 )
ε ( ω ) = ( ε σ ω 2 ε 0 τ ) + i σ ω 3 τ 2 ε 0
E R = 10 log 10 P T M o u t p u t P T E o u t p u t
I L = 10 log 10 P T M o u t p u t P T M i n p u t
F O M = E R I L × L

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