J. Zhu, S. Liu, X. Chen, C. Zhang, and H. Jiang, “Robust solution to the inverse problem in optical scatterometry,” Opt. Express 22, 22031–22042 (2014).

[Crossref]
[PubMed]

N. Kumar, P. Petrik, G. K. Ramanandan, O. El Gawhary, S. Roy, S. F. Pereira, W. M. Coene, and H. P. Urbach, “Reconstruction of sub-wavelength features and nano-positioning of gratings using coherent fourier scatterometry,” Opt. Express 22, 24678–24688 (2014).

[Crossref]
[PubMed]

X. Chen, S. Liu, C. Zhang, and H. Jiang, “Improved measurement accuracy in optical scatterometry using correction-based library search,” Appl. Opt. 52, 6726–6734 (2013).

[Crossref]
[PubMed]

J. Zhu, S. Liu, C. Zhang, X. Chen, and Z. Dong, “Identification and reconstruction of diffraction structures in optical scatterometry using support vector machine method,” J. Micro/Nanolithography, MEMS, and MOEMS 12, 013004 (2013).

[Crossref]

F. Qin, Z.-M. Meng, X.-L. Zhong, Y. Liu, and Z.-Y. Li, “Fabrication of semiconductor-polymer compound nonlinear photonic crystal slab with highly uniform infiltration based on nano-imprint lithography technique,” Opt. Express 20, 13091–13099 (2012).

[Crossref]
[PubMed]

N. F. Zhang, R. M. Silver, H. Zhou, and B. M. Barnes, “Improving optical measurement uncertainty with combined multitool metrology using a bayesian approach,” Appl. Opt. 51, 6196–6206 (2012).

[Crossref]
[PubMed]

Y.-N. Kim, J.-S. Paek, S. Rabello, S. Lee, J. Hu, Z. Liu, Y. Hao, and W. McGahan, “Device based in-chip critical dimension and overlay metrology,” Opt. Express 17, 21336–21343 (2009).

[Crossref]
[PubMed]

I. Gereige, S. Robert, S. Thiria, F. Badran, G. Granet, and J. J. Rousseau, “Recognition of diffraction-grating profile using a neural network classifier in optical scatterometry,” JOSA A 25, 1661–1667 (2008).

[Crossref]
[PubMed]

A. Kato, Y. Ikeda, Y. Kasahara, J. Shimanuki, T. Suda, T. Hasegawa, H. Sawabe, and S. Kohjiya, “Optical transparency and silica network structure in cross-linked natural rubber as revealed by spectroscopic and three-dimensional transmission electron microscopy techniques,” JOSA B 25, 1602–1615 (2008).

[Crossref]

C. Raymond, “Overview of scatterometry applications in high volume silicon manufacturing,” Characterization and Metrology for ULSI Technology 2005 788, 394–402 (2005).

[Crossref]

H.-T. Huang and F. L. Terry, “Spectroscopic ellipsometry and reflectometry from gratings (scatterometry) for critical dimension measurement and in situ, real-time process monitoring,” Thin Solid Films 455, 828–836 (2004).

[Crossref]

S. Robert, A. Mure-Ravaud, and D. Lacour, “Characterization of optical diffraction gratings by use of a neural method,” JOSA A 19, 24–32 (2002).

[Crossref]
[PubMed]

X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular spectroscopic scatterometry,” IEEE Trans. Semicond. Manuf. 14, 97–111 (2001).

[Crossref]

M. Hanke, “A regularizing Levenberg-Marquardt scheme, with applications to inverse groundwater filtration problems,” Inv. Prob. 13, 79 (1997).

[Crossref]

C. J. Raymond, M. R. Murnane, S. L. Prins, S. Sohail, H. Naqvi, J. R. McNeil, and J. W. Hosch, “Multiparameter grating metrology using optical scatterometry,” J. Vac. Sci. Technol. A 15, 361–368 (1997).

[Crossref]

S. Naqvi, J. Franke, D. Haaland, R. Gottscho, A. Kornblit, T. Niemczyk, R. Krukar, and J. McNeil, “Etch depth estimation of large-period silicon gratings with multivariate calibration of rigorously simulated diffraction profiles,” JOSA A 11, 2485–2493 (1994).

[Crossref]

R. Krukar, A. Kornblit, L. A. Clark, J. Kruskal, D. Lambert, E. A. Reitman, and R. A. Gottscho, “Reactive ion etching profile and depth characterization using statistical and neural network analysis of light scattering data,” J. Appl. Phys. 74, 3698–3706 (1993).

[Crossref]

G. Binnig, C. F. Quate, and C. Gerber, “Atomic force microscope,” Phys. Rev. Lett. 56, 930 (1986).

[Crossref]
[PubMed]

P. Geladi and B. R. Kowalski, “Partial least-squares regression: a tutorial,” Anal. Chim. Acta 185, 1–17 (1986).

[Crossref]

Y. Lepetre, J.-J. Metois, G. Rasigni, R. Rivoira, and R. Philip, “Characterization of layered synthetic microstructures using transmission electron microscopy,” JOSA A 2, 1356–1362 (1985).

[Crossref]

H. Hotelling, “Analysis of a complex of statistical variables into principal components,” J. Edu. Psychol. 24, 417–441 (1933).

[Crossref]

I. Gereige, S. Robert, S. Thiria, F. Badran, G. Granet, and J. J. Rousseau, “Recognition of diffraction-grating profile using a neural network classifier in optical scatterometry,” JOSA A 25, 1661–1667 (2008).

[Crossref]
[PubMed]

B. McWilliams, D. Balduzzi, and J. M. Buhmann, “Correlated random features for fast semi-supervised learning,” in Proc. Adv. Neural Inf. Process. Syst. (2013), pp. 440–448.

X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular spectroscopic scatterometry,” IEEE Trans. Semicond. Manuf. 14, 97–111 (2001).

[Crossref]

G. Binnig, C. F. Quate, and C. Gerber, “Atomic force microscope,” Phys. Rev. Lett. 56, 930 (1986).

[Crossref]
[PubMed]

B. McWilliams, D. Balduzzi, and J. M. Buhmann, “Correlated random features for fast semi-supervised learning,” in Proc. Adv. Neural Inf. Process. Syst. (2013), pp. 440–448.

K. Chaudhuri, S. M. Kakade, K. Livescu, and K. Sridharan, “Multi-view clustering via canonical correlation analysis,” in Proc. Int. Conf. Mach. Learn. (ACM, 2009), pp. 129–136.

S. Liu, W. Du, X. Chen, H. Jiang, and C. Zhang, “Mueller matrix imaging ellipsometry for nanostructure metrology,” Opt. Express 23, 17316–17329 (2015).

[Crossref]
[PubMed]

J. Zhu, S. Liu, X. Chen, C. Zhang, and H. Jiang, “Robust solution to the inverse problem in optical scatterometry,” Opt. Express 22, 22031–22042 (2014).

[Crossref]
[PubMed]

X. Chen, S. Liu, C. Zhang, and H. Jiang, “Improved measurement accuracy in optical scatterometry using correction-based library search,” Appl. Opt. 52, 6726–6734 (2013).

[Crossref]
[PubMed]

J. Zhu, S. Liu, C. Zhang, X. Chen, and Z. Dong, “Identification and reconstruction of diffraction structures in optical scatterometry using support vector machine method,” J. Micro/Nanolithography, MEMS, and MOEMS 12, 013004 (2013).

[Crossref]

R. Krukar, A. Kornblit, L. A. Clark, J. Kruskal, D. Lambert, E. A. Reitman, and R. A. Gottscho, “Reactive ion etching profile and depth characterization using statistical and neural network analysis of light scattering data,” J. Appl. Phys. 74, 3698–3706 (1993).

[Crossref]

N. Kumar, P. Petrik, G. K. Ramanandan, O. El Gawhary, S. Roy, S. F. Pereira, W. M. Coene, and H. P. Urbach, “Reconstruction of sub-wavelength features and nano-positioning of gratings using coherent fourier scatterometry,” Opt. Express 22, 24678–24688 (2014).

[Crossref]
[PubMed]

J. Zhu, S. Liu, C. Zhang, X. Chen, and Z. Dong, “Identification and reconstruction of diffraction structures in optical scatterometry using support vector machine method,” J. Micro/Nanolithography, MEMS, and MOEMS 12, 013004 (2013).

[Crossref]

N. Kumar, P. Petrik, G. K. Ramanandan, O. El Gawhary, S. Roy, S. F. Pereira, W. M. Coene, and H. P. Urbach, “Reconstruction of sub-wavelength features and nano-positioning of gratings using coherent fourier scatterometry,” Opt. Express 22, 24678–24688 (2014).

[Crossref]
[PubMed]

S. M. Kakade and D. P. Foster, “Multi-view regression via canonical correlation analysis,” in Learning theory (Springer, 2007), pp. 82–96.

[Crossref]

S. Naqvi, J. Franke, D. Haaland, R. Gottscho, A. Kornblit, T. Niemczyk, R. Krukar, and J. McNeil, “Etch depth estimation of large-period silicon gratings with multivariate calibration of rigorously simulated diffraction profiles,” JOSA A 11, 2485–2493 (1994).

[Crossref]

H. Fujiwara, Spectroscopic ellipsometry: principles and applications (John Wiley & Sons, 2007).

[Crossref]

P. Geladi and B. R. Kowalski, “Partial least-squares regression: a tutorial,” Anal. Chim. Acta 185, 1–17 (1986).

[Crossref]

G. Binnig, C. F. Quate, and C. Gerber, “Atomic force microscope,” Phys. Rev. Lett. 56, 930 (1986).

[Crossref]
[PubMed]

I. Gereige, S. Robert, S. Thiria, F. Badran, G. Granet, and J. J. Rousseau, “Recognition of diffraction-grating profile using a neural network classifier in optical scatterometry,” JOSA A 25, 1661–1667 (2008).

[Crossref]
[PubMed]

S. Naqvi, J. Franke, D. Haaland, R. Gottscho, A. Kornblit, T. Niemczyk, R. Krukar, and J. McNeil, “Etch depth estimation of large-period silicon gratings with multivariate calibration of rigorously simulated diffraction profiles,” JOSA A 11, 2485–2493 (1994).

[Crossref]

R. Krukar, A. Kornblit, L. A. Clark, J. Kruskal, D. Lambert, E. A. Reitman, and R. A. Gottscho, “Reactive ion etching profile and depth characterization using statistical and neural network analysis of light scattering data,” J. Appl. Phys. 74, 3698–3706 (1993).

[Crossref]

I. Gereige, S. Robert, S. Thiria, F. Badran, G. Granet, and J. J. Rousseau, “Recognition of diffraction-grating profile using a neural network classifier in optical scatterometry,” JOSA A 25, 1661–1667 (2008).

[Crossref]
[PubMed]

S. Naqvi, J. Franke, D. Haaland, R. Gottscho, A. Kornblit, T. Niemczyk, R. Krukar, and J. McNeil, “Etch depth estimation of large-period silicon gratings with multivariate calibration of rigorously simulated diffraction profiles,” JOSA A 11, 2485–2493 (1994).

[Crossref]

M. Hanke, “A regularizing Levenberg-Marquardt scheme, with applications to inverse groundwater filtration problems,” Inv. Prob. 13, 79 (1997).

[Crossref]

Y.-N. Kim, J.-S. Paek, S. Rabello, S. Lee, J. Hu, Z. Liu, Y. Hao, and W. McGahan, “Device based in-chip critical dimension and overlay metrology,” Opt. Express 17, 21336–21343 (2009).

[Crossref]
[PubMed]

A. Kato, Y. Ikeda, Y. Kasahara, J. Shimanuki, T. Suda, T. Hasegawa, H. Sawabe, and S. Kohjiya, “Optical transparency and silica network structure in cross-linked natural rubber as revealed by spectroscopic and three-dimensional transmission electron microscopy techniques,” JOSA B 25, 1602–1615 (2008).

[Crossref]

C. J. Raymond, M. R. Murnane, S. L. Prins, S. Sohail, H. Naqvi, J. R. McNeil, and J. W. Hosch, “Multiparameter grating metrology using optical scatterometry,” J. Vac. Sci. Technol. A 15, 361–368 (1997).

[Crossref]

H. Hotelling, “Analysis of a complex of statistical variables into principal components,” J. Edu. Psychol. 24, 417–441 (1933).

[Crossref]

Y.-N. Kim, J.-S. Paek, S. Rabello, S. Lee, J. Hu, Z. Liu, Y. Hao, and W. McGahan, “Device based in-chip critical dimension and overlay metrology,” Opt. Express 17, 21336–21343 (2009).

[Crossref]
[PubMed]

H.-T. Huang and F. L. Terry, “Spectroscopic ellipsometry and reflectometry from gratings (scatterometry) for critical dimension measurement and in situ, real-time process monitoring,” Thin Solid Films 455, 828–836 (2004).

[Crossref]

A. Kato, Y. Ikeda, Y. Kasahara, J. Shimanuki, T. Suda, T. Hasegawa, H. Sawabe, and S. Kohjiya, “Optical transparency and silica network structure in cross-linked natural rubber as revealed by spectroscopic and three-dimensional transmission electron microscopy techniques,” JOSA B 25, 1602–1615 (2008).

[Crossref]

X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular spectroscopic scatterometry,” IEEE Trans. Semicond. Manuf. 14, 97–111 (2001).

[Crossref]

S. Liu, W. Du, X. Chen, H. Jiang, and C. Zhang, “Mueller matrix imaging ellipsometry for nanostructure metrology,” Opt. Express 23, 17316–17329 (2015).

[Crossref]
[PubMed]

J. Zhu, S. Liu, X. Chen, C. Zhang, and H. Jiang, “Robust solution to the inverse problem in optical scatterometry,” Opt. Express 22, 22031–22042 (2014).

[Crossref]
[PubMed]

X. Chen, S. Liu, C. Zhang, and H. Jiang, “Improved measurement accuracy in optical scatterometry using correction-based library search,” Appl. Opt. 52, 6726–6734 (2013).

[Crossref]
[PubMed]

K. Chaudhuri, S. M. Kakade, K. Livescu, and K. Sridharan, “Multi-view clustering via canonical correlation analysis,” in Proc. Int. Conf. Mach. Learn. (ACM, 2009), pp. 129–136.

S. M. Kakade and D. P. Foster, “Multi-view regression via canonical correlation analysis,” in Learning theory (Springer, 2007), pp. 82–96.

[Crossref]

A. Kato, Y. Ikeda, Y. Kasahara, J. Shimanuki, T. Suda, T. Hasegawa, H. Sawabe, and S. Kohjiya, “Optical transparency and silica network structure in cross-linked natural rubber as revealed by spectroscopic and three-dimensional transmission electron microscopy techniques,” JOSA B 25, 1602–1615 (2008).

[Crossref]

A. Kato, Y. Ikeda, Y. Kasahara, J. Shimanuki, T. Suda, T. Hasegawa, H. Sawabe, and S. Kohjiya, “Optical transparency and silica network structure in cross-linked natural rubber as revealed by spectroscopic and three-dimensional transmission electron microscopy techniques,” JOSA B 25, 1602–1615 (2008).

[Crossref]

Y.-N. Kim, J.-S. Paek, S. Rabello, S. Lee, J. Hu, Z. Liu, Y. Hao, and W. McGahan, “Device based in-chip critical dimension and overlay metrology,” Opt. Express 17, 21336–21343 (2009).

[Crossref]
[PubMed]

A. Kato, Y. Ikeda, Y. Kasahara, J. Shimanuki, T. Suda, T. Hasegawa, H. Sawabe, and S. Kohjiya, “Optical transparency and silica network structure in cross-linked natural rubber as revealed by spectroscopic and three-dimensional transmission electron microscopy techniques,” JOSA B 25, 1602–1615 (2008).

[Crossref]

S. Naqvi, J. Franke, D. Haaland, R. Gottscho, A. Kornblit, T. Niemczyk, R. Krukar, and J. McNeil, “Etch depth estimation of large-period silicon gratings with multivariate calibration of rigorously simulated diffraction profiles,” JOSA A 11, 2485–2493 (1994).

[Crossref]

R. Krukar, A. Kornblit, L. A. Clark, J. Kruskal, D. Lambert, E. A. Reitman, and R. A. Gottscho, “Reactive ion etching profile and depth characterization using statistical and neural network analysis of light scattering data,” J. Appl. Phys. 74, 3698–3706 (1993).

[Crossref]

P. Geladi and B. R. Kowalski, “Partial least-squares regression: a tutorial,” Anal. Chim. Acta 185, 1–17 (1986).

[Crossref]

S. Naqvi, J. Franke, D. Haaland, R. Gottscho, A. Kornblit, T. Niemczyk, R. Krukar, and J. McNeil, “Etch depth estimation of large-period silicon gratings with multivariate calibration of rigorously simulated diffraction profiles,” JOSA A 11, 2485–2493 (1994).

[Crossref]

R. Krukar, A. Kornblit, L. A. Clark, J. Kruskal, D. Lambert, E. A. Reitman, and R. A. Gottscho, “Reactive ion etching profile and depth characterization using statistical and neural network analysis of light scattering data,” J. Appl. Phys. 74, 3698–3706 (1993).

[Crossref]

R. Krukar, A. Kornblit, L. A. Clark, J. Kruskal, D. Lambert, E. A. Reitman, and R. A. Gottscho, “Reactive ion etching profile and depth characterization using statistical and neural network analysis of light scattering data,” J. Appl. Phys. 74, 3698–3706 (1993).

[Crossref]

N. Kumar, P. Petrik, G. K. Ramanandan, O. El Gawhary, S. Roy, S. F. Pereira, W. M. Coene, and H. P. Urbach, “Reconstruction of sub-wavelength features and nano-positioning of gratings using coherent fourier scatterometry,” Opt. Express 22, 24678–24688 (2014).

[Crossref]
[PubMed]

S. Robert, A. Mure-Ravaud, and D. Lacour, “Characterization of optical diffraction gratings by use of a neural method,” JOSA A 19, 24–32 (2002).

[Crossref]
[PubMed]

R. Krukar, A. Kornblit, L. A. Clark, J. Kruskal, D. Lambert, E. A. Reitman, and R. A. Gottscho, “Reactive ion etching profile and depth characterization using statistical and neural network analysis of light scattering data,” J. Appl. Phys. 74, 3698–3706 (1993).

[Crossref]

Y.-N. Kim, J.-S. Paek, S. Rabello, S. Lee, J. Hu, Z. Liu, Y. Hao, and W. McGahan, “Device based in-chip critical dimension and overlay metrology,” Opt. Express 17, 21336–21343 (2009).

[Crossref]
[PubMed]

Y. Lepetre, J.-J. Metois, G. Rasigni, R. Rivoira, and R. Philip, “Characterization of layered synthetic microstructures using transmission electron microscopy,” JOSA A 2, 1356–1362 (1985).

[Crossref]

S. Liu, W. Du, X. Chen, H. Jiang, and C. Zhang, “Mueller matrix imaging ellipsometry for nanostructure metrology,” Opt. Express 23, 17316–17329 (2015).

[Crossref]
[PubMed]

J. Zhu, S. Liu, X. Chen, C. Zhang, and H. Jiang, “Robust solution to the inverse problem in optical scatterometry,” Opt. Express 22, 22031–22042 (2014).

[Crossref]
[PubMed]

X. Chen, S. Liu, C. Zhang, and H. Jiang, “Improved measurement accuracy in optical scatterometry using correction-based library search,” Appl. Opt. 52, 6726–6734 (2013).

[Crossref]
[PubMed]

J. Zhu, S. Liu, C. Zhang, X. Chen, and Z. Dong, “Identification and reconstruction of diffraction structures in optical scatterometry using support vector machine method,” J. Micro/Nanolithography, MEMS, and MOEMS 12, 013004 (2013).

[Crossref]

Y.-N. Kim, J.-S. Paek, S. Rabello, S. Lee, J. Hu, Z. Liu, Y. Hao, and W. McGahan, “Device based in-chip critical dimension and overlay metrology,” Opt. Express 17, 21336–21343 (2009).

[Crossref]
[PubMed]

K. Chaudhuri, S. M. Kakade, K. Livescu, and K. Sridharan, “Multi-view clustering via canonical correlation analysis,” in Proc. Int. Conf. Mach. Learn. (ACM, 2009), pp. 129–136.

Y.-N. Kim, J.-S. Paek, S. Rabello, S. Lee, J. Hu, Z. Liu, Y. Hao, and W. McGahan, “Device based in-chip critical dimension and overlay metrology,” Opt. Express 17, 21336–21343 (2009).

[Crossref]
[PubMed]

S. Naqvi, J. Franke, D. Haaland, R. Gottscho, A. Kornblit, T. Niemczyk, R. Krukar, and J. McNeil, “Etch depth estimation of large-period silicon gratings with multivariate calibration of rigorously simulated diffraction profiles,” JOSA A 11, 2485–2493 (1994).

[Crossref]

C. J. Raymond, M. R. Murnane, S. L. Prins, S. Sohail, H. Naqvi, J. R. McNeil, and J. W. Hosch, “Multiparameter grating metrology using optical scatterometry,” J. Vac. Sci. Technol. A 15, 361–368 (1997).

[Crossref]

B. McWilliams, D. Balduzzi, and J. M. Buhmann, “Correlated random features for fast semi-supervised learning,” in Proc. Adv. Neural Inf. Process. Syst. (2013), pp. 440–448.

Y. Lepetre, J.-J. Metois, G. Rasigni, R. Rivoira, and R. Philip, “Characterization of layered synthetic microstructures using transmission electron microscopy,” JOSA A 2, 1356–1362 (1985).

[Crossref]

J. J. Moré, “The Levenberg-Marquardt algorithm: implementation and theory,” in Numer. Anal. (Springer, 1978), pp. 105–116.

S. Robert, A. Mure-Ravaud, and D. Lacour, “Characterization of optical diffraction gratings by use of a neural method,” JOSA A 19, 24–32 (2002).

[Crossref]
[PubMed]

C. J. Raymond, M. R. Murnane, S. L. Prins, S. Sohail, H. Naqvi, J. R. McNeil, and J. W. Hosch, “Multiparameter grating metrology using optical scatterometry,” J. Vac. Sci. Technol. A 15, 361–368 (1997).

[Crossref]

C. J. Raymond, M. R. Murnane, S. L. Prins, S. Sohail, H. Naqvi, J. R. McNeil, and J. W. Hosch, “Multiparameter grating metrology using optical scatterometry,” J. Vac. Sci. Technol. A 15, 361–368 (1997).

[Crossref]

S. Naqvi, J. Franke, D. Haaland, R. Gottscho, A. Kornblit, T. Niemczyk, R. Krukar, and J. McNeil, “Etch depth estimation of large-period silicon gratings with multivariate calibration of rigorously simulated diffraction profiles,” JOSA A 11, 2485–2493 (1994).

[Crossref]

S. Naqvi, J. Franke, D. Haaland, R. Gottscho, A. Kornblit, T. Niemczyk, R. Krukar, and J. McNeil, “Etch depth estimation of large-period silicon gratings with multivariate calibration of rigorously simulated diffraction profiles,” JOSA A 11, 2485–2493 (1994).

[Crossref]

X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular spectroscopic scatterometry,” IEEE Trans. Semicond. Manuf. 14, 97–111 (2001).

[Crossref]

Y.-N. Kim, J.-S. Paek, S. Rabello, S. Lee, J. Hu, Z. Liu, Y. Hao, and W. McGahan, “Device based in-chip critical dimension and overlay metrology,” Opt. Express 17, 21336–21343 (2009).

[Crossref]
[PubMed]

N. Kumar, P. Petrik, G. K. Ramanandan, O. El Gawhary, S. Roy, S. F. Pereira, W. M. Coene, and H. P. Urbach, “Reconstruction of sub-wavelength features and nano-positioning of gratings using coherent fourier scatterometry,” Opt. Express 22, 24678–24688 (2014).

[Crossref]
[PubMed]

N. Kumar, P. Petrik, G. K. Ramanandan, O. El Gawhary, S. Roy, S. F. Pereira, W. M. Coene, and H. P. Urbach, “Reconstruction of sub-wavelength features and nano-positioning of gratings using coherent fourier scatterometry,” Opt. Express 22, 24678–24688 (2014).

[Crossref]
[PubMed]

Y. Lepetre, J.-J. Metois, G. Rasigni, R. Rivoira, and R. Philip, “Characterization of layered synthetic microstructures using transmission electron microscopy,” JOSA A 2, 1356–1362 (1985).

[Crossref]

C. J. Raymond, M. R. Murnane, S. L. Prins, S. Sohail, H. Naqvi, J. R. McNeil, and J. W. Hosch, “Multiparameter grating metrology using optical scatterometry,” J. Vac. Sci. Technol. A 15, 361–368 (1997).

[Crossref]

G. Binnig, C. F. Quate, and C. Gerber, “Atomic force microscope,” Phys. Rev. Lett. 56, 930 (1986).

[Crossref]
[PubMed]

Y.-N. Kim, J.-S. Paek, S. Rabello, S. Lee, J. Hu, Z. Liu, Y. Hao, and W. McGahan, “Device based in-chip critical dimension and overlay metrology,” Opt. Express 17, 21336–21343 (2009).

[Crossref]
[PubMed]

N. Kumar, P. Petrik, G. K. Ramanandan, O. El Gawhary, S. Roy, S. F. Pereira, W. M. Coene, and H. P. Urbach, “Reconstruction of sub-wavelength features and nano-positioning of gratings using coherent fourier scatterometry,” Opt. Express 22, 24678–24688 (2014).

[Crossref]
[PubMed]

Y. Lepetre, J.-J. Metois, G. Rasigni, R. Rivoira, and R. Philip, “Characterization of layered synthetic microstructures using transmission electron microscopy,” JOSA A 2, 1356–1362 (1985).

[Crossref]

C. Raymond, “Overview of scatterometry applications in high volume silicon manufacturing,” Characterization and Metrology for ULSI Technology 2005 788, 394–402 (2005).

[Crossref]

C. J. Raymond, M. R. Murnane, S. L. Prins, S. Sohail, H. Naqvi, J. R. McNeil, and J. W. Hosch, “Multiparameter grating metrology using optical scatterometry,” J. Vac. Sci. Technol. A 15, 361–368 (1997).

[Crossref]

R. Krukar, A. Kornblit, L. A. Clark, J. Kruskal, D. Lambert, E. A. Reitman, and R. A. Gottscho, “Reactive ion etching profile and depth characterization using statistical and neural network analysis of light scattering data,” J. Appl. Phys. 74, 3698–3706 (1993).

[Crossref]

Y. Lepetre, J.-J. Metois, G. Rasigni, R. Rivoira, and R. Philip, “Characterization of layered synthetic microstructures using transmission electron microscopy,” JOSA A 2, 1356–1362 (1985).

[Crossref]

I. Gereige, S. Robert, S. Thiria, F. Badran, G. Granet, and J. J. Rousseau, “Recognition of diffraction-grating profile using a neural network classifier in optical scatterometry,” JOSA A 25, 1661–1667 (2008).

[Crossref]
[PubMed]

S. Robert, A. Mure-Ravaud, and D. Lacour, “Characterization of optical diffraction gratings by use of a neural method,” JOSA A 19, 24–32 (2002).

[Crossref]
[PubMed]

I. Gereige, S. Robert, S. Thiria, F. Badran, G. Granet, and J. J. Rousseau, “Recognition of diffraction-grating profile using a neural network classifier in optical scatterometry,” JOSA A 25, 1661–1667 (2008).

[Crossref]
[PubMed]

N. Kumar, P. Petrik, G. K. Ramanandan, O. El Gawhary, S. Roy, S. F. Pereira, W. M. Coene, and H. P. Urbach, “Reconstruction of sub-wavelength features and nano-positioning of gratings using coherent fourier scatterometry,” Opt. Express 22, 24678–24688 (2014).

[Crossref]
[PubMed]

A. Kato, Y. Ikeda, Y. Kasahara, J. Shimanuki, T. Suda, T. Hasegawa, H. Sawabe, and S. Kohjiya, “Optical transparency and silica network structure in cross-linked natural rubber as revealed by spectroscopic and three-dimensional transmission electron microscopy techniques,” JOSA B 25, 1602–1615 (2008).

[Crossref]

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