Abstract

Surface damage precursor evolution has great influence on laser-induced damage threshold improvement of fused silica surface during Ion beam etching. In this work, a series of ion sputtering experiment are carried out to obtain the evolutions of damage precursors (dot-form microstructures, Polishing-Induced Contamination, Hertz scratches, and roughness). Based on ion sputtering theory, surface damage precursor evolutions are analyzed. The results show that the dot-form microstructures will appear during ion beam etching. But as the ion beam etching depth goes up, the dot-form microstructures can be mitigated. And ion-beam etching can broaden and passivate the Hertz scratches without increasing roughness value. A super-smooth surface (0.238nm RMS) can be obtained finally. The relative content of Fe and Ce impurities both significantly reduce after ion beam etching. The laser-induced damage threshold of fused silica is improved by 34% after ion beam etching for 800nm. Research results can be a reference on using ion beam etching process technology to improve laser-induced damage threshold of fused silica optics.

© 2016 Optical Society of America

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2015 (1)

H. Ye, Y. Li, Z. Yuan, J. Wang, Q. Xu, and W. Yang, “Improving UV laser damage threshold of fused silica optics by wet chemical etching technique,” Proc. SPIE 9532, 953221 (2015).
[Crossref]

2014 (4)

J. Bude, P. Miller, N. Shen, T. Suratwala, T. Laurence, W. Steele, S. Baxamusa, L. Wong, W. Carr, D. Cross, M. Monticelli, M. Feit, and G. Guss, “Silica laser damage mechanisms, precursors and their mitigation,” Proc. SPIE 9237, 92370S (2014).
[Crossref]

J. Bude, P. Miller, S. Baxamusa, N. Shen, T. Laurence, W. Steele, T. Suratwala, L. Wong, W. Carr, D. Cross, and M. Monticelli, “High fluence laser damage precursors and their mitigation in fused silica,” Opt. Express 22(5), 5839–5851 (2014).
[Crossref] [PubMed]

R. Catrin, J. Neauport, D. Taroux, P. Cormont, C. Maunier, and S. Lambert, “Magnetorheological finishing for removing surface and subsurface defects of fused silica optics,” Opt. Eng. 53(9), 092010 (2014).
[Crossref]

F. Shi, Y. Tian, X. Peng, and Y. Dai, “Combined technique of elastic magnetorheological finishing and HF etching for high-efficiency improving of the laser-induced damage threshold of fused silica optics,” Appl. Opt. 53(4), 598–604 (2014).
[Crossref] [PubMed]

2013 (1)

F. Shi, Y. Shu, Y. Dai, X. Peng, and S. Li, “Magnetorheological elastic super-smooth finishing for high-efficiency manufacturing of ultraviolet laser resistant optics,” Opt. Eng. 52(7), 075104 (2013).
[Crossref]

2010 (3)

T. Suratwala, P. Miller, J. Bude, R. Steele, N. Shen, M. Monticelli, M. Feit, T. Laurence, M. Norton, C. Carr, and L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2010).
[Crossref]

H. Nguyen, C. Larson, and J. Britten, “Improvement of laser damage resistance and diffraction efficiency of multilayer dielectric diffraction gratings by HF-etch back line width tailoring,” Proc. SPIE 7842, 78421H (2010).

T. Rouxel, H. Ji, J. Guin, F. Augereau, and B. Ruffle, “Indentation deformation mechanism in glass: densification versus shear flow,” J. Appl. Phys. 107(9), 094903 (2010).
[Crossref]

2009 (1)

A. Keller, S. Facsko, and W. Moller, “Evolution of ion-induced ripple patterns on SiO2 surfaces,” Nucl. Instr. Meth. in Phys. Res. B 267, 656–659 (2009).

2006 (1)

J. Wong, L. Ferriera, F. Lindsey, L. Haupt, D. Hutcheon, and H. Kinney, “Morphology and microstructure in fused silica induced by high fluence UV laser pulses,” J. Non-Cryst. Solids 352(3), 255–272 (2006).
[Crossref]

2004 (2)

J. H. Campbell, R. A. Hawley-Fedder, C. J. Stolz, J. A. Menapace, M. R. Borden, P. K. Whitman, J. Yu, M. J. Runkel, M. O. Riley, M. D. Feit, and R. P. Hackel, “NIF optical materials and fabrication technologies: An overview,” Proc. SPIE 5341, 84–101 (2004).
[Crossref]

T. Kamimura, S. Akamatsu, M. Yamamoto, I. Yamato, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jisuno, T. Okamoto, and K. Yoshida, “Enhancement of surface-damage resistance byremoving subsurface damage in fused silica,” Proc. SPIE 5273, 244–249 (2004).
[Crossref]

2003 (1)

P. Bouchut, P. Garrec, and C. Pelle, “Wet etching for the mitigation of laser damage growth in fused silica,” Proc. SPIE 4932, 103–111 (2003).
[Crossref]

2000 (1)

K. Xin and J. Lambropoulos, “Densification of fused silica: effects on nanoindentation,” Proc. SPIE 4102, 112–121 (2000).
[Crossref]

1999 (2)

T. Kamimura, K. Nakai, Y. Mori, T. Sasaki, H. Yoshida, M. Nakatuka, M. Tanaka, S. Toda, M. Tanaka, and K. Yoshida, “Improvement of laser-induced surface damage in UVoptics by ion beam etching (CsLiB6O10and fused silica),” Proc. SPIE 3578, 695–701 (1999).
[Crossref]

T. Kamimura, K. Nakai, M. Yoshimura, Y. Mori, T. Sasaki, M. Tanaka, Y. Okada, H. Yoshida, M. Nakatsuka, T. Kojima, and K. Yoshida, “High damage resistivity of optical surface for UVlasers by ion beam etching,” Rev. Laser Eng. 7(9), 623–627 (1999).
[Crossref]

1998 (1)

T. Kamimura, Y. Mori, T. Sasaki, H. Yoshida, T. Okamoto, and K. Yoshida, “Ion etching of fused silica glasses for high-power lasers,” Jpn. J. Appl. Phys. 37, 4840–4841 (1998).
[Crossref]

1994 (1)

T. Mayer, E. Chason, and A. Howard, “Roughening instability and ion-induced viscous relaxation of SiO2 surfaces,” J. Appl. Phys. 76(3), 1633–1643 (1994).
[Crossref]

1988 (1)

R. Bradley and J. Harper, “Theory of ripple topography induced by ion bombardment,” J. Vac. Sci. Technol. A 6(4), 2390–2395 (1988).
[Crossref]

1969 (1)

P. Sigmund, “Theory of sputtering. I. Sputtering yield of amorphous and polycrystalline targets,” Phys. Rev. 184(2), 383–416 (1969).
[Crossref]

1965 (1)

H. M. Cohen and R. Roy, “Densification of glass at very high pressure,” Phys. Chem. Glasses 6, 149–161 (1965).

Akamatsu, S.

T. Kamimura, S. Akamatsu, M. Yamamoto, I. Yamato, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jisuno, T. Okamoto, and K. Yoshida, “Enhancement of surface-damage resistance byremoving subsurface damage in fused silica,” Proc. SPIE 5273, 244–249 (2004).
[Crossref]

Augereau, F.

T. Rouxel, H. Ji, J. Guin, F. Augereau, and B. Ruffle, “Indentation deformation mechanism in glass: densification versus shear flow,” J. Appl. Phys. 107(9), 094903 (2010).
[Crossref]

Baxamusa, S.

J. Bude, P. Miller, N. Shen, T. Suratwala, T. Laurence, W. Steele, S. Baxamusa, L. Wong, W. Carr, D. Cross, M. Monticelli, M. Feit, and G. Guss, “Silica laser damage mechanisms, precursors and their mitigation,” Proc. SPIE 9237, 92370S (2014).
[Crossref]

J. Bude, P. Miller, S. Baxamusa, N. Shen, T. Laurence, W. Steele, T. Suratwala, L. Wong, W. Carr, D. Cross, and M. Monticelli, “High fluence laser damage precursors and their mitigation in fused silica,” Opt. Express 22(5), 5839–5851 (2014).
[Crossref] [PubMed]

Borden, M. R.

J. H. Campbell, R. A. Hawley-Fedder, C. J. Stolz, J. A. Menapace, M. R. Borden, P. K. Whitman, J. Yu, M. J. Runkel, M. O. Riley, M. D. Feit, and R. P. Hackel, “NIF optical materials and fabrication technologies: An overview,” Proc. SPIE 5341, 84–101 (2004).
[Crossref]

Bouchut, P.

P. Bouchut, P. Garrec, and C. Pelle, “Wet etching for the mitigation of laser damage growth in fused silica,” Proc. SPIE 4932, 103–111 (2003).
[Crossref]

Bradley, R.

R. Bradley and J. Harper, “Theory of ripple topography induced by ion bombardment,” J. Vac. Sci. Technol. A 6(4), 2390–2395 (1988).
[Crossref]

Britten, J.

H. Nguyen, C. Larson, and J. Britten, “Improvement of laser damage resistance and diffraction efficiency of multilayer dielectric diffraction gratings by HF-etch back line width tailoring,” Proc. SPIE 7842, 78421H (2010).

Bude, J.

J. Bude, P. Miller, N. Shen, T. Suratwala, T. Laurence, W. Steele, S. Baxamusa, L. Wong, W. Carr, D. Cross, M. Monticelli, M. Feit, and G. Guss, “Silica laser damage mechanisms, precursors and their mitigation,” Proc. SPIE 9237, 92370S (2014).
[Crossref]

J. Bude, P. Miller, S. Baxamusa, N. Shen, T. Laurence, W. Steele, T. Suratwala, L. Wong, W. Carr, D. Cross, and M. Monticelli, “High fluence laser damage precursors and their mitigation in fused silica,” Opt. Express 22(5), 5839–5851 (2014).
[Crossref] [PubMed]

T. Suratwala, P. Miller, J. Bude, R. Steele, N. Shen, M. Monticelli, M. Feit, T. Laurence, M. Norton, C. Carr, and L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2010).
[Crossref]

Campbell, J. H.

J. H. Campbell, R. A. Hawley-Fedder, C. J. Stolz, J. A. Menapace, M. R. Borden, P. K. Whitman, J. Yu, M. J. Runkel, M. O. Riley, M. D. Feit, and R. P. Hackel, “NIF optical materials and fabrication technologies: An overview,” Proc. SPIE 5341, 84–101 (2004).
[Crossref]

Carr, C.

T. Suratwala, P. Miller, J. Bude, R. Steele, N. Shen, M. Monticelli, M. Feit, T. Laurence, M. Norton, C. Carr, and L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2010).
[Crossref]

Carr, W.

J. Bude, P. Miller, N. Shen, T. Suratwala, T. Laurence, W. Steele, S. Baxamusa, L. Wong, W. Carr, D. Cross, M. Monticelli, M. Feit, and G. Guss, “Silica laser damage mechanisms, precursors and their mitigation,” Proc. SPIE 9237, 92370S (2014).
[Crossref]

J. Bude, P. Miller, S. Baxamusa, N. Shen, T. Laurence, W. Steele, T. Suratwala, L. Wong, W. Carr, D. Cross, and M. Monticelli, “High fluence laser damage precursors and their mitigation in fused silica,” Opt. Express 22(5), 5839–5851 (2014).
[Crossref] [PubMed]

Catrin, R.

R. Catrin, J. Neauport, D. Taroux, P. Cormont, C. Maunier, and S. Lambert, “Magnetorheological finishing for removing surface and subsurface defects of fused silica optics,” Opt. Eng. 53(9), 092010 (2014).
[Crossref]

Chason, E.

T. Mayer, E. Chason, and A. Howard, “Roughening instability and ion-induced viscous relaxation of SiO2 surfaces,” J. Appl. Phys. 76(3), 1633–1643 (1994).
[Crossref]

Cohen, H. M.

H. M. Cohen and R. Roy, “Densification of glass at very high pressure,” Phys. Chem. Glasses 6, 149–161 (1965).

Cormont, P.

R. Catrin, J. Neauport, D. Taroux, P. Cormont, C. Maunier, and S. Lambert, “Magnetorheological finishing for removing surface and subsurface defects of fused silica optics,” Opt. Eng. 53(9), 092010 (2014).
[Crossref]

Cross, D.

J. Bude, P. Miller, N. Shen, T. Suratwala, T. Laurence, W. Steele, S. Baxamusa, L. Wong, W. Carr, D. Cross, M. Monticelli, M. Feit, and G. Guss, “Silica laser damage mechanisms, precursors and their mitigation,” Proc. SPIE 9237, 92370S (2014).
[Crossref]

J. Bude, P. Miller, S. Baxamusa, N. Shen, T. Laurence, W. Steele, T. Suratwala, L. Wong, W. Carr, D. Cross, and M. Monticelli, “High fluence laser damage precursors and their mitigation in fused silica,” Opt. Express 22(5), 5839–5851 (2014).
[Crossref] [PubMed]

Dai, Y.

F. Shi, Y. Tian, X. Peng, and Y. Dai, “Combined technique of elastic magnetorheological finishing and HF etching for high-efficiency improving of the laser-induced damage threshold of fused silica optics,” Appl. Opt. 53(4), 598–604 (2014).
[Crossref] [PubMed]

F. Shi, Y. Shu, Y. Dai, X. Peng, and S. Li, “Magnetorheological elastic super-smooth finishing for high-efficiency manufacturing of ultraviolet laser resistant optics,” Opt. Eng. 52(7), 075104 (2013).
[Crossref]

Facsko, S.

A. Keller, S. Facsko, and W. Moller, “Evolution of ion-induced ripple patterns on SiO2 surfaces,” Nucl. Instr. Meth. in Phys. Res. B 267, 656–659 (2009).

Feit, M.

J. Bude, P. Miller, N. Shen, T. Suratwala, T. Laurence, W. Steele, S. Baxamusa, L. Wong, W. Carr, D. Cross, M. Monticelli, M. Feit, and G. Guss, “Silica laser damage mechanisms, precursors and their mitigation,” Proc. SPIE 9237, 92370S (2014).
[Crossref]

T. Suratwala, P. Miller, J. Bude, R. Steele, N. Shen, M. Monticelli, M. Feit, T. Laurence, M. Norton, C. Carr, and L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2010).
[Crossref]

Feit, M. D.

J. H. Campbell, R. A. Hawley-Fedder, C. J. Stolz, J. A. Menapace, M. R. Borden, P. K. Whitman, J. Yu, M. J. Runkel, M. O. Riley, M. D. Feit, and R. P. Hackel, “NIF optical materials and fabrication technologies: An overview,” Proc. SPIE 5341, 84–101 (2004).
[Crossref]

Ferriera, L.

J. Wong, L. Ferriera, F. Lindsey, L. Haupt, D. Hutcheon, and H. Kinney, “Morphology and microstructure in fused silica induced by high fluence UV laser pulses,” J. Non-Cryst. Solids 352(3), 255–272 (2006).
[Crossref]

Garrec, P.

P. Bouchut, P. Garrec, and C. Pelle, “Wet etching for the mitigation of laser damage growth in fused silica,” Proc. SPIE 4932, 103–111 (2003).
[Crossref]

Guin, J.

T. Rouxel, H. Ji, J. Guin, F. Augereau, and B. Ruffle, “Indentation deformation mechanism in glass: densification versus shear flow,” J. Appl. Phys. 107(9), 094903 (2010).
[Crossref]

Guss, G.

J. Bude, P. Miller, N. Shen, T. Suratwala, T. Laurence, W. Steele, S. Baxamusa, L. Wong, W. Carr, D. Cross, M. Monticelli, M. Feit, and G. Guss, “Silica laser damage mechanisms, precursors and their mitigation,” Proc. SPIE 9237, 92370S (2014).
[Crossref]

Hackel, R. P.

J. H. Campbell, R. A. Hawley-Fedder, C. J. Stolz, J. A. Menapace, M. R. Borden, P. K. Whitman, J. Yu, M. J. Runkel, M. O. Riley, M. D. Feit, and R. P. Hackel, “NIF optical materials and fabrication technologies: An overview,” Proc. SPIE 5341, 84–101 (2004).
[Crossref]

Harper, J.

R. Bradley and J. Harper, “Theory of ripple topography induced by ion bombardment,” J. Vac. Sci. Technol. A 6(4), 2390–2395 (1988).
[Crossref]

Haupt, L.

J. Wong, L. Ferriera, F. Lindsey, L. Haupt, D. Hutcheon, and H. Kinney, “Morphology and microstructure in fused silica induced by high fluence UV laser pulses,” J. Non-Cryst. Solids 352(3), 255–272 (2006).
[Crossref]

Hawley-Fedder, R. A.

J. H. Campbell, R. A. Hawley-Fedder, C. J. Stolz, J. A. Menapace, M. R. Borden, P. K. Whitman, J. Yu, M. J. Runkel, M. O. Riley, M. D. Feit, and R. P. Hackel, “NIF optical materials and fabrication technologies: An overview,” Proc. SPIE 5341, 84–101 (2004).
[Crossref]

Howard, A.

T. Mayer, E. Chason, and A. Howard, “Roughening instability and ion-induced viscous relaxation of SiO2 surfaces,” J. Appl. Phys. 76(3), 1633–1643 (1994).
[Crossref]

Hutcheon, D.

J. Wong, L. Ferriera, F. Lindsey, L. Haupt, D. Hutcheon, and H. Kinney, “Morphology and microstructure in fused silica induced by high fluence UV laser pulses,” J. Non-Cryst. Solids 352(3), 255–272 (2006).
[Crossref]

Ji, H.

T. Rouxel, H. Ji, J. Guin, F. Augereau, and B. Ruffle, “Indentation deformation mechanism in glass: densification versus shear flow,” J. Appl. Phys. 107(9), 094903 (2010).
[Crossref]

Jisuno, T.

T. Kamimura, S. Akamatsu, M. Yamamoto, I. Yamato, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jisuno, T. Okamoto, and K. Yoshida, “Enhancement of surface-damage resistance byremoving subsurface damage in fused silica,” Proc. SPIE 5273, 244–249 (2004).
[Crossref]

Kamimura, T.

T. Kamimura, S. Akamatsu, M. Yamamoto, I. Yamato, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jisuno, T. Okamoto, and K. Yoshida, “Enhancement of surface-damage resistance byremoving subsurface damage in fused silica,” Proc. SPIE 5273, 244–249 (2004).
[Crossref]

T. Kamimura, K. Nakai, Y. Mori, T. Sasaki, H. Yoshida, M. Nakatuka, M. Tanaka, S. Toda, M. Tanaka, and K. Yoshida, “Improvement of laser-induced surface damage in UVoptics by ion beam etching (CsLiB6O10and fused silica),” Proc. SPIE 3578, 695–701 (1999).
[Crossref]

T. Kamimura, K. Nakai, M. Yoshimura, Y. Mori, T. Sasaki, M. Tanaka, Y. Okada, H. Yoshida, M. Nakatsuka, T. Kojima, and K. Yoshida, “High damage resistivity of optical surface for UVlasers by ion beam etching,” Rev. Laser Eng. 7(9), 623–627 (1999).
[Crossref]

T. Kamimura, Y. Mori, T. Sasaki, H. Yoshida, T. Okamoto, and K. Yoshida, “Ion etching of fused silica glasses for high-power lasers,” Jpn. J. Appl. Phys. 37, 4840–4841 (1998).
[Crossref]

Keller, A.

A. Keller, S. Facsko, and W. Moller, “Evolution of ion-induced ripple patterns on SiO2 surfaces,” Nucl. Instr. Meth. in Phys. Res. B 267, 656–659 (2009).

Kinney, H.

J. Wong, L. Ferriera, F. Lindsey, L. Haupt, D. Hutcheon, and H. Kinney, “Morphology and microstructure in fused silica induced by high fluence UV laser pulses,” J. Non-Cryst. Solids 352(3), 255–272 (2006).
[Crossref]

Kojima, T.

T. Kamimura, K. Nakai, M. Yoshimura, Y. Mori, T. Sasaki, M. Tanaka, Y. Okada, H. Yoshida, M. Nakatsuka, T. Kojima, and K. Yoshida, “High damage resistivity of optical surface for UVlasers by ion beam etching,” Rev. Laser Eng. 7(9), 623–627 (1999).
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Lambert, S.

R. Catrin, J. Neauport, D. Taroux, P. Cormont, C. Maunier, and S. Lambert, “Magnetorheological finishing for removing surface and subsurface defects of fused silica optics,” Opt. Eng. 53(9), 092010 (2014).
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Lambropoulos, J.

K. Xin and J. Lambropoulos, “Densification of fused silica: effects on nanoindentation,” Proc. SPIE 4102, 112–121 (2000).
[Crossref]

Larson, C.

H. Nguyen, C. Larson, and J. Britten, “Improvement of laser damage resistance and diffraction efficiency of multilayer dielectric diffraction gratings by HF-etch back line width tailoring,” Proc. SPIE 7842, 78421H (2010).

Laurence, T.

J. Bude, P. Miller, N. Shen, T. Suratwala, T. Laurence, W. Steele, S. Baxamusa, L. Wong, W. Carr, D. Cross, M. Monticelli, M. Feit, and G. Guss, “Silica laser damage mechanisms, precursors and their mitigation,” Proc. SPIE 9237, 92370S (2014).
[Crossref]

J. Bude, P. Miller, S. Baxamusa, N. Shen, T. Laurence, W. Steele, T. Suratwala, L. Wong, W. Carr, D. Cross, and M. Monticelli, “High fluence laser damage precursors and their mitigation in fused silica,” Opt. Express 22(5), 5839–5851 (2014).
[Crossref] [PubMed]

T. Suratwala, P. Miller, J. Bude, R. Steele, N. Shen, M. Monticelli, M. Feit, T. Laurence, M. Norton, C. Carr, and L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2010).
[Crossref]

Li, S.

F. Shi, Y. Shu, Y. Dai, X. Peng, and S. Li, “Magnetorheological elastic super-smooth finishing for high-efficiency manufacturing of ultraviolet laser resistant optics,” Opt. Eng. 52(7), 075104 (2013).
[Crossref]

Li, Y.

H. Ye, Y. Li, Z. Yuan, J. Wang, Q. Xu, and W. Yang, “Improving UV laser damage threshold of fused silica optics by wet chemical etching technique,” Proc. SPIE 9532, 953221 (2015).
[Crossref]

Lindsey, F.

J. Wong, L. Ferriera, F. Lindsey, L. Haupt, D. Hutcheon, and H. Kinney, “Morphology and microstructure in fused silica induced by high fluence UV laser pulses,” J. Non-Cryst. Solids 352(3), 255–272 (2006).
[Crossref]

Maunier, C.

R. Catrin, J. Neauport, D. Taroux, P. Cormont, C. Maunier, and S. Lambert, “Magnetorheological finishing for removing surface and subsurface defects of fused silica optics,” Opt. Eng. 53(9), 092010 (2014).
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Miller, P.

J. Bude, P. Miller, S. Baxamusa, N. Shen, T. Laurence, W. Steele, T. Suratwala, L. Wong, W. Carr, D. Cross, and M. Monticelli, “High fluence laser damage precursors and their mitigation in fused silica,” Opt. Express 22(5), 5839–5851 (2014).
[Crossref] [PubMed]

J. Bude, P. Miller, N. Shen, T. Suratwala, T. Laurence, W. Steele, S. Baxamusa, L. Wong, W. Carr, D. Cross, M. Monticelli, M. Feit, and G. Guss, “Silica laser damage mechanisms, precursors and their mitigation,” Proc. SPIE 9237, 92370S (2014).
[Crossref]

T. Suratwala, P. Miller, J. Bude, R. Steele, N. Shen, M. Monticelli, M. Feit, T. Laurence, M. Norton, C. Carr, and L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2010).
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A. Keller, S. Facsko, and W. Moller, “Evolution of ion-induced ripple patterns on SiO2 surfaces,” Nucl. Instr. Meth. in Phys. Res. B 267, 656–659 (2009).

Monticelli, M.

J. Bude, P. Miller, N. Shen, T. Suratwala, T. Laurence, W. Steele, S. Baxamusa, L. Wong, W. Carr, D. Cross, M. Monticelli, M. Feit, and G. Guss, “Silica laser damage mechanisms, precursors and their mitigation,” Proc. SPIE 9237, 92370S (2014).
[Crossref]

J. Bude, P. Miller, S. Baxamusa, N. Shen, T. Laurence, W. Steele, T. Suratwala, L. Wong, W. Carr, D. Cross, and M. Monticelli, “High fluence laser damage precursors and their mitigation in fused silica,” Opt. Express 22(5), 5839–5851 (2014).
[Crossref] [PubMed]

T. Suratwala, P. Miller, J. Bude, R. Steele, N. Shen, M. Monticelli, M. Feit, T. Laurence, M. Norton, C. Carr, and L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2010).
[Crossref]

Mori, Y.

T. Kamimura, K. Nakai, M. Yoshimura, Y. Mori, T. Sasaki, M. Tanaka, Y. Okada, H. Yoshida, M. Nakatsuka, T. Kojima, and K. Yoshida, “High damage resistivity of optical surface for UVlasers by ion beam etching,” Rev. Laser Eng. 7(9), 623–627 (1999).
[Crossref]

T. Kamimura, K. Nakai, Y. Mori, T. Sasaki, H. Yoshida, M. Nakatuka, M. Tanaka, S. Toda, M. Tanaka, and K. Yoshida, “Improvement of laser-induced surface damage in UVoptics by ion beam etching (CsLiB6O10and fused silica),” Proc. SPIE 3578, 695–701 (1999).
[Crossref]

T. Kamimura, Y. Mori, T. Sasaki, H. Yoshida, T. Okamoto, and K. Yoshida, “Ion etching of fused silica glasses for high-power lasers,” Jpn. J. Appl. Phys. 37, 4840–4841 (1998).
[Crossref]

Motokoshi, S.

T. Kamimura, S. Akamatsu, M. Yamamoto, I. Yamato, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jisuno, T. Okamoto, and K. Yoshida, “Enhancement of surface-damage resistance byremoving subsurface damage in fused silica,” Proc. SPIE 5273, 244–249 (2004).
[Crossref]

Nakai, K.

T. Kamimura, K. Nakai, Y. Mori, T. Sasaki, H. Yoshida, M. Nakatuka, M. Tanaka, S. Toda, M. Tanaka, and K. Yoshida, “Improvement of laser-induced surface damage in UVoptics by ion beam etching (CsLiB6O10and fused silica),” Proc. SPIE 3578, 695–701 (1999).
[Crossref]

T. Kamimura, K. Nakai, M. Yoshimura, Y. Mori, T. Sasaki, M. Tanaka, Y. Okada, H. Yoshida, M. Nakatsuka, T. Kojima, and K. Yoshida, “High damage resistivity of optical surface for UVlasers by ion beam etching,” Rev. Laser Eng. 7(9), 623–627 (1999).
[Crossref]

Nakatsuka, M.

T. Kamimura, K. Nakai, M. Yoshimura, Y. Mori, T. Sasaki, M. Tanaka, Y. Okada, H. Yoshida, M. Nakatsuka, T. Kojima, and K. Yoshida, “High damage resistivity of optical surface for UVlasers by ion beam etching,” Rev. Laser Eng. 7(9), 623–627 (1999).
[Crossref]

Nakatuka, M.

T. Kamimura, K. Nakai, Y. Mori, T. Sasaki, H. Yoshida, M. Nakatuka, M. Tanaka, S. Toda, M. Tanaka, and K. Yoshida, “Improvement of laser-induced surface damage in UVoptics by ion beam etching (CsLiB6O10and fused silica),” Proc. SPIE 3578, 695–701 (1999).
[Crossref]

Neauport, J.

R. Catrin, J. Neauport, D. Taroux, P. Cormont, C. Maunier, and S. Lambert, “Magnetorheological finishing for removing surface and subsurface defects of fused silica optics,” Opt. Eng. 53(9), 092010 (2014).
[Crossref]

Nguyen, H.

H. Nguyen, C. Larson, and J. Britten, “Improvement of laser damage resistance and diffraction efficiency of multilayer dielectric diffraction gratings by HF-etch back line width tailoring,” Proc. SPIE 7842, 78421H (2010).

Norton, M.

T. Suratwala, P. Miller, J. Bude, R. Steele, N. Shen, M. Monticelli, M. Feit, T. Laurence, M. Norton, C. Carr, and L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2010).
[Crossref]

Okada, Y.

T. Kamimura, K. Nakai, M. Yoshimura, Y. Mori, T. Sasaki, M. Tanaka, Y. Okada, H. Yoshida, M. Nakatsuka, T. Kojima, and K. Yoshida, “High damage resistivity of optical surface for UVlasers by ion beam etching,” Rev. Laser Eng. 7(9), 623–627 (1999).
[Crossref]

Okamoto, T.

T. Kamimura, S. Akamatsu, M. Yamamoto, I. Yamato, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jisuno, T. Okamoto, and K. Yoshida, “Enhancement of surface-damage resistance byremoving subsurface damage in fused silica,” Proc. SPIE 5273, 244–249 (2004).
[Crossref]

T. Kamimura, Y. Mori, T. Sasaki, H. Yoshida, T. Okamoto, and K. Yoshida, “Ion etching of fused silica glasses for high-power lasers,” Jpn. J. Appl. Phys. 37, 4840–4841 (1998).
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P. Bouchut, P. Garrec, and C. Pelle, “Wet etching for the mitigation of laser damage growth in fused silica,” Proc. SPIE 4932, 103–111 (2003).
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Peng, X.

F. Shi, Y. Tian, X. Peng, and Y. Dai, “Combined technique of elastic magnetorheological finishing and HF etching for high-efficiency improving of the laser-induced damage threshold of fused silica optics,” Appl. Opt. 53(4), 598–604 (2014).
[Crossref] [PubMed]

F. Shi, Y. Shu, Y. Dai, X. Peng, and S. Li, “Magnetorheological elastic super-smooth finishing for high-efficiency manufacturing of ultraviolet laser resistant optics,” Opt. Eng. 52(7), 075104 (2013).
[Crossref]

Riley, M. O.

J. H. Campbell, R. A. Hawley-Fedder, C. J. Stolz, J. A. Menapace, M. R. Borden, P. K. Whitman, J. Yu, M. J. Runkel, M. O. Riley, M. D. Feit, and R. P. Hackel, “NIF optical materials and fabrication technologies: An overview,” Proc. SPIE 5341, 84–101 (2004).
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Rouxel, T.

T. Rouxel, H. Ji, J. Guin, F. Augereau, and B. Ruffle, “Indentation deformation mechanism in glass: densification versus shear flow,” J. Appl. Phys. 107(9), 094903 (2010).
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Ruffle, B.

T. Rouxel, H. Ji, J. Guin, F. Augereau, and B. Ruffle, “Indentation deformation mechanism in glass: densification versus shear flow,” J. Appl. Phys. 107(9), 094903 (2010).
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Runkel, M. J.

J. H. Campbell, R. A. Hawley-Fedder, C. J. Stolz, J. A. Menapace, M. R. Borden, P. K. Whitman, J. Yu, M. J. Runkel, M. O. Riley, M. D. Feit, and R. P. Hackel, “NIF optical materials and fabrication technologies: An overview,” Proc. SPIE 5341, 84–101 (2004).
[Crossref]

Sakamoto, T.

T. Kamimura, S. Akamatsu, M. Yamamoto, I. Yamato, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jisuno, T. Okamoto, and K. Yoshida, “Enhancement of surface-damage resistance byremoving subsurface damage in fused silica,” Proc. SPIE 5273, 244–249 (2004).
[Crossref]

Sasaki, T.

T. Kamimura, K. Nakai, Y. Mori, T. Sasaki, H. Yoshida, M. Nakatuka, M. Tanaka, S. Toda, M. Tanaka, and K. Yoshida, “Improvement of laser-induced surface damage in UVoptics by ion beam etching (CsLiB6O10and fused silica),” Proc. SPIE 3578, 695–701 (1999).
[Crossref]

T. Kamimura, K. Nakai, M. Yoshimura, Y. Mori, T. Sasaki, M. Tanaka, Y. Okada, H. Yoshida, M. Nakatsuka, T. Kojima, and K. Yoshida, “High damage resistivity of optical surface for UVlasers by ion beam etching,” Rev. Laser Eng. 7(9), 623–627 (1999).
[Crossref]

T. Kamimura, Y. Mori, T. Sasaki, H. Yoshida, T. Okamoto, and K. Yoshida, “Ion etching of fused silica glasses for high-power lasers,” Jpn. J. Appl. Phys. 37, 4840–4841 (1998).
[Crossref]

Shen, N.

J. Bude, P. Miller, N. Shen, T. Suratwala, T. Laurence, W. Steele, S. Baxamusa, L. Wong, W. Carr, D. Cross, M. Monticelli, M. Feit, and G. Guss, “Silica laser damage mechanisms, precursors and their mitigation,” Proc. SPIE 9237, 92370S (2014).
[Crossref]

J. Bude, P. Miller, S. Baxamusa, N. Shen, T. Laurence, W. Steele, T. Suratwala, L. Wong, W. Carr, D. Cross, and M. Monticelli, “High fluence laser damage precursors and their mitigation in fused silica,” Opt. Express 22(5), 5839–5851 (2014).
[Crossref] [PubMed]

T. Suratwala, P. Miller, J. Bude, R. Steele, N. Shen, M. Monticelli, M. Feit, T. Laurence, M. Norton, C. Carr, and L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2010).
[Crossref]

Shi, F.

F. Shi, Y. Tian, X. Peng, and Y. Dai, “Combined technique of elastic magnetorheological finishing and HF etching for high-efficiency improving of the laser-induced damage threshold of fused silica optics,” Appl. Opt. 53(4), 598–604 (2014).
[Crossref] [PubMed]

F. Shi, Y. Shu, Y. Dai, X. Peng, and S. Li, “Magnetorheological elastic super-smooth finishing for high-efficiency manufacturing of ultraviolet laser resistant optics,” Opt. Eng. 52(7), 075104 (2013).
[Crossref]

Shiba, H.

T. Kamimura, S. Akamatsu, M. Yamamoto, I. Yamato, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jisuno, T. Okamoto, and K. Yoshida, “Enhancement of surface-damage resistance byremoving subsurface damage in fused silica,” Proc. SPIE 5273, 244–249 (2004).
[Crossref]

Shu, Y.

F. Shi, Y. Shu, Y. Dai, X. Peng, and S. Li, “Magnetorheological elastic super-smooth finishing for high-efficiency manufacturing of ultraviolet laser resistant optics,” Opt. Eng. 52(7), 075104 (2013).
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P. Sigmund, “Theory of sputtering. I. Sputtering yield of amorphous and polycrystalline targets,” Phys. Rev. 184(2), 383–416 (1969).
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Steele, R.

T. Suratwala, P. Miller, J. Bude, R. Steele, N. Shen, M. Monticelli, M. Feit, T. Laurence, M. Norton, C. Carr, and L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2010).
[Crossref]

Steele, W.

J. Bude, P. Miller, N. Shen, T. Suratwala, T. Laurence, W. Steele, S. Baxamusa, L. Wong, W. Carr, D. Cross, M. Monticelli, M. Feit, and G. Guss, “Silica laser damage mechanisms, precursors and their mitigation,” Proc. SPIE 9237, 92370S (2014).
[Crossref]

J. Bude, P. Miller, S. Baxamusa, N. Shen, T. Laurence, W. Steele, T. Suratwala, L. Wong, W. Carr, D. Cross, and M. Monticelli, “High fluence laser damage precursors and their mitigation in fused silica,” Opt. Express 22(5), 5839–5851 (2014).
[Crossref] [PubMed]

Stolz, C. J.

J. H. Campbell, R. A. Hawley-Fedder, C. J. Stolz, J. A. Menapace, M. R. Borden, P. K. Whitman, J. Yu, M. J. Runkel, M. O. Riley, M. D. Feit, and R. P. Hackel, “NIF optical materials and fabrication technologies: An overview,” Proc. SPIE 5341, 84–101 (2004).
[Crossref]

Suratwala, T.

J. Bude, P. Miller, S. Baxamusa, N. Shen, T. Laurence, W. Steele, T. Suratwala, L. Wong, W. Carr, D. Cross, and M. Monticelli, “High fluence laser damage precursors and their mitigation in fused silica,” Opt. Express 22(5), 5839–5851 (2014).
[Crossref] [PubMed]

J. Bude, P. Miller, N. Shen, T. Suratwala, T. Laurence, W. Steele, S. Baxamusa, L. Wong, W. Carr, D. Cross, M. Monticelli, M. Feit, and G. Guss, “Silica laser damage mechanisms, precursors and their mitigation,” Proc. SPIE 9237, 92370S (2014).
[Crossref]

T. Suratwala, P. Miller, J. Bude, R. Steele, N. Shen, M. Monticelli, M. Feit, T. Laurence, M. Norton, C. Carr, and L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2010).
[Crossref]

Tanaka, M.

T. Kamimura, K. Nakai, M. Yoshimura, Y. Mori, T. Sasaki, M. Tanaka, Y. Okada, H. Yoshida, M. Nakatsuka, T. Kojima, and K. Yoshida, “High damage resistivity of optical surface for UVlasers by ion beam etching,” Rev. Laser Eng. 7(9), 623–627 (1999).
[Crossref]

T. Kamimura, K. Nakai, Y. Mori, T. Sasaki, H. Yoshida, M. Nakatuka, M. Tanaka, S. Toda, M. Tanaka, and K. Yoshida, “Improvement of laser-induced surface damage in UVoptics by ion beam etching (CsLiB6O10and fused silica),” Proc. SPIE 3578, 695–701 (1999).
[Crossref]

T. Kamimura, K. Nakai, Y. Mori, T. Sasaki, H. Yoshida, M. Nakatuka, M. Tanaka, S. Toda, M. Tanaka, and K. Yoshida, “Improvement of laser-induced surface damage in UVoptics by ion beam etching (CsLiB6O10and fused silica),” Proc. SPIE 3578, 695–701 (1999).
[Crossref]

Taroux, D.

R. Catrin, J. Neauport, D. Taroux, P. Cormont, C. Maunier, and S. Lambert, “Magnetorheological finishing for removing surface and subsurface defects of fused silica optics,” Opt. Eng. 53(9), 092010 (2014).
[Crossref]

Tian, Y.

Toda, S.

T. Kamimura, K. Nakai, Y. Mori, T. Sasaki, H. Yoshida, M. Nakatuka, M. Tanaka, S. Toda, M. Tanaka, and K. Yoshida, “Improvement of laser-induced surface damage in UVoptics by ion beam etching (CsLiB6O10and fused silica),” Proc. SPIE 3578, 695–701 (1999).
[Crossref]

Wang, J.

H. Ye, Y. Li, Z. Yuan, J. Wang, Q. Xu, and W. Yang, “Improving UV laser damage threshold of fused silica optics by wet chemical etching technique,” Proc. SPIE 9532, 953221 (2015).
[Crossref]

Whitman, P. K.

J. H. Campbell, R. A. Hawley-Fedder, C. J. Stolz, J. A. Menapace, M. R. Borden, P. K. Whitman, J. Yu, M. J. Runkel, M. O. Riley, M. D. Feit, and R. P. Hackel, “NIF optical materials and fabrication technologies: An overview,” Proc. SPIE 5341, 84–101 (2004).
[Crossref]

Wong, J.

J. Wong, L. Ferriera, F. Lindsey, L. Haupt, D. Hutcheon, and H. Kinney, “Morphology and microstructure in fused silica induced by high fluence UV laser pulses,” J. Non-Cryst. Solids 352(3), 255–272 (2006).
[Crossref]

Wong, L.

J. Bude, P. Miller, S. Baxamusa, N. Shen, T. Laurence, W. Steele, T. Suratwala, L. Wong, W. Carr, D. Cross, and M. Monticelli, “High fluence laser damage precursors and their mitigation in fused silica,” Opt. Express 22(5), 5839–5851 (2014).
[Crossref] [PubMed]

J. Bude, P. Miller, N. Shen, T. Suratwala, T. Laurence, W. Steele, S. Baxamusa, L. Wong, W. Carr, D. Cross, M. Monticelli, M. Feit, and G. Guss, “Silica laser damage mechanisms, precursors and their mitigation,” Proc. SPIE 9237, 92370S (2014).
[Crossref]

T. Suratwala, P. Miller, J. Bude, R. Steele, N. Shen, M. Monticelli, M. Feit, T. Laurence, M. Norton, C. Carr, and L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2010).
[Crossref]

Xin, K.

K. Xin and J. Lambropoulos, “Densification of fused silica: effects on nanoindentation,” Proc. SPIE 4102, 112–121 (2000).
[Crossref]

Xu, Q.

H. Ye, Y. Li, Z. Yuan, J. Wang, Q. Xu, and W. Yang, “Improving UV laser damage threshold of fused silica optics by wet chemical etching technique,” Proc. SPIE 9532, 953221 (2015).
[Crossref]

Yamamoto, M.

T. Kamimura, S. Akamatsu, M. Yamamoto, I. Yamato, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jisuno, T. Okamoto, and K. Yoshida, “Enhancement of surface-damage resistance byremoving subsurface damage in fused silica,” Proc. SPIE 5273, 244–249 (2004).
[Crossref]

Yamato, I.

T. Kamimura, S. Akamatsu, M. Yamamoto, I. Yamato, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jisuno, T. Okamoto, and K. Yoshida, “Enhancement of surface-damage resistance byremoving subsurface damage in fused silica,” Proc. SPIE 5273, 244–249 (2004).
[Crossref]

Yang, W.

H. Ye, Y. Li, Z. Yuan, J. Wang, Q. Xu, and W. Yang, “Improving UV laser damage threshold of fused silica optics by wet chemical etching technique,” Proc. SPIE 9532, 953221 (2015).
[Crossref]

Ye, H.

H. Ye, Y. Li, Z. Yuan, J. Wang, Q. Xu, and W. Yang, “Improving UV laser damage threshold of fused silica optics by wet chemical etching technique,” Proc. SPIE 9532, 953221 (2015).
[Crossref]

Yoshida, H.

T. Kamimura, K. Nakai, Y. Mori, T. Sasaki, H. Yoshida, M. Nakatuka, M. Tanaka, S. Toda, M. Tanaka, and K. Yoshida, “Improvement of laser-induced surface damage in UVoptics by ion beam etching (CsLiB6O10and fused silica),” Proc. SPIE 3578, 695–701 (1999).
[Crossref]

T. Kamimura, K. Nakai, M. Yoshimura, Y. Mori, T. Sasaki, M. Tanaka, Y. Okada, H. Yoshida, M. Nakatsuka, T. Kojima, and K. Yoshida, “High damage resistivity of optical surface for UVlasers by ion beam etching,” Rev. Laser Eng. 7(9), 623–627 (1999).
[Crossref]

T. Kamimura, Y. Mori, T. Sasaki, H. Yoshida, T. Okamoto, and K. Yoshida, “Ion etching of fused silica glasses for high-power lasers,” Jpn. J. Appl. Phys. 37, 4840–4841 (1998).
[Crossref]

Yoshida, K.

T. Kamimura, S. Akamatsu, M. Yamamoto, I. Yamato, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jisuno, T. Okamoto, and K. Yoshida, “Enhancement of surface-damage resistance byremoving subsurface damage in fused silica,” Proc. SPIE 5273, 244–249 (2004).
[Crossref]

T. Kamimura, K. Nakai, Y. Mori, T. Sasaki, H. Yoshida, M. Nakatuka, M. Tanaka, S. Toda, M. Tanaka, and K. Yoshida, “Improvement of laser-induced surface damage in UVoptics by ion beam etching (CsLiB6O10and fused silica),” Proc. SPIE 3578, 695–701 (1999).
[Crossref]

T. Kamimura, K. Nakai, M. Yoshimura, Y. Mori, T. Sasaki, M. Tanaka, Y. Okada, H. Yoshida, M. Nakatsuka, T. Kojima, and K. Yoshida, “High damage resistivity of optical surface for UVlasers by ion beam etching,” Rev. Laser Eng. 7(9), 623–627 (1999).
[Crossref]

T. Kamimura, Y. Mori, T. Sasaki, H. Yoshida, T. Okamoto, and K. Yoshida, “Ion etching of fused silica glasses for high-power lasers,” Jpn. J. Appl. Phys. 37, 4840–4841 (1998).
[Crossref]

Yoshimura, M.

T. Kamimura, K. Nakai, M. Yoshimura, Y. Mori, T. Sasaki, M. Tanaka, Y. Okada, H. Yoshida, M. Nakatsuka, T. Kojima, and K. Yoshida, “High damage resistivity of optical surface for UVlasers by ion beam etching,” Rev. Laser Eng. 7(9), 623–627 (1999).
[Crossref]

Yu, J.

J. H. Campbell, R. A. Hawley-Fedder, C. J. Stolz, J. A. Menapace, M. R. Borden, P. K. Whitman, J. Yu, M. J. Runkel, M. O. Riley, M. D. Feit, and R. P. Hackel, “NIF optical materials and fabrication technologies: An overview,” Proc. SPIE 5341, 84–101 (2004).
[Crossref]

Yuan, Z.

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J. Menapace, B. Penetrante, D. Golini, A. Slomba, P. Miller, T. Parham, M. Nichols, and J. Peterson, “Combined advanced finishing and UV-Laser conditioning for producing UV-Damage-Resistant fused silica optics,” SPIE Vol. 4679(2002).

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Figures (10)

Fig. 1
Fig. 1 KDIBF650L-VT.
Fig. 2
Fig. 2 Surface morphologies in each area (Sample #1).
Fig. 3
Fig. 3 Sizes of dot-form microstructures in each etched depth (Sample #1).
Fig. 4
Fig. 4 Morphology evolution of dot-form microstructures (Sample #1).
Fig. 5
Fig. 5 Morphologies of Hertz scratch in IBE (Sample #2).
Fig. 6
Fig. 6 Comparison of Fe, Ce before and after IBE (Sample #3). (a) Comparison of Fe before and after IBE (Sample #3) (b) Comparison of Ce before and after IBE (Sample #3).
Fig. 7
Fig. 7 Influence on the roughness of dot-form microstructures (Sample #1). (a) The image [Fig. 2(b)] in Zygo (b) The image [Fig. 2(b)] with the dot-form microstructures censored in Zygo.
Fig. 8
Fig. 8 The actual incident angles along the defect pit 2 edge.
Fig. 9
Fig. 9 Microscopic images of damage morphology with IBE depths (Sample #2). (a) Damage morphology before IBE (b) Damage morphology after IBE 500nm (c) Damage morphology after IBE 1000nm.
Fig. 10
Fig. 10 Relationships between LIDT and various damage precursors.

Tables (4)

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Table 1 Parameters of MRF

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Table 2 Parameters of IBE

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Table 3 Hertz scratch LIDTs with various IBE depths

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Table 4 Surface LIDTs with various IBE depths (Sample #1)

Equations (1)

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v( x,y )= JM t ρ t ( x,y ) N A Y θ ( x,y )

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